FLUORINATED MONOMER, FLUORINATED POLYMER, RESIST COMPOSITION AND PATTERNING PROCESS
申请人:HASEGAWA Koji
公开号:US20090035699A1
公开(公告)日:2009-02-05
Fluorinated monomers of formula (1) are useful in producing polymers for the formulation of radiation-sensitive resist compositions. R
1
is H or monovalent C
1
-C
20
hydrocarbon group, R
2
is H, F, methyl or trifluoromethyl, R
3
and R
4
are H or a monovalent C
1
-C
8
hydrocarbon group, or R
3
and R
4
may form an aliphatic hydrocarbon ring, and A is a divalent C
1
-C
6
hydrocarbon group.