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3,3,3-trifluoro-2-methyl-1-(3-(trifluoromethyl)phenyl)-propan-1-one | 1610846-47-3

中文名称
——
中文别名
——
英文名称
3,3,3-trifluoro-2-methyl-1-(3-(trifluoromethyl)phenyl)-propan-1-one
英文别名
3'-(Trifluoromethyl)-alpha-methyl-beta,beta,beta-trifluoropropiophenone;3,3,3-trifluoro-2-methyl-1-[3-(trifluoromethyl)phenyl]propan-1-one
3,3,3-trifluoro-2-methyl-1-(3-(trifluoromethyl)phenyl)-propan-1-one化学式
CAS
1610846-47-3
化学式
C11H8F6O
mdl
——
分子量
270.174
InChiKey
UNXQWWNGJMQDAR-UHFFFAOYSA-N
BEILSTEIN
——
EINECS
——
  • 物化性质
  • 计算性质
  • ADMET
  • 安全信息
  • SDS
  • 制备方法与用途
  • 上下游信息
  • 反应信息
  • 文献信息
  • 表征谱图
  • 同类化合物
  • 相关功能分类
  • 相关结构分类

计算性质

  • 辛醇/水分配系数(LogP):
    4.1
  • 重原子数:
    18
  • 可旋转键数:
    2
  • 环数:
    1.0
  • sp3杂化的碳原子比例:
    0.36
  • 拓扑面积:
    17.1
  • 氢给体数:
    0
  • 氢受体数:
    7

反应信息

点击查看最新优质反应信息

文献信息

  • FLUORINATED SULFONATE ESTERS OF ARYL KETONES FOR NON-IONIC PHOTO-ACID GENERATORS
    申请人:International Business Machines Corporation
    公开号:US20180046077A1
    公开(公告)日:2018-02-15
    Non-ionic photo-acid generating (PAG) compounds were prepared that contain an aryl ketone group having a perfluorinated substituent alpha to the ketone carbonyl. The non-polymeric PAGs release a sulfonic acid when exposed to high energy radiation such as deep UV or extreme UV light. The photo-generated sulfonic acid has a low diffusion rate in an exposed resist layer subjected to a post-exposure bake (PEB) at 100° C. to 150° C., resulting in formation of good line patterns after development. At higher temperatures, the PAGs can also undergo a thermal reaction to form a sulfonic acid. The perfluorinated substituent provides improved thermal stability and hydrolytic/nucleophilic stability.
    非离子型光生酸(PAG)化合物被制备出来,它们含有一个含有全氟取代基的芳酮基团,该取代基位于酮羰基的α位置。这些非聚合PAGs在暴露于高能辐射,如深紫外或极紫外光时,会释放出磺酸。在100°C至150°C的后曝光烘烤(PEB)下,光生成的磺酸在暴露的抵抗层中具有较低的扩散速率,从而在开发后形成良好的线条图案。在较高温度下,PAGs也可以通过热反应形成磺酸全氟取代基提供了改善的热稳定性和解/亲核稳定性。
  • NON-IONIC ARYL KETONE BASED POLYMERIC PHOTO-ACID GENERATORS
    申请人:International Business Machines Corporation
    公开号:US20180044459A1
    公开(公告)日:2018-02-15
    Non-ionic photo-acid generating (PAG) polymerizable monomers were prepared that contain a side chain sulfonate ester of an alpha-hydroxy aryl ketone. The aryl ketone group has a perfluorinated substituent alpha to the ketone carbonyl. The sulfur of the sulfonate ester is also directly linked to a fluorinated group. PAG polymers prepared from the PAG monomers release a strong sulfonic acid when exposed to high energy radiation such as deep UV or extreme UV light. The photo-generated sulfonic acid has a low diffusion rate in an exposed resist layer subjected to a post-exposure bake (PEB) at 100° C. to 150° C., resulting in formation of good line patterns after development.
    制备了含有α-羟基芳基酮的侧链磺酸酯的非离子光酸发生(PAG)可聚合单体。芳基酮基团在酮基团的α位有全氟取代基。磺酸酯的也直接连接到化基团。从这些PAG单体制备的PAG聚合物在暴露于高能辐射(如深紫外或极紫外光)时释放出强磺酸。在经过后曝光烘烤(PEB)处理(100°C至150°C)的暴露光刻胶层中,光生成的磺酸扩散速率较低,结果在显影后形成良好的线型图案。
  • US9983475B2
    申请人:——
    公开号:US9983475B2
    公开(公告)日:2018-05-29
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