Polymerizable silicon-containing compound, manufacturing method, polymer, resist composition and patterning process
申请人:Shin-Etsu Chemical Co., Ltd.
公开号:US07192684B2
公开(公告)日:2007-03-20
Polymerizable silicon-containing compounds of formula (1) wherein R1 is hydrogen, halogen or monovalent organic group are polymerized into polymers. A resist composition comprising the polymer as a base resin is sensitive to high-energy radiation, has excellent sensitivity and resolution at a wavelength of less than 300 nm, and high resistance to oxygen plasma etching, and thus lends itself to micropatterning for the fabrication of VLSIs