4,5-dimethylcyclopentane-1,3-dione | 35029-05-1

• 分子结构分类: 有机化合物 - 有机氧化合物
• 英文名称: 4,5-dimethylcyclopentane-1,3-dione
• 英文别名: 4,5-Dimethyl-1,3-cyclopentandion；4,5-Dimethyl-1,3-cyclopentanedione
• CAS: 35029-05-1
• 化学式: C₇H₁₀O₂
• 分子量: 126.155
• InChiKey: BEGWHAMZTVHPHZ-UHFFFAOYSA-N

物化性质

• 沸点：
  221.2±23.0 °C(Predicted)
• 密度：
  1.036±0.06 g/cm3(Predicted)
• 稳定性/保质期：

  存在于主流烟气中。

计算性质

• 辛醇/水分配系数(LogP)：
  0.8
• 重原子数：
  9
• 可旋转键数：
  0
• 环数：
  1.0
• sp3杂化的碳原子比例：
  0.71
• 拓扑面积：
  34.1
• 氢给体数：
  0
• 氢受体数：
  2

反应信息

• 作为反应物：
  描述：

  4,5-dimethylcyclopentane-1,3-dione 、 5-Amino-4-cyano-1-(n-pentyl)pyrazole 在 对甲苯磺酸 作用下， 以 甲苯 为溶剂， 生成 5-(1-Oxo-4,5-dimethyl-2-cyclopenten-3-yl)amino-1-pentyl-4-cyanopyrazole
  参考文献：
  名称：

  Pyrazolopyridine cycloalkanones and process for their preparation

  摘要：

  新型四氢吡唑并[3,4-b]喹啉酮、环戊[b]吡唑并[4,3-e]吡啶酮和环庚[b]-吡唑并[4,3-e]吡啶酮，作为具有减少副作用的抗焦虑药物被披露，包括其制备方法、含有它们的药物组合物和用于其制备的中间体。

  公开号：

  US04546104A1
• 作为产物：
  描述：

  4,5-Dimethyl-3-(N,N',N'-trimethyl-hydrazino)-cyclopent-2-enone 在 氢溴酸 作用下， 反应 7.0h， 以63%的产率得到4,5-dimethylcyclopentane-1,3-dione
  参考文献：
  名称：

  Regioselective Alkylations of Cyclic 1,3-Diketonesvia Metalated Dimethylhydrazones

  摘要：

  Cyclic 1,3- diketones 1 are transformed into their 2,2-dimethylhydrazones 2, which can be alkylated regioselectively at different positions after mono-, di-, tri-, and tetrametalation. Monometalated C-2 unsubstituted hydrazones afford C-2 and N-alkylation, monometalated C-2 substituted hydrazones afford only C-2 alkylation. The regioselectivity of the alkylation of the polymetalated hydrazones follows Hauser's rule according to the sequence: NH- > C-4 Ha > C-5 > C-4 Hb. Hydrolysis of the product hydrazones 3-5 afforded mono-and polyalkylated 1,3- diketones 7 in good yields.

  DOI：

  10.1002/prac.19973390199

文献信息

• PHOTOSENSITIVE COMPOSITION, PATTERN FORMING METHOD USING THE PHOTOSENSITIVE COMPOSITION AND COMPOUND FOR USE IN THE PHOTOSENSITIVE COMPOSITION
  申请人：Wada Kenji

  公开号：US20100233617A1

  公开（公告）日：2010-09-16

  A photosensitive composition includes: (A) a resin containing a repeating unit corresponding to a compound represented by the following formula (I); the resin being capable of producing an acid group upon irradiation with an actinic ray or radiation: Z-A-X—B—R   (I) wherein Z represents a group capable of becoming an acid group resulting from leaving of a cation upon irradiation with an actinic ray or radiation; A represents an alkylene group; X represents a single bond or a heteroatom-containing divalent linking group; B represents a single bond, an oxygen atom or —N(Rx)-; Rx represents a hydrogen atom or a monovalent organic group; R represents a monovalent organic group substituted by Y; when B represents —N(Rx)-, R and Rx may combine with each other to form a ring; and Y represents a polymerizable group.

