Polymerizable silicon-containing compounds of formula (1) wherein R1 is hydrogen, halogen or monovalent organic group are polymerized into polymers. A resist composition comprising the polymer as a base resin is sensitive to high-energy radiation, has excellent sensitivity and resolution at a wavelength of less than 300 nm, and high resistance to oxygen plasma etching, and thus lends itself to micropatterning for the fabrication of VLSIs
具有以下
化学式(1)的可聚合
硅含有化合物,在其中R1是氢、卤素或一价有机基团,可聚合成聚合物。以该聚合物为基础
树脂的抗蚀组合物对高能辐射敏感,在波长小于300纳米时具有优异的敏感性和分辨率,并具有高抗氧等离子体刻蚀性能,因此适用于微细图案化制造VLSI。