2-[1-(ethoxy)ethoxy)acetaldehyde | 109991-32-4

• 分子结构分类: 有机化合物 - 有机氧化合物
• 英文名称: 2-[1-(ethoxy)ethoxy)acetaldehyde
• 英文别名: (1-Ethoxyethoxy)acetaldehyde；2-(1-ethoxyethoxy)acetaldehyde
• CAS: 109991-32-4
• 化学式: C₆H₁₂O₃
• 分子量: 132.159
• InChiKey: GPHQLMCHFJFYPJ-UHFFFAOYSA-N

物化性质

• 沸点：
  135.7±15.0 °C(Predicted)
• 密度：
  0.957±0.06 g/cm3(Predicted)

计算性质

• 辛醇/水分配系数(LogP)：
  0.4
• 重原子数：
  9
• 可旋转键数：
  5
• 环数：
  0.0
• sp3杂化的碳原子比例：
  0.83
• 拓扑面积：
  35.5
• 氢给体数：
  0
• 氢受体数：
  3

反应信息

• 作为反应物：
  描述：

  2-[1-(ethoxy)ethoxy)acetaldehyde 在 sodium hydroxide 、 偶氮二异丁腈 、 甲基溴化镁 、 三正丁基氢锡 、 氯化铵 作用下， 以 甲醇 为溶剂， 反应 2.0h， 生成 (2S,5R,6R)-6-[(Z)-(S)-2-(1-Ethoxy-ethoxy)-1-hydroxy-3-phenyl-allyl]-3,3-dimethyl-7-oxo-4-thia-1-aza-bicyclo[3.2.0]heptane-2-carboxylic acid allyl ester
  参考文献：
  名称：

  在乙二醛中添加青霉素格氏试剂可合成新型戊烷酮醇

  摘要：

  青霉素格氏试剂与取代的乙二醛的缩合导致合成新的Penamα-酮醇抗菌剂，该抗菌剂在结构上与几种临床上有用的青霉素有关。

  DOI：

  10.1016/s0040-4039(00)96318-4
• 作为产物：
  描述：

  acetaldehyde allyl ethyl acetal 、 potassium carbonate 以 甲醇 为溶剂， 生成 2-[1-(ethoxy)ethoxy)acetaldehyde
  参考文献：
  名称：

  6-(1-acyl-1-hydroxymethyl)penicillanic acid derivatives

  摘要：

  6-(1-酰基-1-羟甲基)青霉烷酸衍生物可用作抗菌剂和/或β-内酰胺酶抑制剂。

  公开号：

  US04675186A1

文献信息

• Novel sulfonyldiazomethanes, photoacid generators, resist compositions, and patterning process
  申请人：——

  公开号：US20030224298A1

  公开（公告）日：2003-12-04

  Sulfonyldiazomethane compounds containing a long-chain alkylcyclohexyl group are novel and useful as photoacid generators. Chemical amplification type resist compositions comprising the same are suited for microfabrication because of many advantages including improved resolution, improved focus latitude, minimized line width variation or shape degradation even on long-term PED, minimized debris left after coating, development and peeling, and improved pattern profile after development.

  含有长链烷基环己基基团的磺酰基重氮甲烷化合物是一种新颖且有用的光酸发生剂。包含这些化合物的化学增强型抗蚀组合物适用于微细加工，因为具有许多优点，包括提高分辨率、改善焦点宽度、最小化线宽变化或形状退化，即使在长期PED后也是如此，最小化涂层、显影和剥离后残留的碎屑，并在显影后改善图案轮廓。
• Polymerizable compound, polymer, positive resist composition, and patterning process using the same
  申请人：Hatakeyama Jun

  公开号：US20090297979A1

  公开（公告）日：2009-12-03

  The present invention provides; a polymer suitable as a base resin for a positive resist composition, in particular a chemically amplified positive resist composition, having a higher resolution, a larger exposure allowance, a smaller sparse-dense size difference, a better process applicability, a better pattern configuration after exposure, and in addition, a further excellent etching resistance, than a conventional positive resist; a positive resist composition using the same; a patterning process; and a novel polymerizable compound to obtain a polymer like this. The present invention was accomplished by a polymer whose hydrogen atom of at least a carboxyl group is substituted by an acid labile group represented by the following general formula (2), a positive resist composition using the same, a patterning process, and a novel polymerizable compound to obtain a polymer like this.

