PHOSPHONIUM ION CHANNEL BLOCKERS AND METHODS FOR USE
申请人:Nocion Therapeutics, Inc.
公开号:US20210128589A1
公开(公告)日:2021-05-06
The invention provides compounds of Formula (I), or pharmaceutically acceptable salts thereof:
The compounds, compositions, methods and kits of the invention are useful for the treatment of pain, itch, and neurogenic inflammation.
[EN] ESTER SUBSTITUTED ION CHANNEL BLOCKERS AND METHODS FOR USE<br/>[FR] BLOQUEURS DE CANAUX IONIQUES SUBSTITUÉS PAR UN ESTER ET MÉTHODES D'UTILISATION
申请人:NOCION THERAPEUTICS INC
公开号:WO2020185915A1
公开(公告)日:2020-09-17
The invention provides compounds of Formula (I), or pharmaceutically acceptable salts thereof. The compounds, compositions, methods and kits of the invention are useful for the treatment of pain, itch, and neurogenic inflammation.
The invention provides compounds of Formula (I), or pharmaceutically acceptable salts thereof:
The compounds, compositions, methods and kits of the invention are useful for the treatment of pain, cough, itch, and neurogenic inflammation.
[EN] SOLID FORMS OF ENTINOSTAT<br/>[FR] FORMES SOLIDES D'ENTINOSTAT
申请人:DR REDDY'S LABORATORIES LTD
公开号:WO2017216761A1
公开(公告)日:2017-12-21
Aspects of the present application relate to stable amorphous Entinostat, its amorphous solid dispersion, processes for their preparation and pharmaceutical compositions thereof. Further, aspects relate to crystalline form of Entinostat, process for its preparation and pharmaceutical compositions thereof
Polish compositions and polish vehicles useful therein
申请人:ROHM AND HAAS COMPANY
公开号:EP0120712A2
公开(公告)日:1984-10-03
Polymer compositions which are useful as polishes or polish polymer vehicles, especially floor polishes or vehicles therefor, contain emulsion copolymer containing from 3% to 50% by weight of units of acidic monomer, transition metal ionic crosslinking agent in an amount of at least 15% of the equivalent of the copolymer acid residues, and at least one basic salt or hydroxide or alkali metal in such an amount that the molar ratio of transition metal to alkali metal is from 10:0.1 to 1.0:3.0.
The presence of the alkali metal compound increases the wear resistance properties of films of the polish.