申请人:Hoffmann-La Roche Inc.
公开号:US04801584A1
公开(公告)日:1989-01-31
The invention is concerned with tricyclic compounds of the formula ##STR1## wherein R.sup.1 is a hydrogen atom or a carboxy-protecting radical; R.sup.2 is a hydrogen atom or a lower alkyl radical which may be substituted with a halogen atom; R.sup.3 and R.sup.4 independently are a hydrogen atom or a lower alkyl radical which may be substituted with a hydroxy radical or a substituted or unsubstituted amino radical; X is a halogen atom; and R.sup.5 and R.sup.6 are independently a hydrogen atom or a lower alkyl radical which may be substituted with a hydroxy radical, a lower alkoxy radical or a substituted or unsubstituted amino radical; or R.sup.5 and R.sup.6, taken together with the adjacent nitrogen atom, may form a 5 to 7 membered heterocyclic ring which may be substituted with one or more substituents at the carbon atom(s), and the heterocyclic ring may further contain --NR.sup.7 --, --O--, --S--, --SO--, --SO.sub.2 -- or --NR.sup.7 --CO--, and also R.sup.7 is a hydrogen atom, a lower alkenyl radical, a lower alkyl or aralkyl radical which may be substituted, or a radical represented by the formula --(CH.sub.2).sub.n COR.sup.8 (II) in which n is an integer from 0 to 4 and R.sup.8 is a hydrogen atom, a lower alkoxy radical, or an amino, lower alkyl or aryl radical which may be substituted, as well as pharmaceutically acceptable salts thereof, and hydrates or solvates of the compounds of the formula I or their salts. Also included is a process for the manufacture of these compounds, pharmaceutical preparations containing them, intermediates useful in said process, and methods of using them. The end products have antimicrobial activity.
该发明涉及公式为##STR1##的三环化合物,其中R.sup.1是氢原子或羧基保护基;R.sup.2是氢原子或可以用卤原子取代的较低烷基基团;R.sup.3和R.sup.4独立地是氢原子或可以用羟基取代的较低烷基基团或取代或未取代的氨基基团;X是卤原子;R.sup.5和R.sup.6独立地是氢原子或可以用羟基、较低烷氧基或取代或未取代的氨基基团取代的较低烷基基团;或R.sup.5和R.sup.6与相邻的氮原子一起,可以形成一个5到7成员的杂环环,该环可以在碳原子处取代一个或多个取代基,而且该杂环环还可以进一步包含--NR.sup.7 --、--O--、--S--、--SO--、--SO.sub.2--或--NR.sup.7 --CO--,R.sup.7也是氢原子、较低烯基基团、可能被取代的较低烷基或芳基基团,或者由式--(CH.sub.2).sub.nCOR.sup.8(II)代表的基团,其中n是从0到4的整数,R.sup.8是氢原子、较低烷氧基,或者可以被取代的氨基、较低烷基或芳基基团,以及其药学上可接受的盐、该公式I化合物的水合物或溶剂化合物的盐。还包括这些化合物的制备方法、含有它们的药物制剂、在该方法中有用的中间体,以及使用它们的方法。最终产品具有抗微生物活性。