(E)-N-cyclohexyl-3-(2-hydroxyphenyl)propenamide | 224432-97-7

• 分子结构分类: 有机化合物 - 苯丙烷和聚酮 - 肉桂酸及其衍生物
• 英文名称: (E)-N-cyclohexyl-3-(2-hydroxyphenyl)propenamide
• 英文别名: (E)-N-cyclohexyl-3-(2-hydroxyphenyl)prop-2-enamide
• CAS: 224432-97-7
• 化学式: C₁₅H₁₉NO₂
• 分子量: 245.321
• InChiKey: BXLJEWHVJIGCFE-ZHACJKMWSA-N

物化性质

• 熔点：
  240-241 °C
• 沸点：
  480.2±37.0 °C(Predicted)
• 密度：
  1.14±0.1 g/cm3(Predicted)

计算性质

• 辛醇/水分配系数(LogP)：
  3.1
• 重原子数：
  18
• 可旋转键数：
  3
• 环数：
  2.0
• sp3杂化的碳原子比例：
  0.4
• 拓扑面积：
  49.3
• 氢给体数：
  2
• 氢受体数：
  2

反应信息

• 作为反应物：
  描述：

  (E)-N-cyclohexyl-3-(2-hydroxyphenyl)propenamide 在 4-二甲氨基吡啶 、 三乙胺 作用下， 以 四氢呋喃 、 甲醇 为溶剂， 反应 27.0h， 生成 2-<(Z)-3-(cyclohexylamino)-3-oxo-1-propenyl>phenyl acetate
  参考文献：
  名称：

  Two new improved approaches to the synthesis of coumarin-based prodrugs

  摘要：

  Our laboratory has recently reported the development of a coumarin-based, esterase-sensitive prodrug system for the preparation of prodrugs of amines, peptides, and peptidomimetics. Biological evaluations including animal studies have demonstrated me clinical potential of this prodrug system. However, the original synthetic method used required a long sequence of reactions with a relatively low overall yield. In this report, we describe two new approaches to the synthesis of these coumarin-based prodrugs. The first approach is a photochemical approach taking advantage of the photoisomerization of cinnamic acid and its derivatives. The second approach is through the catalytic hydrogenation of a triple bond for the generation of me cis double bond in the coumarinic acid moiety. Both approaches allow for the synthesis of these prodrugs in fewer steps with much improved overall yield. (C) 1999 Elsevier Science Ltd. All rights reserved.

  DOI：

  10.1016/s0040-4020(99)00121-0
• 作为产物：
  描述：

  反式-2-羟基肉桂酸 、 环己胺 在 4-二甲氨基吡啶 、 1-羟基苯并三唑 、 N,N'-二环己基碳二亚胺 作用下， 以 四氢呋喃 为溶剂， 以93%的产率得到(E)-N-cyclohexyl-3-(2-hydroxyphenyl)propenamide
  参考文献：
  名称：

  A Photo-Sensitive Protecting Group for Amines Based on Coumarin Chemistry.

  摘要：

  我们一直需要开发新的胺保护基团，这种保护基团可以在温和的条件下裂解，而且与现有的保护基团有本质区别。在本文中，我们报告了使用邻羟基反式肉桂酸作为胺的光敏保护基团的研究。该设计利用了邻羟基-顺式肉桂酸及其衍生物的反式-顺式光异构化和随之而来的简易内酯化。我们发现，对于具有不同结构特征的各种胺，保护和脱保护反应都能以高产率进行。脱保护反应使用低强度紫外光（365 纳米），这与其他常用氨基保护基团的脱保护条件有本质区别。因此，该方法是对其他现有方法的补充，可以对复杂有机分子中的不同官能团进行选择性操作。

  DOI：

  10.1248/cpb.45.715

文献信息

• Base generator
  申请人：Katayama Mami

  公开号：US08476444B2

  公开（公告）日：2013-07-02

  A photosensitive resin composition which is excellent in resolution, low in cost, and usable in a wide range of structures of polymer precursors each of which is reacted into a final product by a basic substance or by heating in the presence of a basic substance. The photosensitive resin composition includes a base generator which has a specific structure and generates a base by exposure to electromagnetic radiation and heating, and a polymer precursor which is reacted into a final product by the base generator and by a basic substance or by heating in the presence of a basic substance.

  这是一种光敏树脂组合物，具有高分辨率、低成本和可用于各种聚合物前体结构的优点，每种聚合物前体通过碱性物质反应或在碱性物质存在下加热反应成为最终产品。光敏树脂组合物包括一种具有特定结构的碱发生剂，通过电磁辐射和加热产生碱性物质，以及一种聚合物前体，通过碱发生剂和碱性物质反应或在碱性物质存在下加热反应成为最终产品。
• BASE GENERATOR, PHOTOSENSITIVE RESIN COMPOSITION, PATTERN FORMING MATERIAL COMPRISING THE PHOTOSENSITIVE RESIN COMPOSITION, AND PATTERN FORMING METHOD AND ARTICLE USING THE PHOTOSENSITIVE RESIN COMPOSITION
  申请人：Katayama Mami

  公开号：US20110086311A1

  公开（公告）日：2011-04-14

  A photosensitive resin composition which is excellent in resolution, low in cost, and usable in a wide range of structures of polymer precursors each of which is reacted into a final product by a basic substance or by heating in the presence of a basic substance. The photosensitive resin composition includes a base generator which has a specific structure and generates a base by exposure to electromagnetic radiation and heating, and a polymer precursor which is reacted into a final product by the base generator and by a basic substance or by heating in the presence of a basic substance.

