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1.1-Di-(tert.-butyloxy)-butan | 7735-96-8

中文名称
——
中文别名
——
英文名称
1.1-Di-(tert.-butyloxy)-butan
英文别名
1,1-Di-tert.butylperoxy-butan;di-tert-butyl butane-1,1-diyl bis-peroxide;1,1-Bis(tert-butylperoxy)butane
1.1-Di-(tert.-butyloxy)-butan化学式
CAS
7735-96-8
化学式
C12H26O4
mdl
——
分子量
234.336
InChiKey
BEGHWJKOEXHMAZ-UHFFFAOYSA-N
BEILSTEIN
——
EINECS
——
  • 物化性质
  • 计算性质
  • ADMET
  • 安全信息
  • SDS
  • 制备方法与用途
  • 上下游信息
  • 反应信息
  • 文献信息
  • 表征谱图
  • 同类化合物
  • 相关功能分类
  • 相关结构分类

计算性质

  • 辛醇/水分配系数(LogP):
    3.4
  • 重原子数:
    16
  • 可旋转键数:
    8
  • 环数:
    0.0
  • sp3杂化的碳原子比例:
    1.0
  • 拓扑面积:
    36.9
  • 氢给体数:
    0
  • 氢受体数:
    4

反应信息

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文献信息

  • DIENE-BASED CARBOXYLATE ANION AND SALT THEREOF, AND POLYMERIZABLE OR CURABLE COMPOSITION THEREOF
    申请人:Kaneko Tomomasa
    公开号:US20130197123A1
    公开(公告)日:2013-08-01
    The claimed invention provides a novel compound not having been studied before, that is, a diene carboxylate anion that contains a specific structure, and a salt thereof. The claimed invention further provides a diene carboxylate anion and a salt thereof, especially a metal salt thereof, which are easily soluble in general organic solvents, reactive diluents, and resins, may be in a liquid state at normal temperature depending on the structure, and have high polymerizability. Polymerization/curing of these produces a resin to which many ionic bonds and a metal are introduced, providing various properties such as hardness, scratch resistance, anti-fingerprint property, gas-barrier property, water vapor barrier property, oxygen absorption property, ultraviolet protection, infrared protection, color development and coloring, high refractive index, adhesion, various catalytic abilities, fluorescence ability and light-emitting ability, optical amplification, dispersibility, and antistatic properties. In addition, the anion and the salt can be used for raw materials for functional fine particles and for metal nanoparticle composites, and also for MOD materials. The claimed invention also provides an advantageous method for producing the diene carboxylate anion and the salt thereof.
    所述发明提供了一种新颖的化合物,此化合物以前未被研究过,即一种含有特定结构的二烯二酸盐阴离子及其盐。所述发明进一步提供了一种二烯二酸盐阴离子及其盐,特别是其属盐,这些盐在一般有机溶剂、反应性稀释剂和树脂中易溶解,在常温下可能处于液态,具有高聚合性。这些的聚合/固化产生的树脂引入了许多离子键和属,提供了硬度、抗刮擦性、防指纹性、气体屏障性、阻汽性、氧气吸收性、紫外线保护、红外线保护、颜色开发和着色、高折射率、粘附性、各种催化能力、荧光能力和发光能力、光学放大、分散性和抗静电性等各种性能。此外,该阴离子和盐可用作功能性细颗粒和属纳米粒子复合材料的原材料,也可用于MOD材料。所述发明还提供了一种生产二烯二酸盐阴离子及其盐的优势方法。
  • COMPOUND, RESIN, COMPOSITION AND PATTERN FORMATION METHOD
    申请人:Mitsubishi Gas Chemical Company, Inc.
    公开号:US20210070727A1
    公开(公告)日:2021-03-11
    The present invention provides a compound represented by following formula (0):
    本发明提供了以下式(0)表示的化合物。
  • COMPOUND, RESIN, COMPOSITION, RESIST PATTERN FORMATION METHOD AND CIRCUIT PATTERN FORMATION METHOD
    申请人:Mitsubishi Gas Chemical Company, Inc.
    公开号:US20210070685A1
    公开(公告)日:2021-03-11
    The present invention provides a compound having a specific structure represented by the following formula (0), a resin having a constituent unit derived from the compound, various compositions containing the compound and/or the resin, and various methods using the compositions.
    本发明提供一种具有以下式(0)所代表的特定结构的化合物,具有从该化合物衍生的组分单元的树脂,含有该化合物和/或树脂的各种组合物,以及使用这些组合物的各种方法。
  • FILM FORMING MATERIAL FOR LITHOGRAPHY, COMPOSITION FOR FILM FORMATION FOR LITHOGRAPHY, UNDERLAYER FILM FOR LITHOGRAPHY, AND METHOD FOR FORMING PATTERN
    申请人:Mitsubishi Gas Chemical Company, Inc.
    公开号:US20200166844A1
    公开(公告)日:2020-05-28
    The present invention provides a film forming material for lithography comprising a compound having a group of the following formula (0):
    本发明提供了一种用于光刻的薄膜形成材料,包括具有以下公式(0)中的基团的化合物。
  • COMPOUND, RESIN, COMPOSITION, RESIST PATTERN FORMATION METHOD, CIRCUIT PATTERN FORMATION METHOD AND METHOD FOR PURIFYING RESIN
    申请人:Mitsubishi Gas Chemical Company, Inc.
    公开号:US20200361843A1
    公开(公告)日:2020-11-19
    A compound represented by the following formula (1). (In the formula (1), A is a group containing a heteroatom; R 1 is a 2n-valent group having 1 to 30 carbon atoms and optionally having a substituent; R 2 to R 5 are each independently a linear, branched or cyclic alkyl group having 1 to 30 carbon atoms and optionally having a substituent, an aryl group having 6 to 30 carbon atoms and optionally having a substituent, an alkenyl group having 2 to 30 carbon atoms and optionally having a substituent, an alkynyl group having 2 to 30 carbon atoms and optionally having a substituent, an alkoxy group having 1 to 30 carbon atoms and optionally having a substituent, a halogen atom, a nitro group, an amino group, a carboxylic acid group, a crosslinkable group, a dissociation group, a thiol group or a hydroxy group, wherein the alkyl group, the aryl group, the alkenyl group and the alkoxy group each optionally contain an ether bond, a ketone bond or an ester bond and at least one R 4 and/or at least one R 5 is a hydroxy group and/or a thiol group; m 2 and m 3 are each independently an integer of 0 to 8; m 4 and m 5 are each independently an integer of 0 to 9; n is an integer of 1 to 4; and p 2 to p 5 are each independently an integer of 0 to 2.)
    以下是由以下式子(1)表示的化合物。(在式子(1)中,A是含有杂原子的基团;R1是具有1到30个碳原子并可选地具有取代基的2n价基团;R2至R5分别是线性,支链或环状烷基,具有1到30个碳原子并可选地具有取代基,具有6到30个碳原子并可选地具有取代基的芳基,具有2到30个碳原子并可选地具有取代基的烯基,具有2到30个碳原子并可选地具有取代基的炔基,具有1到30个碳原子并可选地具有取代基的烷氧基,卤素原子,硝基,基,羧酸基,交联基,解离基,醇基或羟基,其中烷基,芳基,烯基和烷氧基各自可选地包含醚键,酮键或酯键,并且至少有一个R4和/或至少有一个R5是羟基和/或醇基;m2和m3分别是0到8的整数;m4和m5分别是0到9的整数;n是1到4的整数;p2到p5分别是0到2的整数。)
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