Compound, resin, photoresist composition and process for producing photoresist pattern
申请人:SUMITOMO CHEMICAL COMPANY, LIMITED
公开号:US10747111B2
公开(公告)日:2020-08-18
A compound represented by the formula (I):
wherein R1, R2, R3, R4, X1, X2, Xa, Xb, L1, L2, L3 and L4 are defined in the specification.
式 (I) 所代表的化合物:
其中 R1、R2、R3、R4、X1、X2、Xa、Xb、L1、L2、L3 和 L4 的定义见说明书。