  一种光敏树脂组合物，具有分辨率优良、成本低廉和可用于一系列聚合物前体结构的特点，其中每种聚合物前体都可以通过碱性物质或在碱性物质的存在下加热反应成为最终产物。该光敏树脂组合物包括一种具有特定结构并通过电磁辐射和加热产生碱性物质的基发生剂，以及一种聚合物前体，该聚合物前体通过基发生剂和碱性物质或在碱性物质的存在下加热反应成为最终产物。
• LONG-CHAIN ALKYLENE GROUP-CONTAINING EPOXY RESIN COMPOSITION
  申请人：Nissan Chemical Corporation

  公开号：EP3375804A1

  公开（公告）日：2018-09-19

  There is provided an epoxy resin composition containing an epoxy compound, which has a low viscosity and a low dielectric constant, and when added to a general-purpose epoxy resin composition, can lower a viscosity of the composition and can sufficiently lower a dielectric constant of an epoxy resin cured product obtained from the composition. An epoxy resin composition comprising: (a) an epoxy component containing at least an epoxy compound of formula [1]; and (b) a curing agent: wherein R1 to R3 each independently are a hydrogen atom or methyl group, and L1 to L3 each independently are pentamethylene group, hexamethylene group or heptamethylene group.

  提供了一种含有环氧化合物的环氧树脂组合物，该环氧化合物具有低粘度和低介电常数，当添加到通用环氧树脂组合物中时，可降低组合物的粘度，并可充分降低由该组合物固化的环氧树脂产品的介电常数。一种环氧树脂组合物，包括：(a) 至少含有式[1]环氧化合物的环氧组分；(b) 固化剂： 其中 R1 至 R3 各自独立地为氢原子或甲基，L1 至 L3 各自独立地为五亚甲基、六亚甲基或七亚甲基。
• Curable composition including siloxane oligomer and inorganic fine particles
  申请人：NISSAN CHEMICAL INDUSTRIES, LTD.

  公开号：US10125267B2

  公开（公告）日：2018-11-13

  A material having a low refractive index that exhibits sufficiently low refractive index without deteriorating the strength of cured film produced therefrom, that can be cured by an active energy ray that is applicable for a resin base material that is not desired to be exposed to heat. Curable composition including: siloxane oligomer (a) containing a radically polymerizable double bond obtained through hydrolysis and condensation of alkoxysilanes containing at least an alkoxysilane A of Formula [1] and alkoxysilane B of Formula [2] in an amount of 100 parts by mass; inorganic fine particles (b) in amount of 10 parts by mass to 1,000 parts by mass; polymerization initiator (c) generating a radical upon active energy ray irradiation in an amount of 0.1 parts by mass to 25 parts by mass R1aSi(OR2)4-a  [1] R3bSi(OR4)4-b  [2] a cured film produced from the composition, and a laminate including a low refractive index layer produced from the composition.

  一种具有低折射率的材料，该材料具有足够低的折射率，且不会降低由其制成的固化膜的强度，可通过活性能量射线固化，适用于不希望受热的树脂基材料。可固化组合物，包括：硅氧烷低聚物 (a)，其中含有通过水解和缩合至少含有式 [1] 烷氧基硅烷 A 和式 [2] 烷氧基硅烷 B 的烷氧基硅烷而获得的可辐射聚合双键，其用量为 100 份（按质量计）；无机微粒 (b)，其用量为 10 份（按质量计）至 1 000 份（按质量计）；聚合引发剂 (c)，其用量为 0.1 份（按质量计）至 25 份（按质量计）。 R1aSi(OR2)4-a [1] R3bSi(OR4)4-b [2] 由该组合物制成的固化薄膜，以及包括由该组合物制成的低折射率层的层压板。
• Long-chain alkylene group-containing epoxy resin composition
  申请人：NISSAN CHEMICAL INDUSTRIES, LTD.

  公开号：US10669369B2

  公开（公告）日：2020-06-02

  There is provided an epoxy resin composition containing an epoxy compound, which has a low viscosity and a low dielectric constant, and when added to a general-purpose epoxy resin composition, can lower a viscosity of the composition and can sufficiently lower a dielectric constant of an epoxy resin cured product obtained from the composition. An epoxy resin composition comprising: (a) an epoxy component containing at least an epoxy compound of formula [1]; and (b) a curing agent: wherein R1 to R3 each independently are a hydrogen atom or methyl group, and L1 to L3 each independently are pentamethylene group, hexamethylene group or heptamethylene group.

  提供了一种含有环氧化合物的环氧树脂组合物，该环氧化合物具有低粘度和低介电常数，当添加到通用环氧树脂组合物中时，可降低组合物的粘度，并可充分降低由该组合物固化的环氧树脂产品的介电常数。一种环氧树脂组合物，包括：(a) 至少含有式[1]环氧化合物的环氧组分；(b) 固化剂： 其中 R1 至 R3 各自独立地为氢原子或甲基，L1 至 L3 各自独立地为五亚甲基、六亚甲基或七亚甲基。