A resist additive represented by Formula 1 below and a resist composition including the additive are disclosed. The resist additive improves hydrophobicity of the surface of the resist film to prevent materials from being leached in water during exposure of immersion lithography and is converted to have hydrophilicity by deprotection reaction during development. As a result, a micropattern of a resist film with excellent sensitivity and high resolution is formed.
In Formula 1, the substituents are defined as described in the specification.
本发明揭示了一种由下式1表示的抗蚀添加剂和包括该添加剂的抗蚀组合物。该抗蚀添加剂可以提高抗蚀膜表面的疏
水性,以防止在浸没光刻曝光期间材料被
水溶出,并在显影期间通过去保护反应转化为亲
水性。因此,形成了具有优异灵敏度和高分辨率的抗蚀膜微图案。在式1中,取代基的定义如说明书中所述。