4-oxo-adamantan-1-yl methacrylate | 305379-04-8

• 分子结构分类: 有机化合物 - 有机氧化合物
• 英文名称: 4-oxo-adamantan-1-yl methacrylate
• 英文别名: 4-oxo-1-adamantyl methacrylate；(4-oxo-1-adamantyl) 2-methylprop-2-enoate
• CAS: 305379-04-8
• 化学式: C₁₄H₁₈O₃
• 分子量: 234.295
• InChiKey: GMEKUZSUMTULSW-UHFFFAOYSA-N

物化性质

• 沸点：
  334.4±35.0 °C(Predicted)
• 密度：
  1.16±0.1 g/cm3(Predicted)

计算性质

• 辛醇/水分配系数(LogP)：
  2.1
• 重原子数：
  17
• 可旋转键数：
  3
• 环数：
  4.0
• sp3杂化的碳原子比例：
  0.71
• 拓扑面积：
  43.4
• 氢给体数：
  0
• 氢受体数：
  3

反应信息

• 作为反应物：
  描述：

  4-oxo-adamantan-1-yl methacrylate 在 四氧化锇 、 N-甲基吗啉氧化物 作用下， 以 氯仿 为溶剂， 反应 24.0h， 生成 (4-Oxo-1-adamantyl) 2,3-dihydroxy-2-methylpropanoate
  参考文献：
  名称：

  SALT, PHOTORESIST COMPOSITION AND METHOD FOR PRODUCING PHOTORESIST PATTERN

  摘要：

  一种光阻剂组合物，包括由式(I)表示的盐：其中Q1和Q2分别独立表示氟原子或C1-C6全氟烷基基团，R1、R2和R3分别独立表示氢原子或C1-C10一价脂肪饱和碳氢基团，X1和X2分别独立表示单键、羰基或C1-C10双价脂肪饱和碳氢基团，其中氢原子可以被羟基取代，亚甲基基团可以被氧原子、磺酰基或羰基取代，A1表示C1-C30有机基，m1表示1到4的整数，Z+表示有机阳离子，以及一种树脂，该树脂在酸的作用下几乎不溶或不溶，但在水性碱溶液中可溶。

  公开号：

  US20130040237A1
• 作为产物：
  描述：

  5-羟基-2-金刚烷酮 、 2,2'-亚甲基双-(4-甲基-6-叔丁基苯酚) 、 甲基丙烯酰氯 在 盐酸 、 4-二甲氨基吡啶 、 三乙胺 作用下， 以 二氯甲烷 、 甲苯 为溶剂， 以70%的产率得到4-hydroxy-adamantan-1-yl methacrylate
  参考文献：
  名称：

  POSITIVE RESIST COMPOSITION AND PATTERNING PROCESS

  摘要：

  一种正性光刻胶组合物包括（A）在酸的作用下在碱性显影剂中变得可溶的树脂组分和（B）酸发生剂。树脂（A）是一种聚合物，包含由式（1）表示的非离去羟基的重复单元，其中R1为H、甲基或三氟甲基，X为单键或亚甲基，m为1或2，并且羟基连接到次级碳原子。当通过光刻工艺处理时，该组合物在分辨率方面得到改善。

  公开号：

  US20100062374A1

文献信息

• MONOMER HAVING ELECTRON-WITHDRAWING SUBSTITUENT AND LACTONE SKELETON, POLYMERIC COMPOUND, AND PHOTORESIST COMPOSITION
  申请人：Koyama Hiroshi

  公开号：US20100297555A1

  公开（公告）日：2010-11-25

  Disclosed is a monomer having an electron-withdrawing substituent and a lactone skeleton, represented by following Formula (1), wherein R a represents, e.g., a hydrogen atom or an alkyl group having 1 to 6 carbon atoms; R 1 represents, e.g., a halogen atom or an alkyl or haloalkyl group having 1 to 6 carbon atoms; “A” represents an alkylene group having 1 to 6 carbon atoms, oxygen atom, sulfur atom, or nonbonding; “m” denotes an integer of 0 to 8; Xs each represent an electron-withdrawing substituent; “n” denotes an integer of 1 to 9; and Y represents a bivalent organic group having 1 to 6 carbon atoms. The monomer is useful typically as a monomer component typically for a highly functional polymer, because, when the monomer is applied typically to a resist resin, the resin is satisfactory stable and resistant typically to chemicals, is highly soluble in organic solvents, and has improved hydrolyzability and/or solubility in water after hydrolysis.

