2-Acetyl-6-mercaptobenzoic acid | 136192-83-1

• 分子结构分类: 有机化合物 - 有机氧化合物
• 英文名称: 2-Acetyl-6-mercaptobenzoic acid
• 英文别名: 2-mercapto-6-acetylbenzoic acid；2-acetyl-6-sulfanylbenzoic acid
• CAS: 136192-83-1
• 化学式: C₉H₈O₃S
• 分子量: 196.227
• InChiKey: KSHVLQBPQNIFDW-UHFFFAOYSA-N

物化性质

• 沸点：
  376.1±37.0 °C(Predicted)
• 密度：
  1.343±0.06 g/cm3(Predicted)

计算性质

• 辛醇/水分配系数(LogP)：
  1.3
• 重原子数：
  13
• 可旋转键数：
  2
• 环数：
  1.0
• sp3杂化的碳原子比例：
  0.11
• 拓扑面积：
  55.4
• 氢给体数：
  2
• 氢受体数：
  4

反应信息

• 作为反应物：
  描述：

  2-Acetyl-6-mercaptobenzoic acid 在 sodium hydroxide 作用下， 以 四氢呋喃 、 N,N-二甲基甲酰胺 为溶剂， 反应 4.5h， 生成 Methyl 2-acetyl-6-[(4,6-dimethoxypyrimidin-2-yl)thio]benzoate
  参考文献：
  名称：

  Studies of the New Herbicide KIH-6127. Part II. Synthesis and Herbicidal Activity of 6-Acyl Pyrimidin-2-yl Salicylates and Analogues against Barnyard Grass

  摘要：

  The method reported previously (Part I) was employed to prepare a variety of novel 6-acylsalicylates as key intermediates. 6-Acylpyrimidin-2-yl salicylates (2-acyl-6-[(4,6-disubstituted pyrimidin-2-yl)oxy]benzoate derivatives: Type 1), the closely related phthalide compounds (3-alkyl-7-[(4,6-dimethoxypyrimidin-2-yl)oxy]phthalide derivatives: Type 2) and the ketal derivatives of 2-acyl-6-[(4,6-dimethoxypyrimidin-2-yl)oxy]benzoates (Type 3) were synthesized and their herbicidal activities measured. Methyl 2-acetyl-6-[(4,6-dimethoxypyrimidin-2-yl)oxy]benzoate gave excellent control of barnyard grass with a promising profile as a prototype rice herbicide.

  DOI：

  10.1002/(sici)1096-9063(199608)47:4<327::aid-ps432>3.0.co;2-u
• 作为产物：
  描述：

  2-氨基-6-乙酰基苯甲酸 在 盐酸 、 sodium nitrite 、 sodium hydroxide 、 硫化碱 作用下， 反应 2.0h， 生成 2-Acetyl-6-mercaptobenzoic acid
  参考文献：
  名称：

  Studies of the New Herbicide KIH-6127. Part II. Synthesis and Herbicidal Activity of 6-Acyl Pyrimidin-2-yl Salicylates and Analogues against Barnyard Grass

  摘要：

  The method reported previously (Part I) was employed to prepare a variety of novel 6-acylsalicylates as key intermediates. 6-Acylpyrimidin-2-yl salicylates (2-acyl-6-[(4,6-disubstituted pyrimidin-2-yl)oxy]benzoate derivatives: Type 1), the closely related phthalide compounds (3-alkyl-7-[(4,6-dimethoxypyrimidin-2-yl)oxy]phthalide derivatives: Type 2) and the ketal derivatives of 2-acyl-6-[(4,6-dimethoxypyrimidin-2-yl)oxy]benzoates (Type 3) were synthesized and their herbicidal activities measured. Methyl 2-acetyl-6-[(4,6-dimethoxypyrimidin-2-yl)oxy]benzoate gave excellent control of barnyard grass with a promising profile as a prototype rice herbicide.

  DOI：

  10.1002/(sici)1096-9063(199608)47:4<327::aid-ps432>3.0.co;2-u

文献信息

• Pyrimidine derivatives and herbicidal composition containing the same
  申请人：Kumiai Chemical Co.

  公开号：US05118339A1

  公开（公告）日：1992-06-02

  A pyrimidine or triazine derivative and its salt, said pyrimidine or triazine derivative having the formula: ##STR1## wherein R represents a group of the formula OR.sub.3 wherein R.sup.3 represents a hydrogen atom, an alkyl gorup, etc.}, a group of the formula SR.sup.6 wherein R.sup.6 represents a hydrogen atom, an alkyl group, etc.}, a group of the formula ##STR2## wherein R.sup.7 and R.sup.8 represent a hydrogen atom, an alkyl group, etc.}, or an imidazolyl group: R.sup.1 represents a hydrogen atom, an alkyl group, etc.; R.sup.2 represents a hydroxyl group, an alkyl group, etc.; A and B represent an alkyl group, etc.; Y represents an oxygen atom, etc.; and Z represents a methine group or a nitrogen atom.

