申请人:Sumitomo Chemical Company, Limited
公开号:US03963736A1
公开(公告)日:1976-06-15
A process for producing a compound of the formula: ##SPC1## Wherein Z is CH or N; R is a lower alkyl group, a lower alkenyl group, a cycloalkyl group or a hydroxyalkyl group; R.sub.1 is a hydrogen atom or lower alkyl group; when Z is N, R.sub.2, R.sub.3 and R.sub.4 are a hydrogen atom, a halogen atom a lower alkyl group, a lower alkoxyl group, a lower hydroxyalkyl group, a lower acyloxyalkyl group, trihalogenoalkyl group, a carboxyl group, a cyano group, or an aralkyl group; when Z is CH, R.sub.2, R.sub.3 and R.sub.4 are a hydrogen atom, a halogen atom, a lower alkyl group, a lower alkoxyl group, a trihalogenoalkyl group, a cyano group, a nitro group, an alkylmercapto group, a lower alkylenedioxy group, or a lower alkylene bridge attached to the quinoline nucleus, which comprises heating a compound of the formula ##SPC2## Wherein R, R.sub.1, R.sub.2, R.sub.3, R.sub.4 and Z are as defined above, followed, if desired, by hydrolyzing the product obtained, is disclosed. The product is useful as an antibacterial agent. An intermediate having the formula: ##SPC3## Wherein A is OR or a halogen atom, and R, R.sub.1, R.sub.2, R.sub.3, R.sub.4 and Z are as defined above, and a process for its preparation are also disclosed.
一种生产化合物的方法,该化合物的化学式为:##SPC1## 其中Z为CH或N; R为较低的烷基、较低的烯基、环烷基或羟基烷基; R.sub.1为氢原子或较低的烷基; 当Z为N时,R.sub.2、R.sub.3和R.sub.4为氢原子、卤素原子、较低的烷基、较低的烷氧基、较低的羟基烷基、较低的酰氧烷基、三卤代烷基、羧基、氰基或芳基烷基; 当Z为CH时,R.sub.2、R.sub.3和R.sub.4为氢原子、卤素原子、较低的烷基、较低的烷氧基、三卤代烷基、氰基、硝基、烷基硫醇基、较低的烷基二氧基基团或连接喹啉核的较低烷基桥,包括加热化合物##SPC2## 其中R、R.sub.1、R.sub.2、R.sub.3、R.sub.4和Z如上所定义,然后,如果需要,水解所得的产物。该产品可用作抗菌剂。还公开了一种具有以下式子的中间体:##SPC3## 其中A为OR或卤素原子,R、R.sub.1、R.sub.2、R.sub.3、R.sub.4和Z如上所定义,以及其制备方法。