1,3,5-tris(3-carboxypropyl)isocyanurate | 319017-31-7

• 分子结构分类: 有机化合物 - 有机酸及其衍生物 - 羧酸及其衍生物
• 英文名称: 1,3,5-tris(3-carboxypropyl)isocyanurate
• 英文别名: 1,3,5-Triazine-1,3,5(2H,4H,6H)-tributanoic acid, 2,4,6-trioxo-；4-[3,5-bis(3-carboxypropyl)-2,4,6-trioxo-1,3,5-triazinan-1-yl]butanoic acid
• CAS: 319017-31-7
• 化学式: C₁₅H₂₁N₃O₉
• 分子量: 387.346
• InChiKey: GXMBFEIOGQNNGY-UHFFFAOYSA-N

计算性质

• 辛醇/水分配系数(LogP)：
  -1.1
• 重原子数：
  27
• 可旋转键数：
  12
• 环数：
  1.0
• sp3杂化的碳原子比例：
  0.6
• 拓扑面积：
  173
• 氢给体数：
  3
• 氢受体数：
  9

反应信息

• 作为反应物：
  描述：

  1,3,5-tris(3-carboxypropyl)isocyanurate 在 氯化亚砜 、 对甲苯磺酸 作用下， 以 甲醇 、 N,N-二甲基甲酰胺 为溶剂， 反应 9.5h， 生成
  参考文献：
  名称：

  オキサゾリン化合物、架橋剤および樹脂組成物

  摘要：

  【问题】提供一种作为涂覆剂、墨水、薄膜、粘合剂等广泛用途的交联剂的最佳三噁唑化合物。 【解决方案】以下化学式表示的噁唑化合物，使用上述噁唑化合物的交联剂和树脂组成物。其中，X表示由直链或支链烷基表示的CnH2n，n在1到10的范围内。 【选择图】无

  公开号：

  JP2018100240A

文献信息

• COMPOSITION FOR FORMATION OF UNDERLAYER FILM FOR LITHOGRAPHY CONTAINING EPOXY COMPOUND AND CARBOXYLIC ACID COMPOUND
  申请人：Nissan Chemical Industries, Ltd.

  公开号：EP1617289A1

  公开（公告）日：2006-01-18

  There is provided an underlayer coating forming composition for lithography that is used in lithography process of manufacture of semiconductor device; and an underlayer coating having a high dry etching rate compared with photoresist. Concretely, it is a composition for forming an underlayer without use of crosslinking reaction by an strong acid catalyst, and an underlayer coating forming composition containing a component having an epoxy group (a polymer, a compound) and a component having a phenolic hydroxyl group, a carboxyl group, a protected carboxyl group or an acid anhydride structure (a polymer, a compound).

  本发明提供了一种用于半导体设备制造的光刻工艺中的光刻用底层涂层形成组合物，以及一种与光刻胶相比干蚀刻率高的底层涂层。具体地说，它是一种无需使用强酸催化剂进行交联反应即可形成底层涂层的组合物，以及一种底层涂层形成组合物，该组合物包含具有环氧基的成分（聚合物、化合物）和具有酚羟基、羧基、保护羧基或酸酐结构的成分（聚合物、化合物）。
• ALDEHYDE INHIBITOR COMPOSITION AND POLYACETAL RESIN COMPOSITION
  申请人：Polyplastics Co., Ltd.

  公开号：EP1683838A1

  公开（公告）日：2006-07-26

  An aldehyde-inhibiting composition inhibiting an aldehyde from an aldehyde-generating source comprises a carboxylic acid hydrazide and a metal salt of a hydroxy polycarboxylic acid (e.g., a salt of citric acid, malic acid, or tartaric acid with an alkaline earth metal) in a proportion of 0.01 to 100 parts by weight relative to 1 part by weight of the carboxylic acidhydrazide. Moreover, a polyacetal resin composition may comprise a polyacetal resin and the aldehyde-inhibiting composition in a proportion of 0.001 to 20 parts by weight of the aldehyde-inhibiting composition relative to 100 parts by weight of the polyacetal resin. To the resin composition, may be added an antioxidant, a heat stabilizer, a processing stabilizer, a weather (light)-resistant stabilizer, an impact resistance improver, a gloss control agent, a sliding improver, a coloring agent, a filler, and others. A small amount of the aldehyde-inhibiting composition efficiently inhibits the aldehyde generation from the polyacetal resin without discoloring the resin.

