5-hydroxy-adamantan-2-yl methacrylate | 366809-04-3

• 分子结构分类: 有机化合物 - 有机氧化合物
• 英文名称: 5-hydroxy-adamantan-2-yl methacrylate
• 英文别名: (5-hydroxy-2-adamantyl) 2-methylprop-2-enoate
• CAS: 366809-04-3
• 化学式: C₁₄H₂₀O₃
• 分子量: 236.311
• InChiKey: UESLRMFVTAXQIO-UHFFFAOYSA-N

物化性质

• 沸点：
  336.4±35.0 °C(Predicted)
• 密度：
  1.16±0.1 g/cm3(Predicted)

计算性质

• 辛醇/水分配系数(LogP)：
  2.2
• 重原子数：
  17
• 可旋转键数：
  3
• 环数：
  4.0
• sp3杂化的碳原子比例：
  0.79
• 拓扑面积：
  46.5
• 氢给体数：
  1
• 氢受体数：
  3

反应信息

• 作为产物：
  描述：

  甲基丙烯酸酐 、 2,2'-亚甲基双-(4-甲基-6-叔丁基苯酚) 、 1,4-金刚烷二醇 在 吡啶 作用下， 以 乙醚 、 水 为溶剂， 以51%的产率得到5-hydroxy-adamantan-2-yl methacrylate
  参考文献：
  名称：

  POSITIVE RESIST COMPOSITION AND PATTERNING PROCESS

  摘要：

  一种正相光刻胶组合物包括（A）在酸的作用下在碱性显影剂中变得可溶的树脂组分和（B）酸发生剂。树脂（A）是一种聚合物，包含由式（1）表示的非脱离羟基的重复单元，其中R1是H、甲基或三氟甲基，Y是H或OH，至少一个Y为OH，并且波浪线表示键的不确定方向。该组合物在光刻加工时具有更好的分辨率。

  公开号：

  US20100062373A1

文献信息

• SALT, ACID GENERATOR, RESIST COMPOSITION AND METHOD FOR PRODUCING RESIST PATTERN
  申请人：SUMITOMO CHEMICAL COMPANY, LIMITED

  公开号：US20160168115A1

  公开（公告）日：2016-06-16

  A salt represented by formula (I): wherein R 1 and R 2 independently represent a hydrogen atom, a hydroxy group or a C 1 to C 12 hydrocarbon group in which a methylene group may be replaced by a —O— or —CO—; m and n independently represent 1 or 2; Ar represents an optionally substituted phenyl group; Q 1 and Q 2 independently represent a fluorine atom or a C 1 to C 6 perfluoroalkyl group, A 1 represents a single bond, a C 1 to C 24 alkanediyl group or the like, and Y represents an optionally substituted C 1 to C 18 alkyl group or monovalent C 3 to C 18 alicyclic hydrocarbon group, and a methylene group therein may be replaced by a —O—, O— or —SO 2 —, provided that the alkyl group or the alicyclic hydrocarbon group has at least one substituent, or at least one methylene group contained therein is replaced by a —O—, —CO— or —SO 2 —.

  一种由化学式（I）表示的盐：其中R1和R2分别表示氢原子、羟基或C1到C12的烃基，其中亚甲基可能被—O—或—CO—取代；m和n分别表示1或2；Ar表示可选取代的苯基；Q1和Q2分别表示氟原子或C1到C6的全氟烷基基团，A1表示单键，C1到C24的烷二基基团或类似物，Y表示可选取代的C1到C18的烷基基团或一价的C3到C18的脂环烃基团，其中的亚甲基团可能被—O—、O—或—SO2—取代，前提是烷基基团或脂环烃基团至少有一个取代基，或其中至少一个亚甲基团被—O—、—CO—或—SO2—取代。
• PHOTOSENSITIVE COMPOSITION, PATTERN FORMING METHOD USING THE PHOTOSENSITIVE COMPOSITION AND COMPOUND FOR USE IN THE PHOTOSENSITIVE COMPOSITION
  申请人：Wada Kenji

  公开号：US20100233617A1

  公开（公告）日：2010-09-16

  A photosensitive composition includes: (A) a resin containing a repeating unit corresponding to a compound represented by the following formula (I); the resin being capable of producing an acid group upon irradiation with an actinic ray or radiation: Z-A-X—B—R   (I) wherein Z represents a group capable of becoming an acid group resulting from leaving of a cation upon irradiation with an actinic ray or radiation; A represents an alkylene group; X represents a single bond or a heteroatom-containing divalent linking group; B represents a single bond, an oxygen atom or —N(Rx)-; Rx represents a hydrogen atom or a monovalent organic group; R represents a monovalent organic group substituted by Y; when B represents —N(Rx)-, R and Rx may combine with each other to form a ring; and Y represents a polymerizable group.

