LOW DIELECTRIC CONSTANT SILICEOUS FILM MANUFACTURING COMPOSITION AND METHODS FOR PRODUCING CURED FILM AND ELECTRONIC DEVICE USING THE SAME
申请人:Merck Patent GmbH
公开号:EP4010441A1
公开(公告)日:2022-06-15
[EN] LOW DIELECTRIC CONSTANT SILICEOUS FILM MANUFACTURING COMPOSITION AND METHODS FOR PRODUCING CURED FILM AND ELECTRONIC DEVICE USING THE SAME<br/>[FR] COMPOSITION DE FABRICATION DE FILM SILICEUX À FAIBLE CONSTANTE DIÉLECTRIQUE ET PROCÉDÉS DE PRODUCTION DE FILM DURCI ET DISPOSITIF ÉLECTRONIQUE L'UTILISANT
申请人:MERCK PATENT GMBH
公开号:WO2021028297A1
公开(公告)日:2021-02-18
To provide a low dielectric constant siliceous film manufacturing composition capable of forming a low dielectric constant siliceous film with dispersed pores having excellent mechanical properties and stable electrical properties. [Means] The present invention provides a low dielectric constant siliceous film manufacturing composition comprising: a polysiloxane, a pore-generating material, a condensation catalyst generator, and a solvent.
Oxyfunctionalization of Non-Natural Targets by Dioxiranes. 6. On the Selective Hydroxylation of Cubane
作者:Cosimo Annese、Lucia D’Accolti、Caterina Fusco、Remo Gandolfi、Philip E. Eaton、Ruggero Curci
DOI:10.1021/ol901302d
日期:2009.8.20
By using methyl(trifluoromethyl)dioxirane (TFDO), the direct mono- and bishydroxylation of cubane could be achieved in high yield under remarkably mild conditions. Comparison of the rates of dioxirane O-insertion with those of standard reference compounds, such as adamantane and cyclopropane, as well as ab initio computations provide useful hints concerning the mechanism of these transformations.