1,1,2,3,3-pentafluoro-4-trifluoromethyl-4-hydroxy-1,6-heptadiene | 448220-43-7

• 分子结构分类: 有机化合物 - 有机氧化合物
• 英文名称: 1,1,2,3,3-pentafluoro-4-trifluoromethyl-4-hydroxy-1,6-heptadiene
• 英文别名: 1,1,2,3,3-Pentafluoro-4-(trifluoromethyl)hepta-1,6-dien-4-ol
• CAS: 448220-43-7
• 化学式: C₈H₆F₈O
• 分子量: 270.122
• InChiKey: ZEERSBCGGBPZIJ-UHFFFAOYSA-N

计算性质

• 辛醇/水分配系数(LogP)：
  2.9
• 重原子数：
  17
• 可旋转键数：
  4
• 环数：
  0.0
• sp3杂化的碳原子比例：
  0.5
• 拓扑面积：
  20.2
• 氢给体数：
  1
• 氢受体数：
  9

反应信息

• 作为产物：
  描述：

  6,7-Dichloro-5,5,6,7,7-pentafluoro-4-(trifluoromethyl)hept-1-en-4-ol 在 碘 、 锌 作用下， 以 1,4-二氧六环 为溶剂， 反应 41.5h， 生成 1,1,2,3,3-pentafluoro-4-trifluoromethyl-4-hydroxy-1,6-heptadiene
  参考文献：
  名称：

  FLUORINE-CONTAINING COMPOUNDS AND POLYMERS AND PROCESSES FOR PRODUCING THE SAME

  摘要：

  公开号：

  EP1367071B1

文献信息

• Photoactive compounds
  申请人：——

  公开号：US20040229155A1

  公开（公告）日：2004-11-18

  The present invention relates to a novel photoactive compounds that can be used in formulating photoresist compositions.

  本发明涉及一种新型光敏化合物，可用于制备光刻胶组成。
• Resist composition
  申请人：Kawaguchi Yasuhide

  公开号：US20050202345A1

  公开（公告）日：2005-09-15

  A resist composition which can easily form a resist pattern excellent in transparency for vacuum ultraviolet rays such as an F 2 excimer laser or the like and dry etching characteristics and further excellent in sensitivity, resolution, flatness, thermal resistance and the like, is provided. The resist composition, characterized by comprising (A) a fluorine-containing polymer having an acidic group blocked with a blocking group containing a cycloalkyl group, an organic group having one or more of cycloalkyl groups, a bicycloalkyl group or the like, (B) an acid generating compound capable of generating an acid by irradiation with a light, and (C) an organic solvent.

  提供了一种抗蚀性组合物，该组合物可以轻松形成透明度优异的抗真空紫外线（例如F2准分子激光器）或干法刻蚀特性，并且在灵敏度、分辨率、平整度、耐热性等方面也具有优异的抗蚀性图案。该抗蚀性组合物的特征在于包含（A）一种含有具有环烷基、一个或多个环烷基或双环烷基等有机基团的阻断基的酸性基团的氟含量高的聚合物，（B）一种能够通过光辐射产生酸的酸发生化合物，以及（C）一种有机溶剂。
• Fluoropolymer
  申请人：Kawaguchi Yasuhide

  公开号：US20050209409A1

  公开（公告）日：2005-09-22

  To provide a fluoropolymer suitable for use as a base polymer for resist materials for excimer lasers having a wavelength of 250 nm or shorter. A fluoropolymer having a monomer unit formed by cyclopolymerization of a fluorinated diene compound represented by the following formula (3), CF 2 ═CFCF 2 —C(CF 3 )(R 5 )—CH 2 CH═CH 2 (3) wherein R 5 is either a hydroxyl group blocked by —CHR 7 —O—R 8 or an organic group having the hydroxyl group, and R 8 is a cyclic saturated hydrocarbon such as a cycloalkyl group which may have a substituent, or an organic group having the cyclic saturated hydrocarbon.

  提供一种适用于250nm或更短波长准分子激光光刻材料的基础聚合物的氟聚合物。该氟聚合物具有由以下化学式(3)表示的氟化二烯化合物的环聚合物单体单元，CF2═CFCF2—C(CF3)(R5)—CH2CH═CH2(3)其中，R5为通过—CHR7—O—R8阻断的羟基基团或具有羟基基团的有机基团，R8为环状饱和碳氢化合物，例如可能具有取代基团的环烷基团，或具有环状饱和碳氢化合物的有机基团。
• Photoactive Compounds
  申请人：Rahman Dalil M.

  公开号：US20080058542A1

  公开（公告）日：2008-03-06

  The present invention relates to a novel photoactive compounds that can be used in formulating photoresist compositions.

  本发明涉及一种新型光活性化合物，可用于制备光阻组合物。
• ANTIREFLECTIVE COATING COMPOSITION AND PROCESS THEREOF
  申请人：Rahman M. Dalil

  公开号：US20120251943A1

  公开（公告）日：2012-10-04

  The invention relates to an antireflective coating composition comprising a crosslinker and a crosslinkable polymer capable of being crosslinked by the crosslinker, where the crosslinkable polymer comprises a unit represented by structure (1): A-B—C  (1) where A is a fused aromatic ring, B has a structure (2), and C is a hydroxybiphenyl of structure (3) where R 1 is C 1 -C 4 alkyl and R 2 is C 1 -C 4 alkyl. The invention further relates to a process for forming an image using the composition.

  本发明涉及一种防反射涂层组合物，包括交联剂和可由交联剂交联的交联性聚合物，其中所述交联性聚合物包括由结构式（1）表示的单元：A-B—C  （1）其中，A是融合芳香环，B具有结构式（2），C是结构式（3）的羟基联苯，其中R1为C1-C4烷基，R2为C1-C4烷基。本发明还涉及使用该组合物形成图像的方法。