Ruthenium compound and process for producing a metal ruthenium film
申请人:Sakai Tatsuya
公开号:US20060240190A1
公开(公告)日:2006-10-26
A ruthenium compound from which high-quality film-like metal ruthenium can be obtained and a process for producing a metal ruthenium film from the ruthenium compound by chemical vapor deposition.
The ruthenium compound as a material for chemical vapor deposition is represented by the following formula (1), for example.