2-(4-氨基苯基)-6-氨基苯并�f唑 | 16363-53-4

• 分子结构分类: 有机化合物 - 有机杂环化合物 - 唑类
• 中文名称: 2-(4-氨基苯基)-6-氨基苯并�f唑
• 中文别名: 2-(4-氨基苯基)-6-氨基苯并噁唑
• 英文名称: 2-(4-aminophenyl)-6-aminobenzoxazole
• 英文别名: 6-amino-2-(4'-aminophenyl)-benzoxazole；2-(4-Aminophenyl)-1,3-benzoxazol-6-amine
• CAS: 16363-53-4
• 化学式: C₁₃H₁₁N₃O
• 分子量: 225.25
• InChiKey: IBKFNGCWUPNUHY-UHFFFAOYSA-N

物化性质

• 熔点：
  194-195 °C
• 沸点：
  435.2±25.0 °C(Predicted)
• 密度：
  1.329±0.06 g/cm3(Predicted)
• 溶解度：
  可溶于DMSO（少许）、甲醇（少许）

计算性质

• 辛醇/水分配系数(LogP)：
  2.1
• 重原子数：
  17
• 可旋转键数：
  1
• 环数：
  3.0
• sp3杂化的碳原子比例：
  0.0
• 拓扑面积：
  78.1
• 氢给体数：
  2
• 氢受体数：
  4

安全信息

• 海关编码：
  2934999090

反应信息

• 作为反应物：
  描述：

  4-溴-2-甲基吡啶 、 2-(4-氨基苯基)-6-氨基苯并�f唑 在 tris-(dibenzylideneacetone)dipalladium(0) 、 potassium carbonate 、 2-二环己基磷-2,4,6-三异丙基联苯 作用下， 以 乙醇 为溶剂， 以57 %的产率得到(N-(2-methylpyridin-4-yl)-2-(4-((2-methylpyridin-4-yl)amino)phenyl)benzo[d]oxazol-6-amine)
  参考文献：
  名称：

  [EN] AKT3 MODULATORS
  [FR] MODULATEURS D'AKT3

  摘要：

  Compounds of Formula (Ia), (Ib), or (Ic), are described, where the various substituents are defined herein. The compounds can modulate a property or effect of Akt3in vitroorin vivo, and can also be used, individually or in combination with other agents, in the prevention or treatment of a variety of conditions. Methods for synthesizing the compounds are described. Pharmaceutical compositions and methods of using these compounds or compositions, individually or in combination with other agents or compositions, in the prevention or treatment of a variety of conditions are also described.

  公开号：

  WO2023081845A1
• 作为产物：
  描述：

  N-(2-hydroxy-4-nitrophenyl)-4-nitrobenzamide 在 palladium on activated charcoal 作用下， 以 四氢呋喃 为溶剂， 50.0~100.0 ℃ 、1.79 MPa 条件下， 反应 8.0h， 生成 2-(4-氨基苯基)-6-氨基苯并�f唑
  参考文献：
  名称：

  TWI558696

  摘要：

  公开号：

文献信息

• COMPOUND, RESIN, COMPOSITION AND PATTERN FORMATION METHOD
  申请人：Mitsubishi Gas Chemical Company, Inc.

  公开号：US20210070727A1

  公开（公告）日：2021-03-11

  The present invention provides a compound represented by following formula (0):

  本发明提供了以下式（0）表示的化合物。
• COMPOUND, RESIN, COMPOSITION, RESIST PATTERN FORMATION METHOD AND CIRCUIT PATTERN FORMATION METHOD
  申请人：Mitsubishi Gas Chemical Company, Inc.

  公开号：US20210070685A1

  公开（公告）日：2021-03-11

  The present invention provides a compound having a specific structure represented by the following formula (0), a resin having a constituent unit derived from the compound, various compositions containing the compound and/or the resin, and various methods using the compositions.