  一种感光组合物包括：（A）含有与下式（I）所表示的化合物对应的重复单元的树脂；该树脂能够在受到光敏射线或辐射照射后产生酸基团：Z-A-X—B—R   （I）其中Z代表一个能够在受到光敏射线或辐射照射后由阳离子离去而形成酸基团的基团；A代表一个烷基基团；X代表一个单键或含杂原子的二价连接基团；B代表一个单键、一个氧原子或—N（Rx）-；Rx代表一个氢原子或一个一价有机基团；R代表一个通过Y取代的一价有机基团；当B代表—N（Rx）-时，R和Rx可以结合在一起形成一个环；Y代表一个可聚合的基团。
• SALT, PHOTORESIST COMPOSITION, AND METHOD FOR PRODUCING PHOTORESIST PATTERN
  申请人：ANRYU Yukako

  公开号：US20120328986A1

  公开（公告）日：2012-12-27

  A salt represented by formula (I): wherein Q 1 and Q 2 independently each represent a fluorine atom or a C1-C6 perfluoroalkyl group, n represents 0 or 1, L l represents a single bond or a C1-C10 alkanediyl group in which a methylene group may be replaced by an oxygen atom or carbonyl group, provided that L l is not a single bond when n is 0, ring W represents a C3-C36 aliphatic ring in which a methylene group may be replaced by an oxygen atom, a sulfur atom, a carbonyl group or a sulfonyl group and in which a hydrogen atom may be replaced by a hydroxyl group, a C1-C12 alkyl group or a C1-C12 alkoxy group, R l represents a hydroxyl group or a hydroxyl group protected by a protecting group, and Z + represents an organic cation.

  一种用化学式(I)表示的盐：其中Q1和Q2分别表示氟原子或C1-C6全氟烷基基团，n表示0或1，Ll表示单键或C1-C10脂肪二基团，其中一个亚甲基基团可被氧原子或羰基取代，但当n为0时，Ll不是单键，环W表示C3-C36脂肪环，其中一个亚甲基基团可被氧原子、硫原子、羰基或磺酰基取代，氢原子可被氢氧基、C1-C12烷基基团或C1-C12烷氧基取代，Rl表示氢氧基或受保护的氢氧基，Z+表示有机阳离子。
• RESIST COMPOSITION, METHOD OF FORMING RESIST PATTERN, COMPOUND AND ACID GENERATOR INCLUDING THE SAME
  申请人：KAWAUE Akiya

  公开号：US20100081088A1

  公开（公告）日：2010-04-01

  A resist composition including a base component (A) which exhibits changed solubility in an alkali developing solution under the action of acid and an acid-generator component (B) which generates acid upon exposure, wherein the acid-generator component (B) includes an acid generator (B1) composed of a compound having a base dissociable group within a cation moiety.

  一种抗蚀组合物，包括一种基础成分(A)，在碱性显影液中在酸的作用下表现出改变的溶解度，以及一种酸发生器成分(B)，在曝光后生成酸，其中酸发生器成分(B)包括一种酸发生器(B1)，该酸发生器由具有阳离子部分中的碱性可解离基团的化合物组成。
• Resin suitable for an acid generator and a chemically amplified positive resist composition containing the same
  申请人：Ando Nobuo

  公开号：US20070149702A1

  公开（公告）日：2007-06-28

  The present invention provides a resin which generates an acid by irradiation and is a salt of an organic cation and an anionic polymer wherein the anionic polymer has no carbon-carbon unsaturated bond. The present invention further provides a chemically amplified resist composition comprising the same.

  本发明提供了一种树脂，通过辐射产生酸，是有机阳离子和阴离子聚合物的盐，其中阴离子聚合物没有碳-碳不饱和键。本发明还提供了包含该树脂的化学增感光阻组合物。