hexahydro-3,6-methanobenzofuran-2(3H)-one | 68069-59-0

• 分子结构分类: 有机化合物 - 有机杂环化合物 - 内酯类
• 英文名称: hexahydro-3,6-methanobenzofuran-2(3H)-one
• 英文别名: 4-Oxatricyclo[4.3.1.03,7]decan-5-one
• CAS: 68069-59-0
• 化学式: C₉H₁₂O₂
• 分子量: 152.193
• InChiKey: GSYWUNMJAMNGKW-UHFFFAOYSA-N

计算性质

• 辛醇/水分配系数(LogP)：
  1.6
• 重原子数：
  11
• 可旋转键数：
  0
• 环数：
  4.0
• sp3杂化的碳原子比例：
  0.89
• 拓扑面积：
  26.3
• 氢给体数：
  0
• 氢受体数：
  2

反应信息

• 作为反应物：
  描述：

  hexahydro-3,6-methanobenzofuran-2(3H)-one 、 硫酸 、 水 生成 Hexahydro-3,6-methanocyclopenta[c]pyran-1(3H)-one
  参考文献：
  名称：

  BRECKNELL, D. J.;CARMAN, R. M.;DAY, P. J., AUSTRAL. J. CHEM., 1984, 37, N 11, 2323-2327

  摘要：

  DOI：
• 作为产物：
  描述：

  (1R,2R,7S)-2-phenylsulfanyl-4-oxatricyclo[4.3.1.03,7]decan-5-one 生成 hexahydro-3,6-methanobenzofuran-2(3H)-one
  参考文献：
  名称：

  BRECKNELL, D. J.;CARMAN, R. M.;DAY, P. J., AUSTRAL. J. CHEM., 1984, 37, N 11, 2323-2327

  摘要：

  DOI：

文献信息

• PATTERN FORMING METHOD, ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION AND RESIST FILM
  申请人：Enomoto Yuichiro

  公开号：US20120282548A1

  公开（公告）日：2012-11-08

  Provided is a pattern forming method comprising (i) a step of forming a film from an actinic ray-sensitive or radiation-sensitive resin composition, (ii) a step of exposing the film, and (iii) a step of developing the exposed film by using an organic solvent-containing developer, wherein the actinic ray-sensitive or radiation-sensitive resin composition comprises (A) a resin capable of decreasing the solubility for an organic solvent-containing developer by the action of an acid, (B) a compound capable of generating an acid upon irradiation with an actinic ray or radiation, (D) a solvent, and (G) a compound having at least either one of a fluorine atom and a silicon atom and having basicity or being capable of increasing the basicity by the action of an acid.

  提供的是一种形成图案的方法，包括(i)使用光致或辐射敏感树脂组成物形成薄膜的步骤，(ii)曝光薄膜的步骤，以及(iii)使用有机溶剂含有的显影剂显影曝光后的薄膜的步骤，其中光致或辐射敏感树脂组成物包括(A)一种能够通过酸的作用降低有机溶剂含有的显影剂的溶解度的树脂，(B)一种能够在光致或辐射照射下生成酸的化合物，(D)一种溶剂，以及(G)一种具有氟原子和硅原子中的至少一种，并具有碱性或能够通过酸的作用增加碱性的化合物。
• RESIST COMPOSITION AND PATTERN-FORMING METHOD USING SAME
  申请人：Kamimura Sou

  公开号：US20080241737A1

  公开（公告）日：2008-10-02

  A resist composition comprises (A) at least two kinds of resins each of which decomposes by the action of an acid to undergo an increase in its solubility for an alkali developer, wherein at least one kind of the resins (A) is a resin synthesized by living radical polymerization using a chain transfer agent represented by formula (I): wherein: A represents an organic group not containing hetero atoms; and Y represents an organic group capable of releasing a radical.

  一种抗蚀性组合物包括（A）至少两种树脂，每种树脂通过酸的作用分解，以增加其对碱性显影剂的溶解度，其中至少一种树脂（A）是通过使用由式（I）表示的链转移剂合成的活性自由基聚合树脂：其中：A代表不含杂原子的有机基团；Y代表能够释放自由基的有机基团。
• ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, RESIST FILM, PATTERN FORMING METHOD, MANUFACTURING METHOD OF ELECTRONIC DEVICE USING THE SAME, AND ELECTRONIC DEVICE
  申请人：FUJIFILM CORPORATION

  公开号：US20150185612A1

  公开（公告）日：2015-07-02

  There is provided an actinic ray-sensitive or radiation-sensitive resin composition comprising: (A) a resin having a repeating unit represented by the specific formula and a group capable of decomposing by an action of an acid to produce a polar group; and an ionic compound represented by the specific formula, and a resist film comprising the actinic ray-sensitive or radiation-sensitive resin composition.

  提供一种光致射线敏感或辐射敏感的树脂组合物，包括：（A）具有特定公式表示的重复单元和能够通过酸作用分解产生极性基团的基团的树脂；以及具有特定公式表示的离子化合物，以及包括该光致射线敏感或辐射敏感的树脂组合物的抗蚀膜。
• Pattern forming method, composition kit and resist film, manufacturing method of electronic device using these, and electronic device
  申请人：FUJIFILM Corporation

  公开号：US10031419B2

  公开（公告）日：2018-07-24

  There is provided a pattern forming method comprising (i) forming a film on a substrate using an actinic ray-sensitive or radiation-sensitive resin composition which contains (A) a resin which decomposes due to an action of an acid to change its solubility with respect to a developer and (C) a specific resin, (ii) forming a top coat layer using a top coat composition which contains a resin (T) on the film, (iii) exposing the film which has the top coat layer to actinic rays or radiation, and (iv) forming a pattern by developing the film which has the top coat layer after the exposing.

  本发明提供了一种图案形成方法，包括(i)使用感光树脂组合物或辐射敏感树脂组合物在基底上形成胶片，该组合物包含(A)由于酸的作用而分解，从而改变其相对于显影剂的溶解度的树脂和(C)特定树脂、(ii) 使用含有树脂 (T) 的表层组合物在胶片上形成表层，(iii) 将具有表层的胶片暴露于放 射线或辐射，(iv) 在暴露后对具有表层的胶片进行显影，形成图案。
• Actinic ray-sensitive or radiation-sensitive resin composition, actinic ray-sensitive or radiation-sensitive film, mask blank provided with actinic ray-sensitive or radiation-sensitive film, pattern forming method, method for manufacturing electronic device, electronic device, and compound
  申请人：FUJIFILM Corporation

  公开号：US10011576B2

  公开（公告）日：2018-07-03

  The actinic ray-sensitive or radiation-sensitive resin composition includes a crosslinking agent having a polarity converting group and an alkali-soluble resin, in which the polarity converting group is a group capable of decomposing by the action of an alkaline aqueous solution to generate a carboxylic acid or sulfonic acid on the side having a crosslinking group.

  光敏或辐射敏感树脂组合物包括具有极性转换基团的交联剂和碱溶性树脂，其中极性转换基团是能够在碱性水溶液作用下分解的基团，在具有交联基团的一侧生成羧酸或磺酸。