Metal Complex Compound Comprising B-Diketonato Ligand
申请人:Kadota Takumi
公开号:US20080254216A1
公开(公告)日:2008-10-16
[PROBLEMS] To provide a metal complex compound capable of being suitably used for manufacturing a metal-containing thin film by the CVD method and a method for preparing a metal-containing thin film.
[MEANS FOR SOLVING PROBLEMS] A metal complex compound comprising a β-diketonato ligand having an alkoxyalkyl-methyl group, and a method for preparing a metal-containing thin film using the metal complex compound by the CVD method.