  一种抑制醛生成源的醛的抑醛组合物包括羧酸酰肼和羟基多羧酸的金属盐（如柠檬酸、苹果酸或酒石酸与碱土金属的盐），相对于 1 份羧酸酰肼的重量比例为 0.01 至 100 份。此外，聚缩醛树脂组合物可包括聚缩醛树脂和醛抑制组合物，其中醛抑制组合物的比例为 0.001 至 20（按聚缩醛树脂的重量计），相对于 100（按聚缩醛树脂的重量计）。在树脂组合物中可添加抗氧化剂、热稳定剂、加工稳定剂、耐候（光）稳定剂、抗冲击性改进剂、光泽控制剂、滑动改进剂、着色剂、填料等。少量的醛抑制组合物就能有效抑制聚缩醛树脂中醛的生成，而不会使树脂变色。
• POLYACETAL RESIN COMPOSITION AND MOLDED ARTICLE THEREOF
  申请人：Polyplastics Co., Ltd.

  公开号：EP1688461A1

  公开（公告）日：2006-08-09

  A polyacetal resin composition comprises a polyacetal resin having a trioxane content of not more than 100 ppm (preferably not more than 50 ppm, and more preferably not more than 10 ppm) and at least one stabilizer selected from the group consisting of an antioxidant, a formaldehyde emission inhibitor, a processing stabilizer and a heat stabilizer. The polyacetal resin may be a polyacetal resin (particularly a polyacetal copolymer) in which the trioxane amount is reduced by a solvent treatment and/or a heat treatment. Moreover, the polyacetal resin composition may further contain at least one additive selected from the group consisting of a weather(light)-resistantstabilizer, an impact resistance improver, a gloss control agent, a sliding improver, a coloring agent, and a filler. Such a polyacetal resin composition can reduce the amount of trioxane elution and/or the amount of a volatile organic compound from a molded product thereof.

  一种聚缩醛树脂组合物包括一种三氧杂环戊烷含量不超过 100 ppm（最好不超过 50 ppm，最好不超过 10 ppm）的聚缩醛树脂，以及至少一种选自抗氧化剂、甲醛释放抑制剂、加工稳定剂和热稳定剂的稳定剂。聚缩醛树脂可以是聚缩醛树脂（特别是聚缩醛共聚物），其中的三氧杂环戊烷含量通过溶剂处理和/或热处理而减少。此外，聚缩醛树脂组合物还可进一步含有至少一种添加剂，这些添加剂选自耐候（光） 稳定剂、抗冲击性改进剂、光泽控制剂、滑动性改进剂、着色剂和填料组成的组。这种聚缩醛树脂组合物可以减少其模塑产品中的三氧杂烷洗脱量和/或挥发性有机化合物的含量。
• ANTIREFLECTION FILM FOR SEMICONDUCTOR CONTAINING CONDENSATION TYPE POLYMER
  申请人：Nissan Chemical Industries, Ltd.

  公开号：EP1757986A1

  公开（公告）日：2007-02-28

  There is provided an anti-reflective coating forming composition comprising a polymer having a pyrimidinetrione structure, imidazolidinedione structure, imidazolidinetrione structure or triazinetrione structure and a solvent. The anti-reflective coating obtained from the composition has a high preventive effect for reflected light, causes no intermixing with photoresists, and can use in lithography process by use of a light having a short wavelength such as ArF excimer laser beam (wavelength 193 nm) or F2 excimer laser beam (wavelength 157 nm), etc.

  本发明提供了一种抗反射涂层成型组合物，该组合物由具有嘧啶三酮结构、咪唑烷二酮结构、咪唑烷三酮结构或三嗪三酮结构的聚合物和溶剂组成。由该组合物制得的防反射涂层对反射光有很好的防止效果，不会与光刻胶混合，并可在光刻工艺中使用 ArF 准分子激光束（波长 193 nm）或 F2 准分子激光束（波长 157 nm）等短波长光。
• COMPOSITION COMPRISING POLYMER HAVING ETHYLENE-DICARBONYL STRUCTURE FOR USE IN FORMING ANTI-REFLECTIVE COATING FOR LITHOGRAPHY
  申请人：Nissan Chemical Industries, Ltd.

  公开号：EP1876495A1

  公开（公告）日：2008-01-09

  There is provided an anti-reflective coating forming composition for lithography comprising a polymer having an ethylenedicarbonyl structure and a solvent; an anti-reflective coating formed from the composition; and a method for forming photoresist pattern by use of the composition. The anti-reflective coating obtained from the composition can be used in lithography process for manufacturing a semiconductor device, has a high preventive effect for reflected light, causes no intermixing with photoresists, and has a higher etching rate than photoresists.

  本发明提供了一种光刻用抗反射涂层形成组合物，该组合物包含具有亚乙基二羰基结构的聚合物和溶剂；由该组合物形成的抗反射涂层；以及使用该组合物形成光刻胶图案的方法。由该组合物制得的抗反射涂层可用于制造半导体器件的光刻工艺中，对反射光有很好的防止效果，不会与光刻胶混合，而且蚀刻率高于光刻胶。