申请人:Hoechst-Roussel Pharmaceuticals Inc.
公开号:US04663453A1
公开(公告)日:1987-05-05
The invention relates to benzopyrrolobenzodiazepines and quinobenzodiazepines of the formula ##STR1## where X and Y may be the same or different and each is hydrogen, halogen, CF.sub.3, lower alkyl, lower alkoxy, lower alkylthio and lower alkylsulfonyl, p and q are independently 1 or 2; R.sub.1 is hydrogen when R.sub.2 is bonded to R.sub.3 to form a --(CH.sub.2).sub.m --CH.sub.2 -- group or a --CH.dbd.CH-- group; R.sub.3 is hydrogen when R.sub.1 is bonded to R.sub.2 to form a --(CH.sub.2).sub.m --CH.sub.2 -- group or a --CH.dbd.CH-- group; m is 1 or 2; R.sub.4 is NR.sub.5 R.sub.6 wherein R.sub.5 is hydrogen or lower alkyl and R.sub.6 is hydrogen, lower alkyl or a group of the formula (CH.sub.2).sub.n NR.sub.7 R.sub.8 wherein R.sub.7 and R.sub.8 are lower alkyl, and n is 2 or 3, ##STR2## wherein R.sub.9 is lower alkyl, ##STR3## wherein R.sub.10 is CH.sub.2 CH.sub.2 OH, lower alkyl, phenyl, phenyl substituted by halogen, CF.sub.3, lower alkyl, lower alkoxy or lower alkylthio, benzyl, benzyl in which the phenyl group is substituted by halogen, CF.sub.3, lower alkyl, lower alkoxy or lower alkylthio or CO.sub.2 R.sub.11 wherein R.sub.11 is lower alkyl, or a pharmaceutically acceptable acid salt thereof.
本发明涉及式为##STR1##的苯并吡咯苯并二氮杂环己烷和喹诺苯并二氮杂环己烷,其中X和Y可以相同也可以不同,每个都是氢、卤素、CF.sub.3、低烷基、低烷氧基、低烷硫基和低烷基磺酰基,p和q是独立的1或2;当R.sub.2与R.sub.3结合形成--(CH.sub.2).sub.m --CH.sub.2 --基团或--CH.dbd.CH--基团时,R.sub.1为氢;当R.sub.1与R.sub.2结合形成--(CH.sub.2).sub.m --CH.sub.2 --基团或--CH.dbd.CH--基团时,R.sub.3为氢;m为1或2;R.sub.4为NR.sub.5 R.sub.6,其中R.sub.5为氢或低烷基,R.sub.6为氢、低烷基或(CH.sub.2).sub.n NR.sub.7 R.sub.8的基团,其中R.sub.7和R.sub.8为低烷基,n为2或3,##STR2##其中R.sub.9为低烷基,##STR3##其中R.sub.10为CH.sub.2 CH.sub.2 OH、低烷基、苯基、卤代苯基、CF.sub.3、低烷氧基或低烷硫基的取代苯基、苄基、卤代苄基、CF.sub.3、低烷氧基或低烷硫基的取代苄基或CO.sub.2 R.sub.11,其中R.sub.11为低烷基,或其药学上可接受的酸盐。