申请人:Hoffmann-La Roche Inc.
公开号:US04864023A1
公开(公告)日:1989-09-05
The invention is concerned with tricyclic compounds of the formula ##STR1## wherein R.sup.1 is a hydrogen atom or a carboxy-protecting radical; R.sup.2 is a hydrogen atom or a lower alkyl radical which may be substituted with a halogen atom; R.sup.3 and R.sup.4 independently are a hydrogen atom or a lower alkyl radical which may be substituted with a hydroxy radical or a substituted or unsubstituted amino radical; X is a halogen atom; and R.sup.5 and R.sup.6 are independently a hydrogen atom or a lower alkyl radical which may be substituted with a hydroxy radical, a lower alkoxy radical or a substituted or unsubstituted amino radical; or R.sup.5 and R.sup.6, taken together with the adjacent nitrogen atom, may form a 5 to 7 membered heterocyclic ring which may be substituted with one or more substituents at the carbon atom(s), and the heterocyclic ring may further contain --NR.sup.7 --, --O--, --S--, --SO--, --SO.sub.2 -- or --NR.sup.7 --CO--, and also R.sup.7 is a hydrogen atom, a lower alkenyl radical, a lower alkyl or aralkyl radical which may be substituted, or a radical represented by the formula --(CH.sub.2).sub.n COR.sup.8 (II) in which n is an integer from 0 to 4 and R.sup.8 is a hydrogen atom, a lower alkoxy radical, or an amino, lower alkyl or aryl radical which may be substituted, as well as pharmaceutically acceptable salts thereof, and hydrates or solvates of the compounds of the formula I or their salts. Also included is a process for the manufacture of these compounds, pharmaceutical preparations containing them, intermediates useful in said process, and methods of using them. The end products have antimicrobial activity.
本发明涉及式为##STR1##的三环化合物,其中R.sup.1是氢原子或羧基保护基;R.sup.2是氢原子或较低的烷基基团,可以用卤原子取代;R.sup.3和R.sup.4独立地是氢原子或较低的烷基基团,可以用羟基基团或取代或未取代的氨基基团取代;X是卤原子;R.sup.5和R.sup.6独立地是氢原子或较低的烷基基团,可以用羟基基团、较低的烷氧基团或取代或未取代的氨基基团取代;或者R.sup.5和R.sup.6与相邻的氮原子一起形成5到7个成员的杂环,该杂环可以在碳原子处取代一个或多个取代基,且该杂环可以进一步包含--NR.sup.7 --、--O--、--S--、--SO--、--SO.sub.2--或--NR.sup.7 --CO--,其中R.sup.7是氢原子、较低的烷基或芳基烷基基团,可以被取代,或者是由公式--(CH.sub.2).sub.n COR.sup.8 (II)表示的基团,在该基团中n是0到4的整数,R.sup.8是氢原子、较低的烷氧基团或取代的氨基、较低的烷基或芳基基团,以及其药学上可接受的盐、化合物I的水合物或溶剂化物的制备方法,以及包含它们的制药制剂,有用于该过程的中间体和使用它们的方法。最终产物具有抗微生物活性。