Pyrrolo(3,4-c)quinoline derivatives, processes therefor, and pharmaceutical compositions
申请人:ICI AMERICAS INC.
公开号:EP0029286A1
公开(公告)日:1981-05-27
Compounds of the formula:-
wherein
R2 stands for hydrogen or a C1-C6 normal alkyl, C3-C6 cycloalkyl, C1-C6 hydroxyalkyl, C3-C6 hydroxycycloalkyl, phenyl, benzyl, morpholinoethyl, N-methylpyrrolidinoethyl, or fluorobenzoylpropyl radical, R4 stands for hydrogen or a C1-C3 alkyl or phenyl radical, R5 stands for hydrogen or a C1-C6 alkyl, C3-C6 cycloalkyl, acetyl, benzyl or 2,2,2-trifluoroethyl radical, or when R4 and R5 are alkyl they may be joined to form, togeth- erwith the adjacent ring atoms of the pyrroloquinoline nucleus, a 5-, 6- or 7-membered ring, and Rx and Ry, which may be the same or different, stand for hydrogen or a halogen atom or a trifluoromethyl, C1-C6 alkyl, C3-C6 cycloalkyl, C1-C3 alkoxy,C1-C3 alkylthio, hydroxy or cyano radical, or when Rx and Ry are alkoxy linked to adjacent ring carbon atoms they may be combined to form a methylenedioxy (-OCH20-) or ethylenedioxy (-OCH2CH20-) radical, and acid addition salts thereof. Processes for the preparation of said pyrroloquinoline derivatives. Pharmaceutical compositions comprising one of said pyrroloquinoline derivatives together with a suitable diluent or carrier. The compounds exhibit antipsychotic and analgesic properties, and some of them exhibit antidepressant properties.
式中的化合物
式中
R2 代表氢或 C1-C6 正烷基、C3-C6 环烷基、C1-C6 羟烷基、C3-C6 羟环烷基、苯基、苄基、吗啉基乙基、N-甲基吡咯烷基乙基或氟苯甲酰丙基,R4 代表氢或 C1-C3 烷基或苯基,R5 代表氢或 C1-C6 烷基、C3-C6 环烷基、乙酰基、苄基或 2,2,2-三氟乙基,或者当 R4 和 R5 是烷基时,它们可以连接形成、当 R4 和 R5 为烷基时,它们可与吡咯喹啉核的相邻环原子连接形成一个 5、6 或 7 元环,Rx 和 Ry 可相同或不同,代表氢或卤原子或三氟甲基、C1-C6 烷基、C3-C6 环烷基C1-C3烷氧基、C1-C3烷硫基、羟基或氰基,或者当Rx和Ry是与相邻环碳原子相连的烷氧基时,它们可以结合形成亚甲基二氧基(-OCH20-)或亚乙基二氧基(-OCH2CH20-)基,以及它们的酸加成盐。上述吡咯喹啉衍生物的制备工艺。包含上述吡咯喹啉衍生物之一和适当稀释剂或载体的药物组合物。这些化合物具有抗精神病和镇痛特性,其中一些还具有抗抑郁特性。