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4-Amino-8-hydroxy-chinolin | 57334-37-9

中文名称
——
中文别名
——
英文名称
4-Amino-8-hydroxy-chinolin
英文别名
4-Aminoquinolin-8-ol
4-Amino-8-hydroxy-chinolin化学式
CAS
57334-37-9
化学式
C9H8N2O
mdl
——
分子量
160.175
InChiKey
BSAWDWUYBRFYFY-UHFFFAOYSA-N
BEILSTEIN
——
EINECS
——
  • 物化性质
  • 计算性质
  • ADMET
  • 安全信息
  • SDS
  • 制备方法与用途
  • 上下游信息
  • 反应信息
  • 文献信息
  • 表征谱图
  • 同类化合物
  • 相关功能分类
  • 相关结构分类

计算性质

  • 辛醇/水分配系数(LogP):
    1.4
  • 重原子数:
    12
  • 可旋转键数:
    0
  • 环数:
    2.0
  • sp3杂化的碳原子比例:
    0.0
  • 拓扑面积:
    59.1
  • 氢给体数:
    2
  • 氢受体数:
    3

上下游信息

  • 上游原料
    中文名称 英文名称 CAS号 化学式 分子量
  • 下游产品
    中文名称 英文名称 CAS号 化学式 分子量

反应信息

  • 作为反应物:
    参考文献:
    名称:
    Identifying Chelators for Metalloprotein Inhibitors Using a Fragment-Based Approach
    摘要:
    Fragment-based lead design (FBLD) has been used to identify new metal-binding groups for metalloenzyme inhibitors. When screened at 1 mM, a chelator fragment library (CFL-1.1) of 96 compounds produced hit rates ranging from 29% to 43% for five matrix metalloproteases (MMPs), 24% for anthrax lethal factor (LF), 49% for 5-lipoxygenase (5-LO), and 60% for tyrosinase (TY). The ligand efficiencies (LE) of the fragment hits are excellent, in the range of 0.4-0.8 kcal/mol. The MMP enzymes all generally elicit the same chelators as hits from CFL-1.1; however, the chelator fragments that inhibit structurally unrelated metalloenzymes (LF, 5-LO, TY) vary considerably. To develop more advanced hits, one hit from CFL-1.1, 8-hydroxyquinoline, was elaborated at four different positions around the ring system to generate new fragments. 8-Hydroxyquinoline fragments substituted at either the 5- or 7-positions gave potent hits against MMP-2, with IC50 values in the low micromolar range. The 8-hydroxyquinoline represents a promising new chelator scaffold for the development of MMP inhibitors that was discovered by use of a metalloprotein-focused chelator fragment library.
    DOI:
    10.1021/jm101266s
  • 作为产物:
    描述:
    参考文献:
    名称:
    Albert; Magrath, Biochemical Journal, 1947, vol. 41, p. 534,541
    摘要:
    DOI:
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文献信息

