[EN] POSITIVE TYPE PHOTOSENSITIVE POLYSILOXANE COMPOSITION<br/>[FR] COMPOSITION DE POLYSILOXANE PHOTOSENSIBLE DE TYPE POSITIF
申请人:MERCK PATENT GMBH
公开号:WO2020187685A1
公开(公告)日:2020-09-24
[Problem] To provide a positive type photosensitive polysiloxane composition that can manufacture a cured film having a high surface smoothness, in which generation of wrinkles is suppressed even without adding a curing auxiliary or performing flood exposure. [Means for Solution] A positive type photosensitive polysiloxane composition comprising (I) a polysiloxane, (II) a carboxylic acid compound that is a monocarboxylic acid or a dicarboxylic acid, of 200 to 50,000 ppm based on the total mass of the composition, (III) a diazonaphthoquinone derivative, and (IV) a solvent, and a method for manufacturing a cured film using the composition.
Hickman; Kenyon, Journal of the Chemical Society, 1957, p. 4677