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3-(((2S,3R,4S,5R)-3,4,5-tris(benzyloxy)tetrahydro-2H-pyran-2-yl)oxy)propan-1-ol | 1310450-10-2

中文名称
——
中文别名
——
英文名称
3-(((2S,3R,4S,5R)-3,4,5-tris(benzyloxy)tetrahydro-2H-pyran-2-yl)oxy)propan-1-ol
英文别名
3-[(2S,3R,4S,5R)-3,4,5-tris(phenylmethoxy)oxan-2-yl]oxypropan-1-ol
3-(((2S,3R,4S,5R)-3,4,5-tris(benzyloxy)tetrahydro-2H-pyran-2-yl)oxy)propan-1-ol化学式
CAS
1310450-10-2
化学式
C29H34O6
mdl
——
分子量
478.585
InChiKey
LXQJNMHUPGIDRS-AIQXTLEGSA-N
BEILSTEIN
——
EINECS
——
  • 物化性质
  • 计算性质
  • ADMET
  • 安全信息
  • SDS
  • 制备方法与用途
  • 上下游信息
  • 反应信息
  • 文献信息
  • 表征谱图
  • 同类化合物
  • 相关功能分类
  • 相关结构分类

计算性质

  • 辛醇/水分配系数(LogP):
    3.8
  • 重原子数:
    35
  • 可旋转键数:
    13
  • 环数:
    4.0
  • sp3杂化的碳原子比例:
    0.38
  • 拓扑面积:
    66.4
  • 氢给体数:
    1
  • 氢受体数:
    6

上下游信息

  • 上游原料
    中文名称 英文名称 CAS号 化学式 分子量
  • 下游产品
    中文名称 英文名称 CAS号 化学式 分子量

反应信息

  • 作为反应物:
    描述:
    3-(dimethylamino)-α,α-diphenylbenzenemethanol 1-acetate 、 3-(((2S,3R,4S,5R)-3,4,5-tris(benzyloxy)tetrahydro-2H-pyran-2-yl)oxy)propan-1-ol甲苯 为溶剂, 反应 3.0h, 以91%的产率得到3-[diphenyl-[3-[(2S,3R,4S,5R)-3,4,5-tris(phenylmethoxy)oxan-2-yl]oxypropoxy]methyl]-N,N-dimethylaniline
    参考文献:
    名称:
    Development of Trityl-Based Photolabile Hydroxyl Protecting Groups
    摘要:
    A series of trityl-based photolabile hydroxyl protecting groups have been examined. These PPGs evolve from the traditional acid-labile trityl protecting group with proper electron-donating substituents. Structure-reactivity relationships have been explored. A m-dimethylamino group is crucial to achieve high photochemical deprotection efficiency. The o-hydroxyl group in 8 greatly improves the yield of the photochemical deprotection reaction, compared with the corresponding o-methoxyl-substituted counterpart 7. However, comparison between the photoreactions of 9 and 11 does not show similar structural relevance. The PPG in ether I (i.e., DMATr group) is structurally simple and easy to prepare and install. Its deprotection can be successfully carried out with irradiation of sunlight without requirement of photochemical devices.
    DOI:
    10.1021/jo200692c
  • 作为产物:
    描述:
    allyl 2,3,4-tri-O-benzyl-α-D-xylopyranosidedimethyl sulfide borane双氧水 、 sodium hydroxide 作用下, 以 四氢呋喃 为溶剂, 反应 6.0h, 以81%的产率得到3-(((2S,3R,4S,5R)-3,4,5-tris(benzyloxy)tetrahydro-2H-pyran-2-yl)oxy)propan-1-ol
    参考文献:
    名称:
    Development of Trityl-Based Photolabile Hydroxyl Protecting Groups
    摘要:
    A series of trityl-based photolabile hydroxyl protecting groups have been examined. These PPGs evolve from the traditional acid-labile trityl protecting group with proper electron-donating substituents. Structure-reactivity relationships have been explored. A m-dimethylamino group is crucial to achieve high photochemical deprotection efficiency. The o-hydroxyl group in 8 greatly improves the yield of the photochemical deprotection reaction, compared with the corresponding o-methoxyl-substituted counterpart 7. However, comparison between the photoreactions of 9 and 11 does not show similar structural relevance. The PPG in ether I (i.e., DMATr group) is structurally simple and easy to prepare and install. Its deprotection can be successfully carried out with irradiation of sunlight without requirement of photochemical devices.
    DOI:
    10.1021/jo200692c
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文献信息

  • Development of Trityl-Based Photolabile Hydroxyl Protecting Groups
    作者:Lei Zhou、Haishen Yang、Pengfei Wang
    DOI:10.1021/jo200692c
    日期:2011.8.5
    A series of trityl-based photolabile hydroxyl protecting groups have been examined. These PPGs evolve from the traditional acid-labile trityl protecting group with proper electron-donating substituents. Structure-reactivity relationships have been explored. A m-dimethylamino group is crucial to achieve high photochemical deprotection efficiency. The o-hydroxyl group in 8 greatly improves the yield of the photochemical deprotection reaction, compared with the corresponding o-methoxyl-substituted counterpart 7. However, comparison between the photoreactions of 9 and 11 does not show similar structural relevance. The PPG in ether I (i.e., DMATr group) is structurally simple and easy to prepare and install. Its deprotection can be successfully carried out with irradiation of sunlight without requirement of photochemical devices.
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