  • NOVEL TETRACARBOXYLIC DIANHYDRIDE, POLYIMIDE RESIN AND METHOD FOR PRODUCING THE SAME, PHOTOSENSITIVE RESIN COMPOSITIONS, PATTERNING PROCESS, METHOD FOR FORMING CURED FILM, INTERLAYER INSULATING FILM, SURFACE PROTECTIVE FILM, AND ELECTRONIC PARTS
    申请人:SHIN-ETSU CHEMICAL CO., LTD.
    公开号:US20190169211A1
    公开(公告)日:2019-06-06
    The present invention has been made in view of the circumstances herein. An object of the present invention is to provide: a tetracarboxylic dianhydride which can lead to a polyimide usable as a base resin of a photosensitive resin composition capable of forming a fine pattern and obtaining high resolution without impairing excellent characteristics such as mechanical strength and adhesiveness; a polyimide resin obtained by using the tetracarboxylic dianhydride; and a method for producing the polyimide resin. The tetracarboxylic dianhydride is shown by the following general formula (1).
    本发明是基于本文中的情况而作出的。本发明的目的是提供:一种四羧酸二酐,可导致聚酰亚胺,作为感光树脂组合物的基树脂,能够形成细微图案并获得高分辨率,同时不损害优异的特性,如机械强度和粘附性;通过使用该四羧酸二酐获得的聚酰亚胺树脂;以及生产该聚酰亚胺树脂的方法。该四羧酸二酐由以下通用式(1)所示。
  • NOVEL COMPOUND, POLYIMIDE RESIN AND METHOD OF PRODUCING THE SAME, PHOTOSENSITIVE RESIN COMPOSITION, PATTERNING METHOD AND METHOD OF FORMING CURED FILM, INTERLAYER INSULATING FILM, SURFACE PROTECTIVE FILM, AND ELECTRONIC COMPONENT
    申请人:International Business Machines Corporation
    公开号:US20210317270A1
    公开(公告)日:2021-10-14
    Provided is a compound that can be used as a base resin for a photosensitive resin composition. The photosensitive resin can form a fine pattern and can achieve high resolution without impairing mechanical strength and solubility. The compound is represented by the general formula (1): wherein Z represents a linear, branched or cyclic divalent hydrocarbon group having 2 to 30 carbon atoms; X 1 to X 3 represent any of —CO 2 —, —CONR X1 —, —O—, —NR X1 —, —S—, —SO 2 —, —SO 3 — and —SO 2 NR X1 — and may be the same as or different from each other, provided that R X1 is a hydrogen atom or a monovalent hydrocarbon group having 1 to 30 carbon atoms; Ar represents a divalent aromatic group having 2 to 30 carbon atoms; L 1 and L 2 independently represent a divalent hydrocarbon group having 1 to 30 carbon atoms; and x and y are each independently 0 or 1.
    提供的是一种可以用作光敏树脂组合物的基树脂的化合物。这种光敏树脂可以形成精细图案,并且可以在不影响机械强度和溶解性的情况下实现高分辨率。该化合物由通式(1)表示:其中Z代表具有2到30个碳原子的线性、支链或环状二价碳氢基团;X1到X3代表任何一种—CO2—、—CONRX1—、—O—、—NRX1—、—S—、—SO2—、—SO3—和—SO2NRX1—中的一种,并且它们可以相同也可以不同,只要RX1是氢原子或具有1到30个碳原子的一价碳氢基团;Ar代表具有2到30个碳原子的二价芳香基团;L1和L2分别代表具有1到30个碳原子的二价碳氢基团;x和y分别独立地为0或1。
  • TETRACARBOXYLIC ACID DIESTER COMPOUND, POLYMER OF POLYIMIDE PRECURSOR AND METHOD FOR PRODUCING SAME, NEGATIVE PHOTOSENSITIVE RESIN COMPOSITION, PATTERNING PROCESS, AND METHOD FOR FORMING CURED FILM
    申请人:SHIN-ETSU CHEMICAL CO., LTD.
    公开号:US20180120702A1
    公开(公告)日:2018-05-03
    The present invention provides a tetracarboxylic acid diester compound represented by the following general formula (1), wherein, X 1 represents a tetravalent organic group, and R 1 represents a group represented by the following general formula (2), wherein, the dotted line represents a bonding, Y 1 represents an organic group with a valency of k+1, Rs represents a group containing at least one silicon atom, “k” represents 1, 2 or 3, and “n” represents 0 or 1. There can be provided a tetracarboxylic acid diester compound which can lead a polymer of a polyimide precursor capable of using a base resin of a negative photosensitive resin composition which is capable of forming a fine pattern and giving high resolution, a polymer of a polyimide precursor obtained by using the tetracarboxylic acid diester compound and a method for producing the same.
    本发明提供了一种四羧酸二酯化合物,其表示为以下通式(1):其中,X1表示四价有机基团,R1表示以下通式(2)所表示的基团:其中,虚线表示键合,Y1表示具有k+1价的有机基团,Rs表示含有至少一个硅原子的基团,“k”表示1、2或3,“n”表示0或1。可以提供一种四羧酸二酯化合物,该化合物能够引导聚合物的形成,该聚合物是由使用负光敏树脂组合物的基树脂制成的,该组合物能够形成细微图案并具有高分辨率,使用四羧酸二酯化合物制得的聚酰亚胺前体聚合物以及其制备方法。
  • DIAMINE COMPOUND, AND HEAT-RESISTANT RESIN OR HEAT-RESISTANT RESIN PRECURSOR USING SAME
    申请人:TORAY INDUSTRIES, INC.
    公开号:US20170334837A1
    公开(公告)日:2017-11-23
    Provided are a photosensitive resin composition which has excellent pattern processabilities (high sensitivity and high resolution) and is excellent in chemical resistance and thermal resistance after thermally treated; a heat-resistant resin or heat-resistant resin precursor used for the composition; and a diamine compound which is a raw material of the resin and the precursor. The diamine compound is a diamine compound represented by a general formula (1).
    提供了一种具有优异图案加工性(高灵敏度和高分辨率)且在热处理后具有优异化学耐性和热耐性的光敏树脂组合物;用于该组合物的耐热树脂或耐热树脂前体;以及作为树脂和前体原料的二胺化合物。该二胺化合物是由通式(1)表示的二胺化合物。
  • [EN] GANGLIOSIDE CARBOHYDRATE STRUCTURES AND USES THEREOF<br/>[FR] STRUCTURES CARBOHYDRATES DE GANGLIOSIDES ET LEURS UTILISATIONS
    申请人:REALIST PHARMA INC
    公开号:WO2018112669A1
    公开(公告)日:2018-06-28
    The present invention provides methods and compositions related to multivalent carbohydrate antigen structures comprising cancer or infection associated ganglioside carbohydrate antigens. Said carbohydrate structures may be used to induce immunity against said carbohydrate antigens. In some embodiments, carbohydrate structures may be administered to a subject thereby inducing immunity in the subject, for example, the administration of a vaccine comprising said carbohydrate structure. Also provided are methods to induce an immune response in a subject in need thereof by administering said carbohydrate structure. Further provided are methods of producing an antibody or TCR that bind said carbohydrate antigens.
    本发明提供了与癌症或感染相关的神经节苷脂碳水化合物抗原组成的多价碳水化合物抗原结构的方法和组成物。所述碳水化合物结构可用于诱导免疫反应以对抗所述碳水化合物抗原。在某些实施例中,可将碳水化合物结构注射给受试者,从而在受试者中诱导免疫反应,例如,注射包含所述碳水化合物结构的疫苗。还提供了通过注射所述碳水化合物结构来诱导需要免疫反应的受试者的免疫反应的方法。此外,还提供了制备结合所述碳水化合物抗原的抗体或TCR的方法。
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