(cis/trans-2H-Octafluorcyclopentyl)methanol | 7481-14-3

• 分子结构分类: 有机化合物 - 有机卤素化合物 - 卤代醇
• 英文名称: (cis/trans-2H-Octafluorcyclopentyl)methanol
• 英文别名: 2,H-Octafluor cyclopentyl-methanol；(2H-Octafluorocyclopentyl)methanol, 97%；(1,2,2,3,3,4,4,5-octafluorocyclopentyl)methanol
• CAS: 7481-14-3
• 化学式: C₆H₄F₈O
• 分子量: 244.084
• InChiKey: HUONYCOHKSKXGH-UHFFFAOYSA-N

物化性质

• 沸点：
  134.7±40.0 °C(Predicted)
• 密度：
  1.61±0.1 g/cm3(Predicted)

计算性质

• 辛醇/水分配系数(LogP)：
  2
• 重原子数：
  15
• 可旋转键数：
  1
• 环数：
  1.0
• sp3杂化的碳原子比例：
  1.0
• 拓扑面积：
  20.2
• 氢给体数：
  1
• 氢受体数：
  9

反应信息

• 作为反应物：
  描述：

  (cis/trans-2H-Octafluorcyclopentyl)methanol 、 2-Fluoroprop-2-enoyl fluoride 在 2,6-二叔丁基-4-甲基苯酚 、 三乙胺 作用下， 以 乙醚 为溶剂， 以56%的产率得到α-Fluoracrylsaeure-(cis/trans-2H-octafluorcyclopentyl)-methylester
  参考文献：
  名称：

  合成vonα-Fluoracrylsäure和Derivaten

  摘要：

  Three new routes to derivatives of alpha-fluoracrylic acid, including a laboratory synthesis and a large-scale method, are reported. The processes are (i) addition of elementary fluorine to acrylic esters and subsequent elimination of HF; (ii) addition of difluorocarbene to isopropenyl methyl ether, oxidation via ring opening and dehalogenation; and (iii) 'nitrofluorination' of 2,3-dichloropropene, hydrolysis and dechlorination.

  DOI：

  10.1016/s0022-1139(00)80116-5
• 作为产物：
  描述：

  硼酸三甲酯 、 全氟环戊烯 在 水 作用下， 生成 (cis/trans-2H-Octafluorcyclopentyl)methanol
  参考文献：
  名称：

  Chambers, Richard D.; Grievson, Brian; Kelly, Noel M., Journal of the Chemical Society. Perkin transactions I, 1985, p. 2209 - 2214

  摘要：

  DOI：

文献信息

• Composition for Forming Films, Film Produced from Said Composition, and Method for Producing Organic Semiconductor Element Using Said Composition
  申请人：CENTRAL GLASS COMPANY, LIMITED

  公开号：US20160164047A1

  公开（公告）日：2016-06-09

  A film-forming composition according to the present invention includes: a fluororesin having a repeating unit of the formula (1) and a repeating unit of the general formula (2); and a fluorine-containing solvent. In the general formula (2), R 1 represents a C 1 -C 15 straight, C 3 -C 15 branched or C 3 -C 15 cyclic hydrocarbon group in which at least one hydrogen atom may be replaced by a fluorine atom or chlorine atom and which may have a hydroxy group. This film-forming composition is suitably usable for the manufacturing of an organic semiconductor element as the composition can form a fluororesin film on an organic semiconductor film; and the formed film has resistance to an etching solvent during the fine pattern processing of the organic semiconductor film by photolithography etc.
• Film-Forming Composition, Film Formed Thereby, and Method for Manufacturing Organic Semiconductor Element Using Same
  申请人：CENTRAL GLASS COMPANY, LIMITED

  公开号：US20160181531A1

  公开（公告）日：2016-06-23

  A film-forming composition according to the present invention includes: a fluororesin having a repeating unit of the general formula (1); and a fluorine-containing solvent. In the general formula (1), R 1 each independently represents a hydrogen atom, a fluorine atom, a methyl group or a trifluoromethyl group; and R 2 each independently represents a C 1 -C 15 straight, C 3 -C 15 branched or C 3 -C 15 cyclic fluorine-containing hydrocarbon group in which any hydrogen atom may be replaced by a fluorine atom with the proviso that the repeating unit contains at least one fluorine atom; and This film-forming composition is suitably usable for the manufacturing of an organic semiconductor element because the composition can form a film on an organic semiconductor film; and the formed film has resistance to an etching solvent during the fine pattern processing of the organic semiconductor film by photolithography etc.
• METHOD FOR PRODUCING SUBSTRATE WITH PATTERNED FILM
  申请人：CENTRAL GLASS COMPANY, LIMITED

  公开号：US20210200099A1

  公开（公告）日：2021-07-01

  The production method of a substrate with a patterned film according to the present disclosure includes: a cleaning step of performing UV/ozone cleaning or oxygen plasma cleaning on a substrate with a patterned film including a substrate and a patterned film on the substrate, to obtain a first substrate with a patterned film; and a heating step of heating the first substrate with a patterned film to obtain a second substrate with a patterned film, wherein the patterned film of the first substrate with a patterned film has a contact angle decreased in the cleaning step, and the patterned film of the second substrate with a patterned film has a contact angle recovered in the heating step.
• METHOD FOR PRODUCING SUBSTRATE WITH PATTERNED FILM AND FLUORINE-CONTAINING COPOLYMER
  申请人：CENTRAL GLASS COMPANY, LIMITED

  公开号：US20210317245A1

  公开（公告）日：2021-10-14

  The production method of a substrate with a patterned film according to the present disclosure includes: a cleaning step of performing UV/ozone cleaning or oxygen plasma cleaning on a substrate with a patterned film to obtain a first substrate with a patterned film, the substrate with a patterned film including a substrate and a patterned film on the substrate, the patterned film containing a fluorine-containing copolymer having a specific repeating unit; and a heating step of heating the first substrate with a patterned film to obtain a second substrate with a patterned film.
• US9842993B2
  申请人：——

  公开号：US9842993B2

  公开（公告）日：2017-12-12