1-carboxy-3,5,7-trihydroxyadamantane | 213274-54-5

• 分子结构分类: 有机化合物 - 有机氧化合物
• 英文名称: 1-carboxy-3,5,7-trihydroxyadamantane
• 英文别名: 1-carboxy-3,5,7-adamantanetriol；3,5,7-trihydroxyadamantane-1-carboxylic acid
• CAS: 213274-54-5
• 化学式: C₁₁H₁₆O₅
• 分子量: 228.245
• InChiKey: LMYTYLMNPLNZLY-UHFFFAOYSA-N

物化性质

• 沸点：
  460.8±45.0 °C(Predicted)
• 密度：
  1.875±0.06 g/cm3(Predicted)

计算性质

• 辛醇/水分配系数(LogP)：
  -1.4
• 重原子数：
  16
• 可旋转键数：
  1
• 环数：
  4.0
• sp3杂化的碳原子比例：
  0.91
• 拓扑面积：
  98
• 氢给体数：
  4
• 氢受体数：
  5

反应信息

• 作为反应物：
  描述：

  1-carboxy-3,5,7-trihydroxyadamantane 以 四氢呋喃 为溶剂， 生成 三环[3.3.1.13,7]癸烷-1,3,5-三醇,7-(羟甲基)-
  参考文献：
  名称：

  Compounds for photoresist and resin composition for photoresist

  摘要：

  光阻树脂组合物包括具有以下结构的金刚烷骨架的聚合物和光活性酸前体：其中R1代表氢原子或甲基基团；R2、R3和R4相同或不同，分别代表氢原子、卤素原子、烷基基团、羟基、羟甲基基团、羧基、通过酸消除形成羟基、羟甲基基团或羧基的官能团；R2至R4中至少有一个是上述定义的官能团；X代表酯键或酰胺键；m和n各自为0或1。上述光阻树脂组合物对蚀刻溶液具有很高的抗性，可以通过光照溶解，并能够形成微小图案。

  公开号：

  US06391520B1

文献信息

• Polymerizable adamantane derivatives and process for producing the same
  申请人：Daicel Chemical Industries, Ltd.

  公开号：US06235851B1

  公开（公告）日：2001-05-22

  A compound shown by the following formula: wherein each of R1a, R2a, R3a and R4a represents a substituent selected from a non-reactive atom, a non-reactive group, a hydroxyl group and an amino group, and at least two members selected from R1a, R2a, R3a and R4a are a hydroxyl group, a carboxyl group or an amino group; is subjected to an esterification reaction or an amidation reaction with a polymerizable unsaturated compound (e.g., an alcohol, a carboxylic acid, an amine) in the presence of a catalyst comprising an element selected from the Group 3 elements, such as a samarium compound, to obtain a polymerizable adamantane derivative having at least one polymerizable unsaturated group in high yield.

  以下化学式所示的化合物：其中R1a、R2a、R3a和R4a中的每一个代表从非反应性原子、非反应性基团、羟基和氨基中选择的取代基，且在R1a、R2a、R3a和R4a中至少有两个成员是羟基、羧基或氨基；在催化剂的存在下，与可聚合的不饱和化合物（例如醇、羧酸、胺）进行酯化反应或酰胺化反应，所述催化剂包括从第三族元素中选择的元素，如钐化合物，以高产率获得至少具有一个可聚合不饱和基团的可聚合性金刚烷衍生物。
• ADAMANTANE DERIVATIVES AND PROCESS FOR PRODUCING THEM
  申请人：Daicel Chemical Industries, Ltd.

  公开号：EP0927711A1

  公开（公告）日：1999-07-07

  In the presence of an imide compound (e.g., N-hydroxyphthalimide) shown by the formula (2):    wherein R1 and R2 independently represents a hydrogen atom, a halogen atom, an alkyl group, an aryl group, a cycloalkyl group; or R1 and R2 may bond together to form a double bond or an aromatic or non-aromatic ring; Y is O or OH and n = 1 to 3; or the imide compound and a co-catalyst (e.g., a transition metal compound), an adamantane derivative having a functional group such as a nitro group, an amino group, a hydroxyl group, a carboxyl group, a hydroxymethyl group and an isocyanato group is oxidized with oxygen. According to the above method, an adamantane derivative having a hydroxyl group together with a functional group such as a nitro group, an amino group, a hydroxyl group, a carboxyl group, a hydroxymethyl group and an isocyanato group is efficiently obtained.