  本发明提供一种具有以下式（0）所代表的特定结构的化合物，具有从该化合物衍生的组分单元的树脂，含有该化合物和/或树脂的各种组合物，以及使用这些组合物的各种方法。
• FILM FORMING MATERIAL FOR LITHOGRAPHY, COMPOSITION FOR FILM FORMATION FOR LITHOGRAPHY, UNDERLAYER FILM FOR LITHOGRAPHY, AND METHOD FOR FORMING PATTERN
  申请人：Mitsubishi Gas Chemical Company, Inc.

  公开号：US20200166844A1

  公开（公告）日：2020-05-28

  The present invention provides a film forming material for lithography comprising a compound having a group of the following formula (0):

  本发明提供了一种用于光刻的薄膜形成材料，包括具有以下公式（0）中的基团的化合物。
• COMPOUND, RESIN, COMPOSITION, RESIST PATTERN FORMATION METHOD, CIRCUIT PATTERN FORMATION METHOD AND METHOD FOR PURIFYING RESIN
  申请人：Mitsubishi Gas Chemical Company, Inc.

  公开号：US20200361843A1

  公开（公告）日：2020-11-19

  A compound represented by the following formula (1). (In the formula (1), A is a group containing a heteroatom; R 1 is a 2n-valent group having 1 to 30 carbon atoms and optionally having a substituent; R 2 to R 5 are each independently a linear, branched or cyclic alkyl group having 1 to 30 carbon atoms and optionally having a substituent, an aryl group having 6 to 30 carbon atoms and optionally having a substituent, an alkenyl group having 2 to 30 carbon atoms and optionally having a substituent, an alkynyl group having 2 to 30 carbon atoms and optionally having a substituent, an alkoxy group having 1 to 30 carbon atoms and optionally having a substituent, a halogen atom, a nitro group, an amino group, a carboxylic acid group, a crosslinkable group, a dissociation group, a thiol group or a hydroxy group, wherein the alkyl group, the aryl group, the alkenyl group and the alkoxy group each optionally contain an ether bond, a ketone bond or an ester bond and at least one R 4 and/or at least one R 5 is a hydroxy group and/or a thiol group; m 2 and m 3 are each independently an integer of 0 to 8; m 4 and m 5 are each independently an integer of 0 to 9; n is an integer of 1 to 4; and p 2 to p 5 are each independently an integer of 0 to 2.)

  以下是由以下式子（1）表示的化合物。（在式子（1）中，A是含有杂原子的基团；R1是具有1到30个碳原子并可选地具有取代基的2n价基团；R2至R5分别是线性，支链或环状烷基，具有1到30个碳原子并可选地具有取代基，具有6到30个碳原子并可选地具有取代基的芳基，具有2到30个碳原子并可选地具有取代基的烯基，具有2到30个碳原子并可选地具有取代基的炔基，具有1到30个碳原子并可选地具有取代基的烷氧基，卤素原子，硝基，氨基，羧酸基，交联基，解离基，硫醇基或羟基，其中烷基，芳基，烯基和烷氧基各自可选地包含醚键，酮键或酯键，并且至少有一个R4和/或至少有一个R5是羟基和/或硫醇基；m2和m3分别是0到8的整数；m4和m5分别是0到9的整数；n是1到4的整数；p2到p5分别是0到2的整数。）
• COMPOUND, RESIN, COMPOSITION, PATTERN FORMATION METHOD, AND PURIFICATION METHOD
  申请人：Mitsubishi Gas Chemical Company, Inc.

  公开号：US20200247739A1

  公开（公告）日：2020-08-06

  The present invention provides a compound, a resin and a composition that are excellent in solvent solubility, are applicable to a wet process, are excellent in heat resistance and etching resistance, and are useful for forming a film for lithography. The present invention also provides pattern formation methods using the composition. The present invention further provides a method for purifying the compound and the resin. A composition comprising a compound having a specific structure and/or a resin having a constituent unit derived from the compound is used.

  本发明提供了一种具有优异溶剂溶解性、适用于湿法工艺、具有优异耐热性和蚀刻抗性的化合物、树脂和组合物，用于形成光刻膜。本发明还提供了使用该组合物的图案形成方法。本发明还提供了一种用于纯化该化合物和树脂的方法。所使用的组合物包括具有特定结构的化合物和/或由该化合物衍生的组分单位的树脂。