  揭示了一种具有吸电子取代基和内酯骨架的单体，由以下式（1）表示，其中R代表，例如，氢原子或具有1至6个碳原子的烷基基团；R1代表，例如，卤素原子或具有1至6个碳原子的烷基或卤代烷基基团；“A”代表具有1至6个碳原子的烷基基团、氧原子、硫原子或非键合基团；“m”表示0至8的整数；Xs各自代表吸电子取代基；“n”表示1至9的整数；Y代表具有1至6个碳原子的二价有机基团。该单体通常用作高功能聚合物的单体组分，因为当该单体通常应用于抗蚀树脂时，树脂通常具有较高的稳定性和抗化学品性能，对有机溶剂具有较高的溶解性，并在水解后具有改善的水解性和/或水溶性。
• MONOMER HAVING N-ACYL CARBAMOYL GROUP AND LACTONE SKELETON, AND POLYMERIC COMPOUND
  申请人：DAICEL CORPORATION

  公开号：US20160060374A1

  公开（公告）日：2016-03-03

  Disclosed is a monomer containing an N-acylcarbamoyl group and a lactone skeleton. The monomer is exemplified by Formula (1): where R a is selected typically from hydrogen and C 1 -C 6 alkyl; R 1 is, independently in each occurrence, selected typically from halogen and optionally halogenated C 1 -C 6 alkyl; “A” is selected from C 1 -C 6 alkylene, oxygen, sulfur, and non-bond; m represents an integer of 0 to 8; X represents, independently in each occurrence, specific N-acylcarbamoyl; n represents an integer of 1 to 9; and Y represents a C 1 -C 6 divalent organic group.

  揭示了一种含有N-酰基氨酰基基团和内酯骨架的单体。该单体以式(1)为例，其中R通常选择自氢和C1-C6烷基；R1在每次出现时，通常选择自卤素和可选择卤代的C1-C6烷基；“A”选择自C1-C6亚烷基、氧、硫和非键合；m表示0到8的整数；X在每次出现时独立选择特定的N-酰基氨酰基；n表示1到9的整数；Y代表C1-C6二价有机基团。
• RADIATION-SENSITIVE RESIN COMPOSITION, RESIST PATTERN-FORMING METHOD, POLYMER, AND METHOD FOR PRODUCING COMPOUND
  申请人：JSR CORPORATION

  公开号：US20150323866A1

  公开（公告）日：2015-11-12

  A radiation-sensitive resin composition contains: a polymer having a structural unit that includes a group represented by formula (1); a radiation-sensitive acid generator; and an organic solvent. In the formula (1), R P represents a hydrogen atom or a monovalent organic group, and * denotes a binding site to a rest of the structural unit other than the group represented by the formula (1). It is preferred that R P in the formula (1) represents a monovalent organic group, and the monovalent organic group is an acid-nonlabile group. It is also preferred that R P in the formula (1) represents a monovalent organic group, and the monovalent organic group is an acid-labile group.

