申请人:Matsuoka Hiroshi
公开号:US20090035696A1
公开(公告)日:2009-02-05
Disclosed are a photoresist composition characterized by containing a polymer (A) containing a carboxyl group or a hydroxyl group, a polyfunctional alkenyl ether (B) represented by the general formula (I) below, and a photoacid generator (C) and the like. (In the formula, R
1
and R
2
may be the same as or different from each other and respectively represent a substituted or unsubstituted alkyl, a substituted or unsubstituted allyl, or a substituted or unsubstituted aralkyl, or alternatively R
1
and R
2
may form a substituted or unsubstituted alicyclic hydrocarbon ring together with an adjacent carbon atom; X represents a substituted or unsubstituted alkane from which n hydrogen atoms are removed; and n represents an integer of not less than 2.)