furan-2,3,4-tricarbaldehyde | 39567-64-1

• 分子结构分类: 有机化合物 - 有机氧化合物
• 英文名称: furan-2,3,4-tricarbaldehyde
• CAS: 39567-64-1
• 化学式: C₇H₄O₄
• 分子量: 152.106
• InChiKey: VUMNCPCRAVDZED-UHFFFAOYSA-N

计算性质

• 辛醇/水分配系数(LogP)：
  -0.3
• 重原子数：
  11
• 可旋转键数：
  3
• 环数：
  1.0
• sp3杂化的碳原子比例：
  0.0
• 拓扑面积：
  64.4
• 氢给体数：
  0
• 氢受体数：
  4

反应信息

• 作为反应物：
  描述：

  furan-2,3,4-tricarbaldehyde 在 肼 作用下， 生成 呋喃并[2,3-d]哒嗪-3-甲醛
  参考文献：
  名称：

  Decroix,B. et al., Bulletin de la Societe Chimique de France, 1972, p. 3453 - 3462

  摘要：

  DOI：

文献信息

• [EN] PROCESS FOR THE CONVERSION OF A SOLID LIGNOCELLULOSIC MATERIAL<br/>[FR] PROCÉDÉ DE CONVERSION D'UNE MATIÈRE LIGNOCELLULOSIQUE SOLIDE
  申请人：AVANTIUM KNOWLEDGE CENTRE BV

  公开号：WO2019149843A1

  公开（公告）日：2019-08-08

  A process, which process includes the following steps: a) converting a solid material containing hemicellulose, cellulose and lignin, by: (i) hydrolyzing, at a temperature equal to or less than 40 °C, preferably equal to or less than 30 °C, at least part of the hemicellulose of the solid material with a first aqueous hydrochloric acid solution, which first aqueous hydrochloric acid solution has a hydrochloric acid concentration in the range from equal to or more than 15.0 wt. % to less than 40.0 wt. %, based on the weight amount of water and hydrochloric acid in such first aqueous hydrochloric acid solution, yielding a remaining solid material and a hydrochloric acid- containing, aqueous, first hydrolysate product solution; (ii) hydrolyzing, at a temperature equal to or less than 40 °C, preferably equal to or less than 30 °C, at least part of the cellulose of the remaining solid material with a second aqueous hydrochloric acid solution, which second aqueous hydrochloric acid solution has a hydrochloric acid concentration in the range from equal to or more than 40.0 wt. % to equal to or less than 51.0 wt. %, based on the weight amount of water and hydrochloric acid in such second aqueous hydrochloric acid solution, yielding a residue and a hydrochloric acid- containing, aqueous, second hydrolysate product solution. (b) forwarding to step (c) a, hydrochloric acid-containing, aqueous intermediate product solution comprising: - a part of or the whole of the hydrochloric acid-containing, aqueous first hydrolysate product solution of step (a); and/or - a part of or the whole of the, hydrochloric acid-containing, aqueous second hydrolysate product solution of step (a); and (c) heating at least part of the hydrochloric acid-containing, aqueous intermediate product solution to a temperature equal to or more than 60 °C, yielding a product solution containing 5-(chloromethyl)furfural, and extracting the 5-(chloromethyl)furfural from such product solution into an extraction solvent.

  一种过程，该过程包括以下步骤：a) 通过以下步骤转化含有半纤维素、纤维素和木质素的固体材料：(i) 用第一水溶性盐酸溶液水解固体材料的至少部分半纤维素，水解温度等于或低于40°C，优选等于或低于30°C，所述第一水溶性盐酸溶液中盐酸浓度在15.0 wt.%至40.0 wt.%范围内，基于所述第一水溶性盐酸溶液中水和盐酸的重量，产生剩余固体材料和含盐酸的水性第一水解产物溶液；(ii) 用第二水溶性盐酸溶液水解剩余固体材料的至少部分纤维素，水解温度等于或低于40°C，优选等于或低于30°C，所述第二水溶性盐酸溶液中盐酸浓度在40.0 wt.%至51.0 wt.%范围内，基于所述第二水溶性盐酸溶液中水和盐酸的重量，产生残渣和含盐酸的水性第二水解产物溶液。(b) 将包括氯代甲基糠醛的产品溶液中的5-提取到萃取溶剂中。
• Compound for Resist and Radiation-Sensitive Composition
  申请人：Echigo Masatoshi

  公开号：US20080113294A1

  公开（公告）日：2008-05-15

  A radiation-sensitive composition containing 1 to 80% by weight of a solid component and 20 to 99% by weight of a solvent. The solid component contains a compound B which has (a) a structure derived from a polyphenol compound A by introducing an acid-dissociating group to at least one phenolic hydroxyl group of the polyphenol compound A which is synthesized by a condensation between a di- to tetrafunctional aromatic ketone or aromatic aldehyde each having 5 to 36 carbon atoms with a compound having 1 to 3 phenolic hydroxyl groups and 6 to 15 carbon atoms, and (b) a molecular weight of 400 to 2000. The composition containing the compound B is useful as an acid-amplified, non-polymeric resist material, because it is highly sensitive to radiation such as KrF excimer lasers, extreme ultraviolet rays, electron beams, and X-rays, and provides resist patterns with a high resolution, high heat resistance, and high etching resistance.

