alpha-(2-Trifluoromethyl-2-propenoyloxy)-gamma-butyrolactone | 357294-11-2

• 分子结构分类: 有机化合物 - 有机杂环化合物 - 内酯类
• 英文名称: alpha-(2-Trifluoromethyl-2-propenoyloxy)-gamma-butyrolactone
• 英文别名: (2-oxooxolan-3-yl) 2-(trifluoromethyl)prop-2-enoate
• CAS: 357294-11-2
• 化学式: C₈H₇F₃O₄
• 分子量: 224.13
• InChiKey: VYEPDHHGNAKCIQ-UHFFFAOYSA-N

计算性质

• 辛醇/水分配系数(LogP)：
  1.7
• 重原子数：
  15
• 可旋转键数：
  3
• 环数：
  1.0
• sp3杂化的碳原子比例：
  0.5
• 拓扑面积：
  52.6
• 氢给体数：
  0
• 氢受体数：
  7

反应信息

• 作为产物：
  描述：

  2-(trifluoromethyl)acrylic chloride 、 (±)-α-羟基-γ-丁内酯 、 三乙胺 、 四氢呋喃 以 水 、 乙酸乙酯 为溶剂， 反应 3.0h， 以to yield 13.7 g of α-(2-trifluoromethyl-2-propenoyloxy)-γ-butyrolactone的产率得到alpha-(2-Trifluoromethyl-2-propenoyloxy)-gamma-butyrolactone
  参考文献：
  名称：

  Polymerizable monomer polymeric compound resin compositions for photoresist and method for producing semiconductor

  摘要：

  本发明的可聚合单体由以下公式（1）表示；其中，R1、R2和R3分别为氢原子、氟原子、烷基或氟烷基，W为单键或连接基，n为0或1，当n=1时，R1、R2和R3中至少有一个为氟原子或氟烷基；公式中的环可能具有取代基。本发明的可聚合单体能够为光刻胶聚合物提供适当的亲水性或亲疏水性和透明度。

  公开号：

  US20060058480A1

文献信息

• DEVELOPABLE BOTTOM ANTIREFLECTIVE COATING COMPOSITIONS FOR NEGATIVE RESISTS
  申请人：CHEN KUANG-JUNG

  公开号：US20130040238A1

  公开（公告）日：2013-02-14

  A negative developable bottom antireflective coating (NDBARC) material includes a polymer containing an aliphatic alcohol moiety, an aromatic moiety, and a carboxylic acid moiety. The NDBARC composition is insoluble in a typical resist solvent such as propylene glycol methyl ether acetate (PGMEA) after coating and baking. The NDBARC material also includes a photoacid generator, and optionally a crosslinking compound. In the NDBARC material, the carboxylic acid provides the developer solubility, while the alcohol alone, the carboxylic acid alone, or their combination provides the PGMEA resistance. The NDBARC material has resistance to the resist solvent, and thus, intermixing does not occur between NDBARC and resist during resist coating over NDBARC. After exposure and bake, the lithographically exposed portions of both the negative photoresist and the NDBARC layer become insoluble in developer due to the chemically amplified crosslinking of the polymers in negative resist and NDBARC layer in the lithographically exposed portions.

  一种负可展性底部防反射涂层（NDBARC）材料，包括含有脂肪族醇基团、芳香基团和羧酸基团的聚合物。NDBARC组合物在涂覆和烘烤后，不溶于典型的抗蚀剂溶剂，如丙二醇甲醚乙酸酯（PGMEA）。NDBARC材料还包括光酸发生剂，以及可选的交联化合物。在NDBARC材料中，羧酸提供了开发剂的溶解性，而仅有醇，仅有羧酸或它们的组合提供了对PGMEA的抗性。NDBARC材料具有抗抗蚀剂溶剂的性能，因此，在涂覆NDBARC时，NDBARC和抗蚀剂之间不会发生混合。经过曝光和烘烤后，负光刻胶和NDBARC层的光刻曝光部分由于聚合物的化学增强交联而变得不溶于开发剂。
• ACRYLIC ACID ESTER DERIVATIVE AND METHOD FOR PRODUCING SAME, INTERMEDIATE AND METHOD FOR PRODUCING SAME, HIGH-MOLECULAR-WEIGHT COMPOUND, AND PHOTORESIST COMPOSITION
  申请人：KURARAY CO., LTD.

