9-ethoxyacridine | 73302-63-3

• 分子结构分类: 有机化合物 - 有机杂环化合物 - 喹啉及其衍生物
• 英文名称: 9-ethoxyacridine
• 英文别名: 9-Aethoxy-acridin
• CAS: 73302-63-3
• 化学式: C₁₅H₁₃NO
• mdl: MFCD04212564
• 分子量: 223.274
• InChiKey: IETBVHNTSXTIDT-UHFFFAOYSA-N

物化性质

• 熔点：
  92 °C
• 沸点：
  394.6±15.0 °C(Predicted)
• 密度：
  1.166±0.06 g/cm3(Predicted)

计算性质

• 辛醇/水分配系数(LogP)：
  3.9
• 重原子数：
  17
• 可旋转键数：
  2
• 环数：
  3.0
• sp3杂化的碳原子比例：
  0.13
• 拓扑面积：
  22.1
• 氢给体数：
  0
• 氢受体数：
  2

反应信息

• 作为反应物：
  描述：

  9-ethoxyacridine 在 甲醇 、 水 、 sodium hydrogensulfite 作用下， 生成 吖啶酮
  参考文献：
  名称：

  Lehmstedt, Chemische Berichte, 1935, vol. 68, p. 1455,1464

  摘要：

  DOI：
• 作为产物：
  描述：

  9-氯吖啶 、 sodium ethanolate 生成 9-ethoxyacridine
  参考文献：
  名称：

  DE364032

  摘要：

  公开号：

文献信息

• 312. Nucleophilic displacement reactions in aromatic systems. Part V. Kinetics of the reactions of some chloroazanaphthalenes and related compounds with ethoxide ions and with piperidine
  作者：N. B. Chapman、D. Q. Russell-Hill

  DOI：10.1039/jr9560001563

  日期：——
• DE367084
  申请人：——

  公开号：——

  公开（公告）日：——
• Synthesis of acridinyl- and fluorenylidenehydrazido derivatives of p-tert-Butylcalix[4]arene
  作者：E. A. Alekseeva、E. A. Lyakhova、A. S. Karpenko、A. P. Luk’yanenko、A. V. Mazepa、A. I. Gren’

  DOI：10.1134/s1070363207060199

  日期：2007.6

  p-tert-Butylcalix[4]arenes substituted at the lower rim by acetic acid hydrazide residues reacted with methoxy(ethoxy)acridine and fluoren-9-one derivatives to give a series of calixarenes containing N'-fluorenylidene- and N'-acridinylacetohydrazide residues. It was found that modification of the hydrazide moiety does not affect the conformation of the initial macroring and that it can lead in some cases to unsymmetrically substituted calixarenes.
• COMPOSITION
  申请人：Adeka Corporation

  公开号：EP3339331B1

  公开（公告）日：2022-02-16
• PHOTOSENSITIVE RESIN COMPOSITION, PHOTOSENSITIVE ELEMENT, CURED PRODUCT, SEMICONDUCTOR DEVICE, METHOD FOR FORMING RESIST PATTERN, AND METHOD FOR PRODUCING CIRCUIT SUBSTRATE
  申请人：Hitachi Chemical Company, Ltd.

  公开号：US20170329220A1

  公开（公告）日：2017-11-16

  A photosensitive resin composition comprises: a resin having a phenolic hydroxyl group; a photosensitive acid generator; a compound having at least one selected from the group consisting of an aromatic ring, a heterocycle and an alicycle, and at least one selected from the group consisting of a methylol group and an alkoxyalkyl group; an aliphatic compound having two or more functional groups being at least one selected from the group consisting of an acryloyloxy group, a methacryloyloxy group, a glycidyloxy group, an oxetanyl alkyl ether group, a vinyl ether group and a hydroxyl group; and a compound having at least one skeleton selected from the group consisting of an anthracene skeleton, a phenanthrene skeleton, a pyrene skeleton, a perylene skeleton, a carbazole skeleton, a phenothiazine skeleton, a xanthone skeleton, a thioxanthone skeleton, an acridine skeleton, a phenylpyrazoline skeleton, a distyrylbenzene skeleton and a distyrylpyridine skeleton, or a benzophenone compound.