Lagutschewa; Petrow, Sb. Statei Obshch. Khim., 1953, p. 1347,1350
作者:Lagutschewa、Petrow
DOI:——
日期:——
Mono-adducts of ethylene oxide and acetylenic glycols
申请人:AIR REDUCTION
公开号:US02863926A1
公开(公告)日:1958-12-09
COMPOSITIONS AND PROCESSES FOR PHOTOLITHOGRAPHY
申请人:Wang Deyan
公开号:US20130017487A1
公开(公告)日:2013-01-17
Topcoat layer compositions are provided that are applied above a photoresist composition. The compositions find particular applicability to immersion lithography processing.
Petrow; Lagutschewa, Zhurnal Prikladnoi Khimii, 1955, vol. 28, p. 111,113;engl.Ausg.S.103