  一种辐射敏感的树脂组合物包含：具有结构单元的聚合物，该结构单元包括由公式（1）表示的基团；辐射敏感的酸发生剂；和有机溶剂。在公式（1）中，RP表示氢原子或一价有机基团，*表示与公式（1）中表示的基团以外的结构单元的其余部分的结合位点。优选的是，在公式（1）中，RP表示一价有机基团，该一价有机基团是不可酸解的基团。还优选在公式（1）中，RP表示一价有机基团，该一价有机基团是可酸解的基团。
• Polymeric compound and resin composition for photoresist
  申请人：——

  公开号：US20020169266A1

  公开（公告）日：2002-11-14

  A photoresist polymeric compound includes a monomer unit represented by following Formula (I): 1 The polymeric compound may further include at least one of monomer units represented by following Formulae (IIa) to 2 wherein R 1 , R 13 , R 14 and R 15 are each a hydrogen atom or methyl group; R 2 and R 3 are each a hydrocarbon group having from 1 to 8 carbon atoms; R 4 , R 5 and R 6 are each a hydrogen atom, hydroxyl group or a methyl group; R 7 and R 8 are each a hydrogen atom, hydroxyl group or —COOR 9 group, where R 9 is a t-butyl group, 2-tetrahydropyranyl group, etc.; R 10 and R 11 are each a hydrogen atom, hydroxyl group or oxo group; R 12 is a hydrocarbon group having a tertiary carbon atom at a bonding site with an oxygen atom indicated in the formula; R 16 is a t-butyl group, 2-tetrahydropyranyl group, etc.; and n denotes an integer from 1 to 3. The photoresist polymeric compound can exhibit high adhesion to substrates and can highly precisely form fine patterns.

  一种光阻聚合物化合物包括以下式(I)所表示的单体单元：1该聚合物化合物还可以包括以下式(IIa)至(IIb)所表示的至少一种单体单元中的至少一种：其中，R1、R13、R14和R15均为氢原子或甲基基团；R2和R3均为具有1至8个碳原子的碳氢基团；R4、R5和R6均为氢原子、羟基或甲基基团；R7和R8均为氢原子、羟基或-COOR9基团，其中R9为叔丁基基团、2-四氢呋喃基团等；R10和R11均为氢原子、羟基或酮基；R12为具有在公式中指示的氧原子与三级碳原子成键位的碳氢基团；R16为叔丁基基团、2-四氢呋喃基团等；n表示1至3的整数。该光阻聚合物化合物可以表现出对基材的高粘附性，并可以高精度地形成细小图案。
• Unsaturated carboxylic acid hemicacetal ester, polymeric compound and photoresist resin composition
  申请人：Koyama Hiroshi

  公开号：US20060160247A1

  公开（公告）日：2006-07-20

  A polymeric compound having a repeated unit corresponding to an unsaturated carboxylic acid hemiacetal ester represented by the following formula (1); wherein R a is a hydrogen atom, a halogen atom, an alkyl group of carbon number 1 to 6 or a haloalkyl group of carbon number 1 to 6, R b is a hydrocarbon group having a hydrogen atom at a first poison, R c is a hydrogen atom or a hydrocarbon group and R d is an organic group having a cyclic skeleton. This polymeric compound, further, may have a repeated unit corresponding to at least one monomer selected from a monomer having a lactone skeleton, a monomer having a cyclic ketone skeleton, a monomer having an acid anhydride group and a monomer having an imide group [except for a repeated unit corresponding to the said unsaturated carboxylic acid hemiacetal ester] and/or a repeated unit corresponding to at least one monomer selected from a monomer having a hydroxyl group and others. This polymeric compound shows superior acid-eliminating function in case of using as photoresist.

  一种聚合物化合物，其重复单元对应于由以下式（1）表示的不饱和羧酸半缩醛酯： 其中，R为氢原子，卤素原子，碳数为1到6的烷基或碳数为1到6的卤代烷基，Rb为在第一位置具有氢原子的碳氢基，Rc为氢原子或碳氢基，而Rd为具有环状骨架的有机基团。此聚合物化合物还可以具有对应于至少一种单体的重复单元，所述单体具有内酯骨架、环状酮骨架、酸酐基或亚酰胺基[除了对应于所述不饱和羧酸半缩醛酯的重复单元]和/或对应于至少一种具有羟基的单体的重复单元和其他单体。该聚合物化合物在用作光刻胶时表现出优越的酸消除功能。