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2,5-Bis(2,2-dimethylpropionyl)thiophen | 37882-74-9

中文名称
——
中文别名
——
英文名称
2,5-Bis(2,2-dimethylpropionyl)thiophen
英文别名
2,2,2',2'-tetramethyl-1,1'-thiophene-2,5-diyl-bis-propan-1-one;1-[5-(2,2-Dimethylpropanoyl)thiophen-2-yl]-2,2-dimethylpropan-1-one
2,5-Bis(2,2-dimethylpropionyl)thiophen化学式
CAS
37882-74-9
化学式
C14H20O2S
mdl
——
分子量
252.378
InChiKey
XHWOXXSRYKOONN-UHFFFAOYSA-N
BEILSTEIN
——
EINECS
——
  • 物化性质
  • 计算性质
  • ADMET
  • 安全信息
  • SDS
  • 制备方法与用途
  • 上下游信息
  • 反应信息
  • 文献信息
  • 表征谱图
  • 同类化合物
  • 相关功能分类
  • 相关结构分类

计算性质

  • 辛醇/水分配系数(LogP):
    4.4
  • 重原子数:
    17
  • 可旋转键数:
    4
  • 环数:
    1.0
  • sp3杂化的碳原子比例:
    0.57
  • 拓扑面积:
    62.4
  • 氢给体数:
    0
  • 氢受体数:
    3

反应信息

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文献信息

  • PHOTOIMAGEABLE BRANCHED POLYMER
    申请人:Xu Hao
    公开号:US20090111057A1
    公开(公告)日:2009-04-30
    Novel, developer-soluble anti-reflective coating compositions and methods of using those compositions are provided. The compositions comprise a multi-functional acid reacted with a multi-functional vinyl ether to form a branched polymer or oligomer. In use, the compositions are applied to a substrate and thermally crosslinked. Upon exposure to light and post-exposure baking, the cured polymers/oligomers will decrosslink and depolymerize, rendering the layer soluble in typical photoresist developing solutions (e.g., alkaline developers).
  • US8206893B2
    申请人:——
    公开号:US8206893B2
    公开(公告)日:2012-06-26
  • [EN] PHOTOIMAGEABLE BRANCHED POLYMER<br/>[FR] POLYMÈRE RÉTICULÉ PHOTOSENSIBLE
    申请人:BREWER SCIENCE INC
    公开号:WO2009059031A2
    公开(公告)日:2009-05-07
    Novel, developer-soluble anti-reflective coating compositions and methods of using those compositions are provided. The compositions comprise a multi-functional acid reacted with a multi-functional vinyl ether to form a branched polymer or oligomer. In use, the compositions are applied to a substrate and thermally crosslinked. Upon exposure to light and post-exposure baking, the cured polymers/oligomers will decrosslink and depolymerize, rendering the layer soluble in typical photoresist developing solutions (e.g., alkaline developers).
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