Group 2 Metal Precursors For Depositing Multi-Component Metal Oxide Films
申请人:Lei Xinjian
公开号:US20080286464A1
公开(公告)日:2008-11-20
Novel Sr and Ba complexes containing both beta-diketonates and N-methyl-pyrrolidone were synthesized and characterized. TGA experiments indicated these complexes are volatile, they can be employed as potential precursors for ALD strontium titanate (STO) or barium strontium titanate films (BST) films in semiconductor fabrication.
Group 2 Metal Precursors for Depositing Multi-Component Metal Oxide Films
申请人:Lei Xinjian
公开号:US20090130338A1
公开(公告)日:2009-05-21
Novel Sr and Ba complexes containing both beta-diketonates and N-methyl-pyrrolidone were synthesized and characterized. TGA experiments indicated these complexes are volatile, they can be employed as precursors for ALD strontium titanate (STO) or barium strontium titanate films (BST) films in semiconductor fabrication.
Group 2 metal precursors for depositing multi-component metal oxide films
申请人:Air Products and Chemicals, Inc.
公开号:US08247617B2
公开(公告)日:2012-08-21
Novel Sr and Ba complexes containing both beta-diketonates and N-methyl-pyrrolidone were synthesized and characterized. TGA experiments indicated these complexes are volatile, they can be employed as precursors for ALD strontium titanate (STO) or barium strontium titanate films (BST) films in semiconductor fabrication.