  公开号：US20150037733A1

  公开（公告）日：2015-02-05

  Provided is an acrylic acid ester derivative which, when used as a constituent unit of a polymer which is included in a photoresist composition for a semiconductor, exhibits excellent lithography characteristics such as LWR and the like. Specifically, provided is an acrylic acid ester derivative represented by the following general formula (1). Furthermore, provided are an intermediate of the acrylic acid ester derivative and a process for producing the same; a polymer containing the acrylic acid ester derivative as a constituent unit; and a photoresist composition for a semiconductor containing the polymer. wherein, R 1 , R 2 , R 3 , R 4 , R 5 , R 6 , R 7 , R 8 , R 9 , R 10 , R 11 , R 12 , R 13 , m, x, and y are as defined in the text of Description.

  提供的是一种丙烯酸酯衍生物，当用作聚合物的组成单元时，该聚合物包含在半导体光阻组合物中，表现出优异的光刻特性，例如LWR等。具体而言，提供了由以下通式（1）表示的丙烯酸酯衍生物。此外，还提供了丙烯酸酯衍生物的中间体和制备方法；以及含有丙烯酸酯衍生物作为组成单元的聚合物和用于半导体的光阻组合物。其中，R1，R2，R3，R4，R5，R6，R7，R8，R9，R10，R11，R12，R13，m，x和y如描述文本中所定义。
• FLUORINE-ATOM-CONTAINING POLYMERIZABLE UNSATURATED-MONOMER, FLUORINE-ATOM-CONTAINING POLYMERIC COMPOUND AND PHOTORESIST RESIN COMPOSITION
  申请人：Koyama Hiroshi

  公开号：US20050282985A1

  公开（公告）日：2005-12-22

  A fluorine-atom-containing polymerizable unsaturated-monomer of the present invention is represented by the following formula (1a) or (1b): wherein each of a ring Z 1 and a ring Z 2 is an alicyclic carbon ring; when the alicyclic carbon ring is multi-cyclic, a part of atoms constituting the ring may be substituted by an oxygen atom, a sulfur atom or a nitrogen atom; an atom constituting the ring Z 1 and the ring Z 2 may have a substituent; each of R 1 , R 2 and R 3 is an alkyl group or a fluoroalkyl group; R is an specific unsaturated acyl group; provided that at least one of R 1 and R 2 is a fluorine atom or a fluoroalkyl group in the formula (1a), and in the formula (1b) (i) the ring Z 2 is bonded by a fluorine atom or a fluoroalkyl group, or (ii) R 3 is a fluoroalkyl group.

  本发明的含氟原子可聚合不饱和单体由下式(1a)或(1b)表示： 其中每个环 Z 1 和环 Z 2 为脂环碳环；当脂环碳环为多环时，构成环的部分原子可被氧原子、硫原子或氮原子取代；构成环 Z 1 和环 Z 2 中的每个 R 1 , R 2 和 R 3 是烷基或氟烷基； R 是特定的不饱和酰基；条件是 R 1 和 R 2 在式(1a)中至少有一个是氟原子或氟烷基，在式(1b)中 (i) 环 Z 2 由氟原子或氟烷基键合，或 (ii) R 3 是氟烷基。
• Fluorocopolymer, method for its production and resist composition containing it
  申请人：Eda Masataka

  公开号：US20070083021A1

  公开（公告）日：2007-04-12

  A fluorocopolymer having units derived from a monomer unit formed by cyclopolymerization of a fluorinated diene and units derived from a monomer unit formed by cyclopolymerization of a functional group-containing fluorinated diene having a specific structure or a monomer unit formed by polymerization of an acrylic monomer having a specific structure, a method for its production, and a resist composition.
• Wet developable bottom antireflective coating composition and method for use thereof
  申请人：Chen J. Kuang-Jung

  公开号：US20070243484A1

  公开（公告）日：2007-10-18

  The present invention discloses an antireflective coating composition for applying between a substrate surface and a positive photoresist composition. The antireflective coating composition is developable in an aqueous alkaline developer. The antireflective coating composition comprises a polymer, which comprises at least one monomer unit containing one or more moieties selected from the group consisting of a lactone, maleimide, and an N-alkyl maleimide; and at least one monomer unit containing one or more absorbing moieties. The polymer does not comprise an acid labile group. The present invention also discloses a method of forming and transferring a relief image by using the inventive antireflective coating composition in photolithography.