  一种嘧啶或三嗪衍生物及其盐，所述嘧啶或三嗪衍生物具有以下结构式：##STR1## 其中R代表以下结构的一种：OR.sub.3 其中R.sup.3代表氢原子、烷基等}、SR.sup.6 其中R.sup.6代表氢原子、烷基等}、##STR2## 其中R.sup.7和R.sup.8代表氢原子、烷基等}或咪唑基团；R.sup.1代表氢原子、烷基等；R.sup.2代表羟基、烷基等；A和B代表烷基等；Y代表氧原子等；Z代表甲基基团或氮原子。
• CHEMICALLY AMPLIFIED POSITIVE-TYPE PHOTOSENSITIVE RESIN COMPOSITION, PHOTOSENSITIVE DRY FILM, METHOD OF MANUFACTURING PHOTOSENSITIVE DRY FILM, METHOD OF MANUFACTURING PATTERNED RESIST FILM, METHOD OF MANUFACTURING SUBSTRATE WITH TEMPLATE, METHOD OF MANUFACTURING PLATED ARTICLE, AND MERCAPTO COMPOUND
  申请人：TOKYO OHKA KOGYO CO., LTD.

  公开号：US20190121233A1

  公开（公告）日：2019-04-25

  A chemically amplified positive-type photosensitive resin composition capable of suppressing the occurrence of “footing” in which the width of the bottom (the side proximal to the surface of a support) becomes narrower than that of the top (the side proximal to the surface of a resist layer) in the nonresist portion; and the generation of development residue when a resist pattern serving as a template for a plated article is formed on a metal surface of a substrate using the photosensitive resin composition. A mercapto compound having a specific structure is included in the photosensitive resin composition, and includes an acid generator which generates acid upon exposure to an irradiated active ray or radiation, and a resin whose solubility in alkali increases under the action of acid.

  一种化学增感型正型光敏树脂组合物，能够抑制“足部”现象的发生，即底部（靠近支撑表面的一侧）的宽度变窄，小于顶部（靠近抗蚀层表面的一侧）的宽度，同时在使用该光敏树脂组合物在基板的金属表面上形成用作电镀物品模板的抗蚀图案时，能够减少残留物的产生。该光敏树脂组合物中包含一种具有特定结构的巯基化合物，其中包括一个酸发生剂，该酸发生剂在暴露于辐射活性光线或辐射时产生酸，以及一种树脂，在酸的作用下其在碱性溶液中的溶解度增加。
• Pyrimidine or triazine derivatives
  申请人：Kumiai Chemical Industry Co.

  公开号：US05302739A1

  公开（公告）日：1994-04-12

  Compounds of the formula ##STR1## as intermediates for the preparation of pyrimidine or triazine herbicides.

  化合物的公式为##STR1##，用于制备嘧啶或三嗪类除草剂的中间体。
• Pyrimidine or triazine derivatives and herbicidal composition containing the same
  申请人：KUMIAI CHEMICAL INDUSTRY CO., LTD.

  公开号：EP0435170A2

  公开（公告）日：1991-07-03

  A pyrimidine or triazine derivative and its salt, said pyrimidine or triazine derivative having the formula: wherein R represents a group of the formula OR3 wherein R3 represents a hydrogen atom, an alkyl group, etc.}, a group of the formula SR6 wherein R6 represents a hydrogen atom, an alkyl group, etc.}, a group of the formula (wherein R7 and R8 represent a hydrogen atom, an alkyl group, etc.}, or an imidazolyl group: R1 represents a hydrogen atom, an alkyl group, etc.; R2 represents a hydroxyl group, an alkyl group, etc.; A and B represent an alkyl group, etc.; Y represents an oxygen atom, etc.; and Z represents a methine group or a nitrogen atom.

  一种嘧啶或三嗪衍生物及其盐，所述嘧啶或三嗪衍生物具有以下式子： 其中 R 代表式 OR3 的基团式中 R3 代表氢原子、烷基等}，式 SR6 的基团式中 R6 代表氢原子、烷基等}，式 (其中 R7 和 R8 代表氢原子、烷基等}，或咪唑基团：R1 代表氢原子、烷基等； R2 代表羟基、烷基等； A 和 B 代表烷基等； Y 代表氧原子等；以及 Z 代表甲基或氮原子。
• Chemically amplified positive-type photosensitive resin composition, photosensitive dry film, method of manufacturing photosensitive dry film, method of manufacturing patterned resist film, method of manufacturing substrate with template, method of manufacturing plated article, and mercapto compound
  申请人：TOKYO OHKA KOGYO CO., LTD.

  公开号：US11022880B2

  公开（公告）日：2021-06-01

  A chemically amplified positive-type photosensitive resin composition capable of suppressing the occurrence of “footing” in which the width of the bottom (the side proximal to the surface of a support) becomes narrower than that of the top (the side proximal to the surface of a resist layer) in the nonresist portion; and the generation of development residue when a resist pattern serving as a template for a plated article is formed on a metal surface of a substrate using the photosensitive resin composition. A mercapto compound having a specific structure is included in the photosensitive resin composition, and includes an acid generator which generates acid upon exposure to an irradiated active ray or radiation, and a resin whose solubility in alkali increases under the action of acid.

  一种化学放大正型感光树脂组合物，能够抑制非抗蚀部分出现底部（靠近支撑物表面的一面）宽度比顶部（靠近抗蚀层表面的一面）宽度窄的 "起脚 "现象；以及当使用该感光树脂组合物在基底的金属表面上形成作为电镀物品模板的抗蚀图案时产生显影残留物。感光树脂组合物中含有一种具有特定结构的巯基化合物，它包括一种在受到照射的活性射线或辐射时产生酸的酸发生器，以及一种在酸的作用下其碱溶解度增加的树脂。