已在六氟丙烷-2-醇(HFIP),三氟乙醇(TFE),六氟丙烷-2-醇水溶液(97HFIP),三氟乙醇水溶液(97TFE),乙醇水溶液(50E和80E)中测量了2-金刚烷基苯甲酰基甲苯磺酸盐的溶剂分解速率,甲醇水溶液(80M),温度介于3-5之间。23和70°C,并确定了激活参数。已测量HFIP的O- 2 H溶剂动力学同位素效应(在50.8°C时k H / k D为1.02 5 ±0.02),并已在97HFIP中确定了次级α-氘动力学同位素效应(k H / k D1.090±0.005;40.2°C),50E(1.091∓0.006; 51.0°C)和80E(1.133∓0.009; 60.9°C)。80M中的甲磺酸和TFE中的吡啶都不会显着提高速率,并且由于97TFE中低浓度的高氯酸四丁铵的存在,几乎没有盐作用。甲苯磺酸2-金刚烷酯与乙醇和弱水性乙醇中的溶剂分解产物平行形成,是在氯仿和甲
BASIC COMPOUND, CHEMICALLY AMPLIFIED RESIST COMPOSITION, AND PATTERNING PROCESS
申请人:Hatakeyama Jun
公开号:US20120141938A1
公开(公告)日:2012-06-07
A chemically amplified resist composition comprising a base polymer, an acid generator, and an amine quencher in the form of a β-alanine, γ-aminobutyric acid or 5-aminovaleric acid derivative having an acid labile group-substituted carboxyl group has a high contrast of alkaline dissolution rate before and after exposure and forms a pattern of good profile at a high resolution, minimal roughness and wide focus margin.
MONOMER, POLYMER, RESIST COMPOSITION, AND PATTERNING PROCESS
申请人:SHIN-ETSU CHEMICAL CO., LTD.
公开号:US20140045123A1
公开(公告)日:2014-02-13
A polymer comprising recurring units derived from a (meth)acrylate monomer of tertiary ester type having branched alkyl on alicycle is used to form a resist composition. When subjected to exposure, PEB and organic solvent development, the resist composition is improved in dissolution contrast.
RESIST COMPOSITION, PATTERNING PROCESS, AND BARIUM, CESIUM AND CERIUM SALTS
申请人:SHIN-ETSU CHEMICAL CO., LTD.
公开号:US20170115566A1
公开(公告)日:2017-04-27
A resist composition comprising a base resin comprising acid labile group-containing recurring units and preferably acid generator-containing recurring units, and a sodium, magnesium, potassium, calcium, rubidium, strontium, yttrium, cesium, barium or cerium salt of α-fluorinated sulfonic acid bonded to an alkyl, alkenyl, alkynyl or aryl group exhibits a high resolution and sensitivity and forms a pattern of satisfactory profile with minimal LWR after exposure and development.
One-Pot Etherification of Ketones and Aldehydes with Organic Halides Using Sodium Hydride as a Reductant
作者:Qingwei Meng、Bin Gong、Chuang Hui、Zhanxian Gao
DOI:10.1080/00397910802579178
日期:2009.4.22
Abstract One-pot etherification reaction of aromatic and some aliphatic carbonylcompounds with organic halides in the presence of sodium hydride as a reducing reagent proceeded smoothly in dioxane, a polar solvent with higher boiling point, to provide desired ethers in moderate to high yields.
Photochemistry of alkyl halides. 4. 1-Norbornyl, 1-norbornylmethyl, 1- and 2-adamantyl, and 1-octyl bromides and iodides
作者:Paul J. Kropp、Graham S. Poindexter、Norbert J. Pienta、David C. Hamilton
DOI:10.1021/ja00441a043
日期:1976.12
Competing ionic and radical photobehavior has been observed for a number of alkyl halides. The proportion of nucleophilic substitution and reduction products were reported for each halide. Solventeffects of ethylene glycol, triethylamine, and methanol and atmospheric effects of nitrogen, oxygen, and air were studied. The effect of irradiation of the halides with methanol-O-d was reported. The results