  一种感光组合物包括：（A）含有与下式（I）所表示的化合物对应的重复单元的树脂；该树脂能够在受到光敏射线或辐射照射后产生酸基团：Z-A-X—B—R   （I）其中Z代表一个能够在受到光敏射线或辐射照射后由阳离子离去而形成酸基团的基团；A代表一个烷基基团；X代表一个单键或含杂原子的二价连接基团；B代表一个单键、一个氧原子或—N（Rx）-；Rx代表一个氢原子或一个一价有机基团；R代表一个通过Y取代的一价有机基团；当B代表—N（Rx）-时，R和Rx可以结合在一起形成一个环；Y代表一个可聚合的基团。
• RESIST COMPOSITION CONTAINING NOVEL SULFONIUM COMPOUND, PATTERN-FORMING METHOD USING THE RESIST COMPOSITION, AND NOVEL SULFONIUM COMPOUND
  申请人：KAMIMURA Sou

  公开号：US20090042124A1

  公开（公告）日：2009-02-12

  A resist composition includes (A) a compound represented by the following formula (I): wherein each of R 1 to R 13 independently represents a hydrogen atom or a substituent, provided that at least one of R 1 to R 13 is a substituent containing an alcoholic hydroxyl group; Z represents a single bond or a divalent linking group; and X − represents an anion containing a proton acceptor functional group.

  一种抗性组合物包括(A)由以下公式（I）所代表的化合物：其中R1至R13中的每一个独立地代表氢原子或取代基，前提是R1至R13中至少有一个是含有醇羟基的取代基；Z代表单键或二价连接基团；X-代表含有质子受体功能基团的阴离子。
• PHOTOSENSITIVE COMPOSITION, COMPOUND FOR USE IN THE PHOTOSENSITIVE COMPOSITION, AND PATTERN-FORMING METHOD USING THE PHOTOSENSITIVE COMPOSITION
  申请人：Kawanishi Yasutomo

  公开号：US20080081288A1

  公开（公告）日：2008-04-03

  A photosensitive composition includes (A) a compound represented by the following formula (I): wherein R 1 to R 13 each independently represents a hydrogen atom or a substituent, Z represents a single bond or a divalent linking group, and X − represents an anion containing a proton acceptor functional group.

  一种光敏组合物包括(A) 由下式(I)所表示的化合物：其中R1至R13各自独立地表示氢原子或取代基，Z表示单键或二价连接基团，X-表示含有质子受体功能基团的阴离子。
• PHOTOSENSITIVE COMPOSITION, COMPOUND FOR USE IN THE PHOTOSENSITIVE COMPOSITION AND PATTERN FORMING METHOD USING THE PHOTOSENSITIVE COMPOSITION
  申请人：KODAMA Kunihiko

  公开号：US20080138742A1

  公开（公告）日：2008-06-12

  The invention is related to an arylsulfonium salt compound having a polycyclic hydrocarbon structure in a cation moiety.

  本发明涉及一种在阳离子部分具有多环碳氢结构的芳基磺酸盐化合物。
• PATTERN FORMING METHOD, ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, RESIST FILM, MANUFACTURING METHOD OF ELECTRONIC DEVICE, ELECTRONIC DEVICE AND COMPOUND
  申请人：FUJIFILM CORPORATION

  公开号：US20160070167A1

  公开（公告）日：2016-03-10

  There is provided a pattern forming method comprising (i) a step of forming a film containing an actinic ray-sensitive or radiation-sensitive resin composition containing (A) a compound represented by the specific formula, (B) a compound different from the compound (A) and capable of generating an acid upon irradiation with an actinic ray or radiation, and (P) a resin that does not react with the acid generated from the compound (A) and is capable of decreasing the solubility for an organic solvent-containing developer by the action of the acid generated from the compound (B), (ii) a step of exposing the film, and (iii) a step of developing the exposed film by using an organic solvent-containing developer to form a negative pattern; the actinic ray-sensitive or radiation-sensitive resin composition above; a resist film using the composition.

  提供了一种图案形成方法，包括（i）形成一种薄膜，其中包含一种感光树脂组成物，该组成物包含（A）一种特定化学式代表的化合物，（B）一种不同于化合物（A）的化合物，在接受光辐射后能够产生酸，并且（P）一种树脂，该树脂不会与从化合物（A）产生的酸发生反应，并且能够通过来自化合物（B）产生的酸的作用降低有机溶剂含有的显影剂的溶解度，（ii）曝光薄膜，（iii）使用有机溶剂含有的显影剂对曝光后的薄膜进行显影，形成负图案；上述感光树脂组成物；使用该组成物的抗蚀膜。