To provide a fluoropolymer having functional groups and having high transparency in a wide wavelength region, and a resist composition comprising the fluoropolymer. A fluoropolymer (A) having monomer units formed by polymerization of a fluorinated diene represented by the following formula (1):
CF
2
═CFCH
2
CH-Q-CH
2
CH═CH
2
(1)
wherein Q is (CH
2
)
a
C(CF
3
)
2
OR
4
(wherein a is an integer of from 0 to 3, R
4
is an alkyl group or a fluorinated alkyl group having at most 20 carbon atoms which may have an etheric oxygen atom, an alkoxycarbonyl group having at most 6 carbon atoms, or CH
2
R
5
(wherein R
5
is an alkoxycarbonyl group having at most 6 carbon atoms)), or (CH
2
)
d
COOR
6
(wherein d is 0 or 1, and R
6
is a hydrogen atom, or an alkyl group or a fluorinated alkyl group having at most 20 carbon atoms), a process for its production and a resist composition having the fluoropolymer (A) as a base.
提供一种具有功能性基团和在宽波长区域内具有高透明度的
氟聚合物以及包含该
氟聚合物的抗蚀组合物。
氟聚合物(A)具有由聚合
氟化二烯形成的单体单元,该
氟化二烯由以下公式(1)表示:
CF2═CF CH-Q- CH═
CH2(1),其中Q是( )aC(
CF3)2OR4(其中a是0至3的整数,R4是最多具有20个碳原子的烷基或氟烷基,可以具有醚氧原子,最多具有6个碳原子的烷氧羰基基团,或 R5(其中R5是最多具有6个碳原子的烷氧羰基基团)),或( )dCOOR6(其中d为0或1,R6是氢原子,或最多具有20个碳原子的烷基或氟烷基),以及其制备过程以及以
氟聚合物(A)为基础的抗蚀组合物。