PHOTORESIST UNDERCOAT-FORMING MATERIAL AND PATTERNING PROCESS
申请人:Hatakeyama Jun
公开号:US20100104977A1
公开(公告)日:2010-04-29
A material comprising a novolac resin having a C
6
-C
30
aromatic hydrocarbon group substituted with a sulfo group or an amine salt thereof is useful in forming a photoresist undercoat. The undercoat-forming material has an extinction coefficient sufficient to provide an antireflective effect at a thickness of at least 200 nm, and a high etching resistance as demonstrated by slow etching rates with CF
4
/CHF
3
gas for substrate processing.