申请人:TOKYO OHKA KOGYO CO., LTD.
公开号:US20200183273A1
公开(公告)日:2020-06-11
A resist composition including a base material component (A) whose solubility in a developing solution is changed due to the action of an acid, and a compound (D0) formed of an anion moiety and a cation moiety which is represented by Formula (d0), in which the cation moiety of the compound (D0) has a Log P value of less than 7.7. In the formula, M
m+
represents an m-valent organic cation, R
d0
represents a substituent, p represents an integer of 0 to 3, q represents an integer of 0 to 3, n represents an integer of 2 or greater, and a relationship of “n+p≤(q×2)+5” is satisfied.
一种抗蚀组合物,包括一种基材料组分(A),由于酸的作用而在显影液中溶解性发生改变,以及由阴离子基团和由公式(d0)表示的阳离子基团组成的化合物(D0)。其中,化合物(D0)的阳离子基团的Log P值小于7.7。在公式中,Mm+表示m价有机阳离子,Rd0表示取代基,p表示0到3之间的整数,q表示0到3之间的整数,n表示大于等于2的整数,并且满足“n+p≤(q×2)+5”的关系。