  在存在式（2）所示的酰亚胺化合物（如 N-羟基邻苯二甲酰亚胺）的情况下： 其中 R1 和 R2 分别代表氢原子、卤素原子、烷基、芳基、环烷基；或 R1 和 R2 可键合在一起形成双键或芳香环或非芳香环；Y 为 O 或 OH，n = 1 至 3； 或亚胺化合物和助催化剂（如过渡金属化合物），具有诸如硝基、氨基、羟基、羧基、羟甲基和异氰酸基等官能团的金刚烷衍生物与氧发生氧化反应。根据上述方法，可有效地获得具有羟基和硝基、氨基、羟基、羧基、羟甲基和异氰酸基等官能团的金刚烷衍生物。
• COMPOUNDS FOR PHOTORESIST AND RESIN COMPOSITION FOR PHOTORESIST
  申请人：Daicel Chemical Industries, Ltd.

  公开号：EP0999474A1

  公开（公告）日：2000-05-10

  The photoresist resin composition comprises a polymer having an adamantane skeleton represented by the following formula and a photoactive acid precursor: wherein R1 represents a hydrogen atom or a methyl group; R2, R3, and R4 are the same or different from each other, each representing a hydrogen atom, a halogen atom, an alkyl group, a hydroxyl group, a hydroxylmethyl group, a carboxyl group, a functional group which forms a hydroxyl group, a hydroxymethyl group or a carboxyl group by elimination with an acid; at least one of the substituents R2 to R4 is the functional group defined above; X represents an ester bond or an amide bond; and each of m and n is 0 or 1. The above photoresist resin composition is highly resistant to an etching solution, solubilizable by irradiation with light, and capable of giving minute patterns.

  光致抗蚀剂树脂组合物由具有下式所示金刚烷骨架的聚合物和光活性酸前体组成： 其中 R1 代表氢原子或甲基；R2、R3 和 R4 彼此相同或不同，各自代表氢原子、卤素原子、烷基、羟基、羟甲基、羧基、通过与酸消去形成羟基、羟甲基或羧基的官能团；取代基 R2 至 R4 中至少有一个是上文定义的官能团； X 代表酯键或酰胺键；以及 m 和 n 均为 0 或 1。 上述光刻胶树脂组合物对蚀刻溶液有很强的抵抗力，在光照射下可溶解，并能产生微小的图案。
• NOVEL ALICYCLIC ESTER COMPOUND, AND (METH)ACRYLIC COPOLYMER AND PHOTOSENSITIVE RESIN COMPOSITION CONTAINING SAME
  申请人：Mitsubishi Gas Chemical Company, Inc.

  公开号：EP2990425A1

  公开（公告）日：2016-03-02

  [Problem to be solved] The present invention provides, as a chemically amplified resist, a well-balanced resist or compound which results in improved sensitivity, resolution and line edge roughness (LER) without impairing the fundamental physical properties required as a resist (e.g., pattern shape, dry etching resistance, heat resistance). [Means to solve the problem] A mixture of cycloaliphatic ester compounds represented by general formulae (1) to (3), and a process for preparation thereof, as well as a (meth)acrylic copolymer comprising the cycloaliphatic ester compounds of general formulae (1) to (3) and a photosensitive resin composition thereof.

  [有待解决的问题］ 本发明作为一种化学放大抗蚀剂，提供了一种平衡良好的抗蚀剂或化合物，它能提高灵敏度、分辨率和线边缘粗糙度（LER），而不损害作为抗蚀剂所需的基本物理特性（如图案形状、耐干蚀性、耐热性）。 [解决问题的方法］ 通式(1)至(3)表示的环脂族酯化合物的混合物及其制备方法，以及由通式(1)至(3)的环脂族酯化合物组成的（甲基）丙烯酸共聚物及其感光树脂组合物。
• POLYMERIZABLE ADAMANTANE DERIVATIVES AND PROCESS FOR PRODUCING THE SAME
  申请人：Daicel Chemical Industries, Ltd.

  公开号：EP0915077B1

  公开（公告）日：2004-11-17