摩熵化学
数据库官网
小程序
打开微信扫一扫
首页 分子通 化学资讯 化学百科 反应查询 关于我们
请输入关键词

2-methyl-3-(3-nitro-4-methoxyphenyl)acrylic acid chloride | 1416226-18-0

中文名称
——
中文别名
——
英文名称
2-methyl-3-(3-nitro-4-methoxyphenyl)acrylic acid chloride
英文别名
3-(4-Methoxy-3-nitrophenyl)-2-methylprop-2-enoyl chloride
2-methyl-3-(3-nitro-4-methoxyphenyl)acrylic acid chloride化学式
CAS
1416226-18-0
化学式
C11H10ClNO4
mdl
——
分子量
255.658
InChiKey
DWDBCTBHAUDNOE-UHFFFAOYSA-N
BEILSTEIN
——
EINECS
——
  • 物化性质
  • 计算性质
  • ADMET
  • 安全信息
  • SDS
  • 制备方法与用途
  • 上下游信息
  • 反应信息
  • 文献信息
  • 表征谱图
  • 同类化合物
  • 相关功能分类
  • 相关结构分类

计算性质

  • 辛醇/水分配系数(LogP):
    3
  • 重原子数:
    17
  • 可旋转键数:
    3
  • 环数:
    1.0
  • sp3杂化的碳原子比例:
    0.18
  • 拓扑面积:
    72.1
  • 氢给体数:
    0
  • 氢受体数:
    4

上下游信息

  • 下游产品
    中文名称 英文名称 CAS号 化学式 分子量

反应信息

  • 作为反应物:
    描述:
    咪唑2-methyl-3-(3-nitro-4-methoxyphenyl)acrylic acid chloride三乙胺 作用下, 以 乙醚 为溶剂, 反应 1.0h, 以50%的产率得到1-Imidazol-1-yl-3-(4-methoxy-3-nitrophenyl)-2-methylprop-2-en-1-one
    参考文献:
    名称:
    안료 분산액 및 그것을 사용한 감광성 수지 조성물의 제조 방법
    摘要:
    The dispersibility of the pigment after a period of time is good, and a photosensitive resin composition capable of forming fine patterns with low exposure doses and high resolution can be provided with a pigment dispersion liquid that can be applied even after a period of time, and a method for manufacturing a photosensitive resin composition using the pigment dispersion liquid. The pigment dispersion liquid related to the present invention contains a pigment, a solvent, and a compound represented by formula (1). In the formula, R1 and R2 independently represent a hydrogen atom or an organic group, but at least one of them represents an organic group. R1 and R2 may form a cyclic structure by bonding, and may include a bond of a hetero atom. R3 represents a single bond or an organic group. R4 to R9 independently represent a hydrogen atom, an organic group, etc., but R6 and R7 do not become hydroxy groups. R10 represents a hydrogen atom or an organic group.
    公开号:
    KR102140676B1
点击查看最新优质反应信息

文献信息

  • Negative-type photosensitive resin composition, pattern forming method, cured film, insulating film, color filter, and display device
    申请人:Shiota Dai
    公开号:US09244346B2
    公开(公告)日:2016-01-26
    A negative-type photosensitive resin composition capable of forming a pattern having favorable adhesiveness at a low light exposure; a pattern forming method using the resin composition; a cured film, an insulating film, a color filter formed using resin composition; and a display device provided with the cured film, insulating film, or color filter. The resin composition contains a compound represented by the following formula (1). In the formula, R1 and R2 each independently indicate a hydrogen atom or an organic group, but at least one indicates an organic group. R1 and R2 may be bonded to form a ring structure and may contain a hetero atom bond. R3 indicates a single bond or an organic group. R4 to R9 each independently indicate a hydrogen atom, an organic group, etc., but R6 and R7 are never hydroxyl groups. R10 indicates a hydrogen atom or an organic group.
    一种负型光敏树脂组合物,能够在低光照下形成具有良好粘附性的图案;使用该树脂组合物的图案形成方法;使用该树脂组合物形成的固化膜、绝缘膜、彩色滤光片;以及具有固化膜、绝缘膜或彩色滤光片的显示装置。该树脂组合物包含以下式(1)所表示的化合物。在该式中,R1和R2各自独立表示氢原子或有机基团,但至少一个表示有机基团。R1和R2可以结合形成环状结构,并且可以含有杂原子键。R3表示单键或有机基团。R4到R9各自独立表示氢原子、有机基团等,但R6和R7永远不是羟基。R10表示氢原子或有机基团。
  • NOVEL BASE GENERATOR AND ADHESION ENHANCER
    申请人:Tokyo Ohka Kogyo Co., Ltd.
    公开号:EP2725011B1
    公开(公告)日:2021-10-27
查看更多