2-Aethoxy-3-methyl-butan | 89851-33-2

• 分子结构分类: 有机化合物 - 有机氧化合物
• 英文名称: 2-Aethoxy-3-methyl-butan
• 英文别名: 3-Methyl-butyl-(2)-aethylaether；2-ethoxy-3-methyl-butane；Isopropylather；2-ethoxy-3-methylbutane
• CAS: 89851-33-2
• 化学式: C₇H₁₆O
• 分子量: 116.203
• InChiKey: UJRCLZKWBWUTRC-UHFFFAOYSA-N

计算性质

• 辛醇/水分配系数(LogP)：
  2.2
• 重原子数：
  8
• 可旋转键数：
  3
• 环数：
  0.0
• sp3杂化的碳原子比例：
  1.0
• 拓扑面积：
  9.2
• 氢给体数：
  0
• 氢受体数：
  1

反应信息

• 作为产物：
  描述：

  3-甲基-2-丁酮 、 乙醇 在 platinum(IV) oxide 盐酸 、 氢气 作用下， 生成 2-Aethoxy-3-methyl-butan
  参考文献：
  名称：

  1072.醚的一般合成

  摘要：

  DOI：

  10.1039/jr9630005598

文献信息

• Method for Producing Compound Containing BIS (Perfluoroalkylsulfonyl) Methyl Group and Salt Thereof, and Solid Electrolyte Membrane Produced Using Same
  申请人：CENTRAL GLASS COMPANY, LIMITED

  公开号：US20150266816A1

  公开（公告）日：2015-09-24

  [Problem] To provide a method for producing a compound having a bis(trifluoroalkanesulfonyl)methyl group, which is a compound having a high acidity degree and hydrophobicity and useful as a raw material compound for a resin, and a salt thereof in a simple manner. [Solution] A method for producing a compound containing a bis(perfluoroalkylsulfonyl)methyl group and represented by the following formula and a salt of the compound. (Rf represents a perfluoroalkyl group having 1 to 12 carbon atoms. A represents a monovalent organic group. Y represents a single bond or a C 1 -C 4 linear, C 3 -C 4 branched or C 3 -C 4 cyclic alkylene group wherein each of some or all of hydrogen atoms may be substituted with a fluorine atom, a chlorine atom, a bromine atom or an iodine atom and an ether bond or an ester bond may be contained.)

  提供一种简单的方法，用于生产具有高酸度和疏水性的双(三氟烷磺酰基)甲基基团的化合物，该化合物可作为树脂的原料化合物，并提供该化合物的盐。生产含有双(全氟烷基磺酰基)甲基基团的化合物及其盐的方法如下所示： （Rf代表具有1至12个碳原子的全氟烷基基团。A代表一价有机基团。Y代表单键或C1-C4线性、C3-C4支链或C3-C4环烷基基团，其中部分或全部氢原子可被氟原子、氯原子、溴原子或碘原子取代，并且可能包含醚键或酯键。）
• MONOMER, POLYMER, RESIST COMPOSITION, AND PATTERNING PROCESS
  申请人：SHIN-ETSU CHEMICAL CO., LTD.

  公开号：US20140045123A1

  公开（公告）日：2014-02-13

  A polymer comprising recurring units derived from a (meth)acrylate monomer of tertiary ester type having branched alkyl on alicycle is used to form a resist composition. When subjected to exposure, PEB and organic solvent development, the resist composition is improved in dissolution contrast.

  一种聚合物，包括由具有支链烷基的萜酸酯单体衍生的重复单元，用于形成抗蚀组合物。在经过曝光、PEB和有机溶剂显影处理后，抗蚀组合物在溶解对比度方面得到改善。
• NOVEL PHOTOACID GENERATOR, RESIST COMPOSITION, AND PATTERNING PROCESS
  申请人：OHASHI Masaki

  公开号：US20090274978A1

  公开（公告）日：2009-11-05

  Photoacid generators generate sulfonic acids of formula (1a) or (1b) upon exposure to high-energy radiation. R 1 —COOCH 2 CF 2 SO 3 − H + (1a) R 1 —O—COOCH 2 CF 2 SO 3 − H + (1b) R 1 is a monovalent C 20 -C 50 hydrocarbon group of steroid structure which may contain a heteroatom. The bulky steroid structure ensures adequate control of acid diffusion. The photoacid generators are compatible with resins and suited for use in chemically amplified resist compositions.

  光酸发生剂在高能辐射作用下生成式（1a）或（1b）的磺酸。R1—COOCH2CF2SO3−H+(1a)R1—O—COOCH2CF2SO3−H+(1b)R1是一种单价的C20-C50类固醇结构的烃基，可能含有杂原子。庞大的类固醇结构确保了对酸扩散的充分控制。光酸发生剂与树脂相容，并适用于化学增感抗蚀组合物的使用。
• RESIST COMPOSITION, PATTERNING PROCESS, AND BARIUM, CESIUM AND CERIUM SALTS
  申请人：SHIN-ETSU CHEMICAL CO., LTD.

  公开号：US20170115566A1

  公开（公告）日：2017-04-27

  A resist composition comprising a base resin comprising acid labile group-containing recurring units and preferably acid generator-containing recurring units, and a sodium, magnesium, potassium, calcium, rubidium, strontium, yttrium, cesium, barium or cerium salt of α-fluorinated sulfonic acid bonded to an alkyl, alkenyl, alkynyl or aryl group exhibits a high resolution and sensitivity and forms a pattern of satisfactory profile with minimal LWR after exposure and development.

  一种抗蚀组合物包括基树脂，其中包含含酸敏感基团的重复单元，最好包含含酸发生剂的重复单元，以及与烷基、烯基、炔基或芳基结合的α-氟磺酸的钠、镁、钾、钙、铷、锶、钇、铯、钡或铈盐，表现出高分辨率和灵敏度，并在曝光和显影后形成具有最小LWR的满意轮廓图案。
• Fluoroalcohol preparation method, fluorinated monomer, polymer, resist composition and patterning process
  申请人：Hasegawa Koji

  公开号：US20070179309A1

  公开（公告）日：2007-08-02

  Fluoroalcohol compounds of formula (4) are prepared by reacting a fluorine compound of formula (1) with reducing agents or organometallic reagents of formulas (2) and (3) wherein R 1 is H or a monovalent C 1 -C 20 hydrocarbon group in which any —CH 2 — moiety may be replaced by —O— or —C(═O)—, R 2 is H or a monovalent C 1 -C 6 hydrocarbon group, R 3 and R 4 are H or a monovalent C 1 -C 8 hydrocarbon group, and M 1 is Li, Na, K, Mg, Zn, Al, B, or Si. From the fluoroalcohol compounds, fluorinated monomers can be produced in a simple and economic way, which are useful in producing polymers for the formulation of radiation-sensitive resist compositions.

  通过将化学式（1）的氟化合物与化学式（2）和（3）的还原剂或有机金属试剂反应制备化学式（4）的氟醇化合物，其中R1是H或一价的碳1-碳20烃基，其中任何一个—CH2—基团可能被—O—或—C(═O)—替代，R2是H或一价的碳1-碳6烃基，R3和R4是H或一价的碳1-碳8烃基，M1是Li、Na、K、Mg、Zn、Al、B或Si。通过这些氟醇化合物，可以简单经济地生产氟化单体，这些单体在制备用于辐射敏感抗蚀剂组合物的聚合物中非常有用。