Novel lactone compounds having alicyclic structure and their manufacturing method
申请人:Shin-Etsu Chemical Co., Ltd.
公开号:US20020016477A1
公开(公告)日:2002-02-07
Lactone compounds of formula (1) are novel and useful as monomers to form base resins for use in chemically amplified resist compositions adapted for micropatterning lithography.
1
Letter k is 0 or 1 and m is an integer of 1-8.