Chemical amplification in self-strengthening materials
申请人:The Board of Trustees of the University of Illinois
公开号:US10377879B2
公开(公告)日:2019-08-13
A self-strengthening material is provided, the material comprising a polymer matrix having a plurality of chemical amplifiers dispersed throughout the polymer matrix and a plurality of triggerable reservoirs, the triggerable reservoirs capable of releasing at least one activator of the plurality of chemical amplifiers, wherein the plurality of chemical amplifiers reacts with the at least one activator to produce additional activators capable of changing the mechanical properties of the polymer matrix, and thus strengthening the material.
CHEMICAL AMPLIFICATION IN SELF-STRENGTHENING MATERIALS
申请人:The Board of Trustees of the University of Illinois
公开号:US20180105678A1
公开(公告)日:2018-04-19
A self-strengthening material is provided, the material comprising a polymer matrix having a plurality of chemical amplifiers dispersed throughout the polymer matrix and a plurality of triggerable reservoirs, the triggerable reservoirs capable of releasing at least one activator of the plurality of chemical amplifiers, wherein the plurality of chemical amplifiers reacts with the at least one activator to produce additional activators capable of changing the mechanical properties of the polymer matrix, and thus strengthening the material.
Novel base-sensitive polymers generating amino groups from their side chains in a nonlinear manner and their application to photoimaging materials
We describe highly sensitive photopolymers consisting of a photobase generator (PBG), a base-sensitive polymer, and a base amplifier that decomposed autocatalytically to release an amine molecule which resulted in the enhancement of base-catalyzed reactions of the base-sensitive polymer. Low molecular weight base molecules produced from the base amplifiers were widely diffused in the polymer film, resulting in the reduction of resolution power in the manner of “air infection” of low molecular weight basic species, although the photosensitivity was enhanced. To improve the performance, we have designed a novel base-sensitive polymer (1) tethering base-amplifying units that autocatalytically transform into amino groups attached to the polymer backbone. A film of 1 sensitized with PBG was decomposed autocatalytically by UV irradiation and subsequent heat treatment. This means that the base proliferation reaction of 1 proceeded regardless of its polymer structure. In addition, a film of 1 sensitized with PBG provided a positive working photoresist developable with an acidic aqueous solution and showed much higher photosensitivity when compared with conventional chemically amplified photoresists comprising PBG and base-labile polymers. Moreover, the use of base-amplifying polymer 1 led to prevention of “air infection”, and improvement in the resolution power of photopolymers relying on base proliferation reactions when compared with base-sensitive photopolymers coupled with low molecular weight base amplifiers.