申请人:AZ Electronic Materials (Luxembourg) S.a.r.l.
公开号:US10409161B2
公开(公告)日:2019-09-10
To provide a positive type photosensitive composition capable of forming a pattern of high resolution, of high heat resistance and of high transparency without emitting harmful volatile substances such as benzene, also capable of reducing pattern defects caused by development residues, by undissolved residues, or by reattached hardly-soluble trace left in pattern formation, and further capable of being excellent in storage stability. The present invention provides a positive type photosensitive siloxane composition comprising: a polysiloxane having a phenyl group, a diazonaphthoquinone derivative, a hydrate or solvate of a photo base-generator having a particular nitrogen-containing hetero-cyclic structure, and an organic solvent.
提供一种正型感光组合物,该组合物能够形成高分辨率、高耐热性和高透明度的图案,且不释放有害挥发性物质(如苯),还能够减少因显影残留物、未溶解残留物或图案形成过程中残留的重新附着的难溶微量物质而造成的图案缺陷,并且具有优异的储存稳定性。本发明提供了一种正型光敏硅氧烷组合物,该组合物包括:具有苯基的聚硅氧烷、重氮萘醌衍生物、具有特定含氮杂环结构的光碱发生剂的水合物或溶液以及有机溶剂。