  本发明提供了一种聚合物，适用于作为正向光刻胶组成的基础树脂，特别是化学放大正向光刻胶组成，具有更高的分辨率、更大的曝光容差、更小的稀密差异、更好的工艺适用性、曝光后更好的图案构形，以及比传统正向光刻胶更出色的蚀刻抗性；使用该聚合物的正向光刻胶组成；一种图案化工艺；以及一种新型的可聚合化合物，以获得类似的聚合物。本发明通过一种聚合物实现，其至少一个羧基的氢原子被下述通式（2）所表示的酸敏感基团所取代，使用该聚合物的正向光刻胶组成，一种图案化工艺，以及一种新型的可聚合化合物，以获得类似的聚合物。
• Polymers, resist compositions and patterning process, novel tetrahydrofuran compounds and their preparation
  申请人：Shin-Etsu Chemical Co., Ltd.

  公开号：US20020197559A1

  公开（公告）日：2002-12-26

  A polymer comprising recurring units of formula (1-1) or (1-2) wherein R 1 , R 2 , R 3 and R 4 are H or alkyl, or R 1 and R 2 , and R 3 and R 4 taken together may form a ring with each pair being alkylene, and k is 0 or 1 and having a Mw of 1,000-500,000 is novel. A resist composition comprising the polymer as a base resin is sensitive to high-energy radiation, has excellent sensitivity, resolution, etching resistance, and minimized swell and lends itself to micropatterning with electron beams or deep-UV. 1

  具有以下公式（1-1）或（1-2）重复单元的聚合物，其中R1、R2、R3和R4为H或烷基，或者R1和R2，以及R3和R4组成的每对可以成为亚烷基环，k为0或1，其Mw为1,000-500,000是新颖的。以该聚合物作为基础树脂的抗蚀剂组合物对高能辐射敏感，具有优异的敏感度、分辨率、蚀刻抗性和最小化膨胀，并适用于电子束或深紫外线微细图案化。
• Novel ester compounds, polymers, resist compositions and patterning process
  申请人：Shin-Etsu Chemical Co., Ltd.

  公开号：US20030088115A1

  公开（公告）日：2003-05-08

  An ester compound of the following formula (1) is provided. 1 R 1 is H, methyl or CH 2 CO 2 R 3 , R 2 is H, methyl or CO 2 R 3 , R 3 is C 1 -C 15 alkyl, R 4 is branched or cyclic, tertiary C 5 -C 20 alkyl group, Z is a divalent C 1 -C 10 hydrocarbon group, and k is 0 or 1. A resist composition comprising as the base resin a polymer resulting from the ester compound is sensitive to high-energy radiation, has excellent sensitivity, resolution, and etching resistance, and is suited for micropatterning using electron beams or deep-UV.

  提供了以下式子（1）的酯化合物。其中1R1为H，甲基或CH2CO2R3，R2为H，甲基或CO2R3，R3为C1-C15烷基，R4为支链或环状，三级C5-C20烷基，Z为二价C1-C10碳氢基团，k为0或1。以该酯化合物为基础树脂的抗蚀剂组合物对高能辐射敏感，具有优异的敏感性、分辨率和蚀刻抗性，适用于使用电子束或深紫外进行微细图案制备。
• Amine compounds, resist compositions and patterning process
  申请人：Shin-Etsu Chemical Co., Ltd.

  公开号：US20020115018A1

  公开（公告）日：2002-08-22

  Amine compounds having a cyano group are useful in resist compositions for preventing a resist film from thinning and also for enhancing the resolution and focus margin of resist.

  具有氰基的胺类化合物在抗蚀剂组成物中非常有用，可以防止抗蚀膜变薄，并增强抗蚀的分辨率和聚焦余量。