A radiation sensitive polymer material comprising a polymer having (a) one ore more repeating units of the formula:
wherein R is an alkyl group, a halogen atom, a hydrogen atom or a dimethylamino group, and (b) an addition polymerizable repeating unit derived from a compound having a CH2 = C group in the molecule, and if necessary, one hydrate of metal chloride or nitrate, can give a positive type resist having excellent resistance to dry etching and being highly sensitive to radiation.
一种辐射敏感聚合物材料,包括一种聚合物,该聚合物具有(a)一个或多个式中的重复单元:
其中 R 是一个烷基、一个卤素原子、一个氢原子或一个二甲基氨基;(b) 一个可加成聚合的重复单元,该重复单元衍生自分子中含有一个 CH2 = C 基团的化合物,必要时还包括一个金属氯化物或硝酸盐的水合物。
HATOBA, L.;VASILEVA, E., FARMATSIYA, 40,(1990) N, S. 1-7
作者:HATOBA, L.、VASILEVA, E.
DOI:——
日期:——
US4419506A
申请人:——
公开号:US4419506A
公开(公告)日:1983-12-06
A Modified Mannich Reaction Using 1.3-Dioxolane.
作者:Kazuharu SUMITA、Masayuki KOUMORI、Sachio OHNO
DOI:10.1248/cpb.42.1676
日期:——
Mannich reaction of ketones using 1, 3-dioxolane instead of formaldehyde, paraformaldehyde, or 1, 3, 5-trioxane afforded the corresponding Mannich bases in high yields. Under the same conditions the aminomethylation of aromatics did not proceed but the intramolecular aminomethylation, like a Pictet-Spengler type reaction, proceeded smoothly.