The present invention provides ester group-containing tertiary amine compounds of the formula (R
1
OCH
2
CH
2
)
n
N(CH
2
CH
2
CO
2
R
2
)
3-n
which, when used as additives in chemical amplification photolithography, can yield photoresists having a high resolution and an excellent focus margin. The present invention also provides a process comprising the step of subjecting a primary or secondary amine compound to Michael addition to an acrylic ester compound; a process comprising the steps of subjecting monoethanolamine or diethanolamine to Michael addition to an acrylic ester compound so as to form an ester group-containing amine compound and introducing a R
1
group to the resultant ester group-containing amine compound; and a process comprising the step of effecting the ester exchange reaction of an ester group-containing tertiary amine with R
2
OH.
本发明提供式(R
1
OCH
2
CH
2
)
n
N(CH
2
CH
2
CO
2
R
2
)
3-n
当用作
化学放大光刻技术的添加剂时,可产生具有高分辨率和优异聚焦余量的光刻胶。本发明还提供了一种工艺,包括将
伯胺或仲胺化合物与
丙烯酸酯化合物进行迈克尔加成的步骤;一种工艺,包括将一
乙醇胺或
二乙醇胺与
丙烯酸酯化合物进行迈克尔加成,从而形成含酯基的胺化合物,并引入 R
1
基团;以及一种工艺,包括以下步骤:使含酯基的叔胺与 R
2
OH。