methyl 3-methoxy-1-(2-oxo-2-phenylethyl)cyclohexa-2,5-dienecarboxylate | 1408318-25-1

• 分子结构分类: 有机化合物 - 有机氧化合物
• 英文名称: methyl 3-methoxy-1-(2-oxo-2-phenylethyl)cyclohexa-2,5-dienecarboxylate
• 英文别名: Methyl 3-methoxy-1-phenacylcyclohexa-2,5-diene-1-carboxylate；methyl 3-methoxy-1-phenacylcyclohexa-2,5-diene-1-carboxylate
• CAS: 1408318-25-1
• 化学式: C₁₇H₁₈O₄
• 分子量: 286.328
• InChiKey: DONQBLHRDDBIPW-UHFFFAOYSA-N

计算性质

• 辛醇/水分配系数(LogP)：
  2.6
• 重原子数：
  21
• 可旋转键数：
  6
• 环数：
  2.0
• sp3杂化的碳原子比例：
  0.29
• 拓扑面积：
  52.6
• 氢给体数：
  0
• 氢受体数：
  4

反应信息

• 作为反应物：
  描述：

  methyl 3-methoxy-1-(2-oxo-2-phenylethyl)cyclohexa-2,5-dienecarboxylate 在 4-二甲氨基吡啶 、 水 、 对甲苯磺酸 、 盐酸-N-乙基-Nˊ-(3-二甲氨基丙基)碳二亚胺 、 lithium hydroxide 作用下， 以 四氢呋喃 、 1,4-二氧六环 、 二氯甲烷 为溶剂， 反应 7.5h， 生成 5-(((cyclohexylideneamino)oxy)carbonyl)-5-(2-oxo-2-phenylethyl)cyclohex-2-enone
  参考文献：
  名称：

  Design and Synthesis of a Photoaromatization-Based Two-Stage Photobase Generator for Pitch Division Lithography

  摘要：

  The synthesis of a two-stage photobase generator (PBG) based on photoinduced aromatization is described. This material was designed for use in resolution-enhanced photolithography. Computer modeling predicts that a delay in the onset of base generation can lead to improved image quality. This delay can be realized by a PBG that must undergo two sequential photoreactions for each molecule of base generated Toward that end, latent PBGs were designed that are oxime esters of aliphatic acids, which undergo Norrish type II reactions to yield oxime esters of aromatic acids that are efficient PBGs.

  DOI：

  10.1021/jo3021488
• 作为产物：
  描述：

  methyl 3-methoxycyclohexa-2,5-dienecarboxylate 、 2-溴苯乙酮 在 lithium diisopropyl amide 、 六甲基磷酰三胺 作用下， 以 四氢呋喃 、 正己烷 为溶剂， 反应 2.75h， 以92%的产率得到methyl 3-methoxy-1-(2-oxo-2-phenylethyl)cyclohexa-2,5-dienecarboxylate
  参考文献：
  名称：

  Design and Synthesis of a Photoaromatization-Based Two-Stage Photobase Generator for Pitch Division Lithography

  摘要：

  The synthesis of a two-stage photobase generator (PBG) based on photoinduced aromatization is described. This material was designed for use in resolution-enhanced photolithography. Computer modeling predicts that a delay in the onset of base generation can lead to improved image quality. This delay can be realized by a PBG that must undergo two sequential photoreactions for each molecule of base generated Toward that end, latent PBGs were designed that are oxime esters of aliphatic acids, which undergo Norrish type II reactions to yield oxime esters of aromatic acids that are efficient PBGs.

  DOI：

  10.1021/jo3021488

文献信息

• Design and Synthesis of a Photoaromatization-Based Two-Stage Photobase Generator for Pitch Division Lithography
  作者：Yuji Hagiwara、Ryan A. Mesch、Takanori Kawakami、Masahiro Okazaki、Steffen Jockusch、Yongjun Li、Nicholas J. Turro、C. Grant Willson

  DOI：10.1021/jo3021488

  日期：2013.3.1

  The synthesis of a two-stage photobase generator (PBG) based on photoinduced aromatization is described. This material was designed for use in resolution-enhanced photolithography. Computer modeling predicts that a delay in the onset of base generation can lead to improved image quality. This delay can be realized by a PBG that must undergo two sequential photoreactions for each molecule of base generated Toward that end, latent PBGs were designed that are oxime esters of aliphatic acids, which undergo Norrish type II reactions to yield oxime esters of aromatic acids that are efficient PBGs.