  一种辐射敏感的组合物，包含1至80重量％的固体组分和20至99重量％的溶剂。固体组分包含化合物B，其具有（a）通过向多酚化合物A的至少一个酚羟基引入酸解离基而导出的结构，多酚化合物A通过二元至四元芳香酮或芳香醛的缩合反应，每个具有5至36个碳原子的化合物与具有1至3个酚羟基和6至15个碳原子的化合物结合，并且（b）分子量为400至2000。含有化合物B的组合物非常敏感于辐射，例如KrF准分子激光器，极紫外线，电子束和X射线，并且提供具有高分辨率，高耐热性和高蚀刻抗性的抗阻图案，因此可用作酸放大的非聚合物抗阻材料。
• COMPOUND FOR RESIST AND RADIATION-SENSITIVE COMPOSITION
  申请人：ECHIGO Masatoshi

  公开号：US20110165516A1

  公开（公告）日：2011-07-07

  A radiation-sensitive composition containing 1 to 80% by weight of a solid component and 20 to 99% by weight of a solvent. The solid component contains a compound B which has (a) a structure derived from a polyphenol compound A by introducing an acid-dissociating group to at least one phenolic hydroxyl group of the polyphenol compound A which is synthesized by a condensation between a di- to tetrafunctional aromatic ketone or aromatic aldehyde each having 5 to 36 carbon atoms with a compound having 1 to 3 phenolic hydroxyl groups and 6 to 15 carbon atoms, and (b) a molecular weight of 400 to 2000. The composition containing the compound B is useful as an acid-amplified, non-polymeric resist material, because it is highly sensitive to radiation such as KrF excimer lasers, extreme ultraviolet rays, electron beams, and X-rays, and provides resist patterns with a high resolution, high heat resistance, and high etching resistance.

  一种辐射敏感组合物，含有1-80重量％的固体组分和20-99重量％的溶剂。固体组分包含化合物B，其具有（a）从多酚化合物A导出的结构，通过在多酚化合物A的至少一个酚羟基上引入酸解离基团而合成，多酚化合物A是由具有5至36个碳原子的二元至四元芳香酮或芳香醛与具有1至3个酚羟基和6至15个碳原子的化合物之间的缩合反应合成的；（b）分子量为400至2000。含有化合物B的组合物可用作酸放大，非聚合物抗蚀材料，因为它对KrF准分子激光、极紫外线、电子束和X射线等辐射非常敏感，并提供具有高分辨率、高耐热性和高蚀刻抗性的抗蚀图案。
• Compound for resist and radiation-sensitive composition
  申请人：MITSUBISHI GAS CHEMICAL COMPANY, INC.

  公开号：EP2662727A2

  公开（公告）日：2013-11-13

  A radiation-sensitive composition containing 1 to 80% by weight of a solid component and 20 to 99% by weight of a solvent. The solid component contains a compound B which has (a) a structure derived from a polyphenol compound A by introducing an acid-dissociating group to at least one phenolic hydroxyl group of the polyphenol compound A which is synthesized by a condensation between a compound selected from the group consisting of compounds such as for instance diformylbenzene, diacetylbenzene and diformyltoluene; or a di- to tetrafunctional aromatic ketone or aromatic aldehyde each having 12 to 36 carbon atoms with a compound having 1 to 3 phenolic hydroxyl groups and 6 to 15 carbon atoms, and (b) a molecular weight of 400 to 2000. The composition containing the compound B is useful as an acid-amplified, non-polymeric resist material, because it is highly sensitive to radiation such as KrF excimer lasers, extreme ultraviolet rays, electron beams, and X-rays, and provides resist patterns with a high resolution, high heat resistance, and high etching resistance.

  一种辐射敏感组合物，含有 1%至 80%（按重量计）的固体成分和 20%至 99%（按重量计）的溶剂。固体成分含有一种化合物 B，该化合物 B 具有 (a) 由多酚类化合物 A 衍生出的结构，该结构是通过在多酚类化合物 A 的至少一个酚羟基上引入酸解离基团而形成的，该多酚类化合物 A 是由选自以下组成的化合物组的化合物缩合合成的：例如二甲酰基苯、二乙酰基苯和二甲酰基甲苯；(b) 分子量为 400 至 2000。含有化合物 B 的组合物可用作酸放大的非聚合抗蚀剂材料，因为它对诸如 KrF 准分子激光、极紫外线、电子束和 X 射线等辐射高度敏感，并能提供具有高分辨率、高耐热性和高抗蚀性的抗蚀图案。
• POLYMERIC COMPOSITION FOR MANUFACTURING A POLYPHENOL BASED FOAM MATERIAL, AND PROCESS THEREOF
  申请人：Silvachimica S.r.l.

  公开号：EP2963072A1

  公开（公告）日：2016-01-06

  A polymeric composition for manufacturing a polyphenolic based foam material includes isocyanate, an acid catalyst and tannins. The composition has a mixed tannin-furan-isocyanate structure in which the tannins are part of a resin having the function of reactant for the composition, and it is completely free of low-boiling solvents. The amount of isocyanate is substantially greater than 1% by weight of the composition, preferably not less than 10% by weight with respect to the composition. The composition is adapted to obtain foam materials by means of the plants used for manufacturing polyurethane foam materials.

  一种用于制造以多酚为基础的泡沫材料的聚合物组合物包括异氰酸酯、酸催化剂和单宁酸。该组合物具有单宁-呋喃-异氰酸酯混合结构，其中单宁是具有组合物反应剂功能的树脂的一部分，并且完全不含低沸点溶剂。异氰酸酯的用量基本上大于组合物重量的 1%，最好不少于组合物重量的 10%。该组合物适用于通过用于制造聚氨酯泡沫材料的设备获得泡沫材料。